Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 499252 [patent_doc_number] => 07205078 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-04-17 [patent_title] => 'Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method' [patent_app_type] => utility [patent_app_number] => 10/853760 [patent_app_country] => US [patent_app_date] => 2004-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 21 [patent_figures_cnt] => 25 [patent_no_of_words] => 15753 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 170 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/205/07205078.pdf [firstpage_image] =>[orig_patent_app_number] => 10853760 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/853760
Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method May 25, 2004 Issued
Array ( [id] => 913864 [patent_doc_number] => 07326505 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-02-05 [patent_title] => 'Lithographic apparatus and device manufacturing method' [patent_app_type] => utility [patent_app_number] => 10/853722 [patent_app_country] => US [patent_app_date] => 2004-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 5910 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 124 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/326/07326505.pdf [firstpage_image] =>[orig_patent_app_number] => 10853722 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/853722
Lithographic apparatus and device manufacturing method May 25, 2004 Issued
Array ( [id] => 7122247 [patent_doc_number] => 20050014076 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-20 [patent_title] => 'Method of generating mask distortion data, exposure method and method of producing semiconductor device' [patent_app_type] => utility [patent_app_number] => 10/848918 [patent_app_country] => US [patent_app_date] => 2004-05-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 8980 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0014/20050014076.pdf [firstpage_image] =>[orig_patent_app_number] => 10848918 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/848918
Method of generating mask distortion data, exposure method and method of producing semiconductor device May 18, 2004 Issued
Array ( [id] => 7295694 [patent_doc_number] => 20040214095 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-10-28 [patent_title] => 'Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device' [patent_app_type] => new [patent_app_number] => 10/847294 [patent_app_country] => US [patent_app_date] => 2004-05-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 9606 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0214/20040214095.pdf [firstpage_image] =>[orig_patent_app_number] => 10847294 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/847294
Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device May 17, 2004 Abandoned
Array ( [id] => 7033466 [patent_doc_number] => 20050031975 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-02-10 [patent_title] => 'Method of characterization, method of characterizing a process operation, and device manufacturing method' [patent_app_type] => utility [patent_app_number] => 10/844572 [patent_app_country] => US [patent_app_date] => 2004-05-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 5045 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0031/20050031975.pdf [firstpage_image] =>[orig_patent_app_number] => 10844572 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/844572
Method of characterization, method of characterizing a process operation, and device manufacturing method May 12, 2004 Issued
Array ( [id] => 7347287 [patent_doc_number] => 20040248021 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-12-09 [patent_title] => 'Reduction of imaging artifacts in a platesetter having a diffractive modulator' [patent_app_type] => new [patent_app_number] => 10/845042 [patent_app_country] => US [patent_app_date] => 2004-05-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 5738 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0248/20040248021.pdf [firstpage_image] =>[orig_patent_app_number] => 10845042 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/845042
Reduction of imaging artifacts in a platesetter having a diffractive modulator May 12, 2004 Issued
Array ( [id] => 1098881 [patent_doc_number] => 06818364 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-11-16 [patent_title] => 'Charged particle beam exposure apparatus and exposure method' [patent_app_type] => B2 [patent_app_number] => 10/843431 [patent_app_country] => US [patent_app_date] => 2004-05-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 20 [patent_figures_cnt] => 38 [patent_no_of_words] => 9251 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/818/06818364.pdf [firstpage_image] =>[orig_patent_app_number] => 10843431 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/843431
Charged particle beam exposure apparatus and exposure method May 11, 2004 Issued
Array ( [id] => 7426964 [patent_doc_number] => 20040209177 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-10-21 [patent_title] => 'Dual wavelength method of determining a relative position of a substrate and a template' [patent_app_type] => new [patent_app_number] => 10/843195 [patent_app_country] => US [patent_app_date] => 2004-05-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 38 [patent_figures_cnt] => 38 [patent_no_of_words] => 16346 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0209/20040209177.pdf [firstpage_image] =>[orig_patent_app_number] => 10843195 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/843195
Dual wavelength method of determining a relative position of a substrate and a template May 10, 2004 Issued
Array ( [id] => 7045431 [patent_doc_number] => 20050250026 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-11-10 [patent_title] => 'Overlay box structure for measuring process induced line shortening effect' [patent_app_type] => utility [patent_app_number] => 10/841147 [patent_app_country] => US [patent_app_date] => 2004-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 4658 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0250/20050250026.pdf [firstpage_image] =>[orig_patent_app_number] => 10841147 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/841147
Overlay box structure for measuring process induced line shortening effect May 6, 2004 Issued
Array ( [id] => 7045430 [patent_doc_number] => 20050250025 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-11-10 [patent_title] => 'Method and lithographic structure for measuring lengths of lines and spaces' [patent_app_type] => utility [patent_app_number] => 10/840922 [patent_app_country] => US [patent_app_date] => 2004-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5236 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0250/20050250025.pdf [firstpage_image] =>[orig_patent_app_number] => 10840922 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/840922
Method and lithographic structure for measuring lengths of lines and spaces May 6, 2004 Issued
Array ( [id] => 7088834 [patent_doc_number] => 20050008946 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-13 [patent_title] => 'Mask for charged particle beam exposure, and method of forming the same' [patent_app_type] => utility [patent_app_number] => 10/839772 [patent_app_country] => US [patent_app_date] => 2004-05-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 7659 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0008/20050008946.pdf [firstpage_image] =>[orig_patent_app_number] => 10839772 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/839772
Mask for charged particle beam exposure, and method of forming the same May 3, 2004 Issued
Array ( [id] => 539896 [patent_doc_number] => 07169515 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-01-30 [patent_title] => 'Phase conflict resolution for photolithographic masks' [patent_app_type] => utility [patent_app_number] => 10/834623 [patent_app_country] => US [patent_app_date] => 2004-04-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 22 [patent_no_of_words] => 6886 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 116 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/169/07169515.pdf [firstpage_image] =>[orig_patent_app_number] => 10834623 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/834623
Phase conflict resolution for photolithographic masks Apr 28, 2004 Issued
Array ( [id] => 7069344 [patent_doc_number] => 20050244729 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-11-03 [patent_title] => 'Method of measuring the overlay accuracy of a multi-exposure process' [patent_app_type] => utility [patent_app_number] => 10/834117 [patent_app_country] => US [patent_app_date] => 2004-04-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3537 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0244/20050244729.pdf [firstpage_image] =>[orig_patent_app_number] => 10834117 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/834117
Method of measuring the overlay accuracy of a multi-exposure process Apr 28, 2004 Abandoned
Array ( [id] => 612581 [patent_doc_number] => 07147977 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-12-12 [patent_title] => 'Method for fabricating semiconductor device and method for fabricating semiconductor substrate used in the semiconductor device' [patent_app_type] => utility [patent_app_number] => 10/833037 [patent_app_country] => US [patent_app_date] => 2004-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 16 [patent_no_of_words] => 6760 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 184 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/147/07147977.pdf [firstpage_image] =>[orig_patent_app_number] => 10833037 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/833037
Method for fabricating semiconductor device and method for fabricating semiconductor substrate used in the semiconductor device Apr 27, 2004 Issued
Array ( [id] => 7425843 [patent_doc_number] => 20040265709 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-12-30 [patent_title] => 'Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device' [patent_app_type] => new [patent_app_number] => 10/830399 [patent_app_country] => US [patent_app_date] => 2004-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 6256 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0265/20040265709.pdf [firstpage_image] =>[orig_patent_app_number] => 10830399 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/830399
Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device Apr 22, 2004 Issued
Array ( [id] => 7460303 [patent_doc_number] => 20040197713 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-10-07 [patent_title] => 'Post exposure modification of critical dimensions in mask fabrication' [patent_app_type] => new [patent_app_number] => 10/831563 [patent_app_country] => US [patent_app_date] => 2004-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 9551 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 3 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0197/20040197713.pdf [firstpage_image] =>[orig_patent_app_number] => 10831563 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/831563
Post exposure modification of critical dimensions in mask fabrication Apr 22, 2004 Issued
Array ( [id] => 456018 [patent_doc_number] => 07244534 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-07-17 [patent_title] => 'Device manufacturing method' [patent_app_type] => utility [patent_app_number] => 10/830408 [patent_app_country] => US [patent_app_date] => 2004-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 3580 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/244/07244534.pdf [firstpage_image] =>[orig_patent_app_number] => 10830408 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/830408
Device manufacturing method Apr 22, 2004 Issued
Array ( [id] => 847011 [patent_doc_number] => 07384711 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-06-10 [patent_title] => 'Stencil mask having main and auxiliary strut and method of forming the same' [patent_app_type] => utility [patent_app_number] => 10/827513 [patent_app_country] => US [patent_app_date] => 2004-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 29 [patent_no_of_words] => 5547 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 69 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/384/07384711.pdf [firstpage_image] =>[orig_patent_app_number] => 10827513 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/827513
Stencil mask having main and auxiliary strut and method of forming the same Apr 18, 2004 Issued
Array ( [id] => 6966330 [patent_doc_number] => 20050233227 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-10-20 [patent_title] => 'Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system' [patent_app_type] => utility [patent_app_number] => 10/824279 [patent_app_country] => US [patent_app_date] => 2004-04-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 5341 [patent_no_of_claims] => 53 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0233/20050233227.pdf [firstpage_image] =>[orig_patent_app_number] => 10824279 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/824279
Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system Apr 13, 2004 Issued
Array ( [id] => 630243 [patent_doc_number] => 07132203 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-11-07 [patent_title] => 'Phase shift masking for complex patterns with proximity adjustments' [patent_app_type] => utility [patent_app_number] => 10/818727 [patent_app_country] => US [patent_app_date] => 2004-04-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 27 [patent_figures_cnt] => 47 [patent_no_of_words] => 15517 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/132/07132203.pdf [firstpage_image] =>[orig_patent_app_number] => 10818727 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/818727
Phase shift masking for complex patterns with proximity adjustments Apr 5, 2004 Issued
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