
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 499252
[patent_doc_number] => 07205078
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-04-17
[patent_title] => 'Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method'
[patent_app_type] => utility
[patent_app_number] => 10/853760
[patent_app_country] => US
[patent_app_date] => 2004-05-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 21
[patent_figures_cnt] => 25
[patent_no_of_words] => 15753
[patent_no_of_claims] => 29
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 170
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/205/07205078.pdf
[firstpage_image] =>[orig_patent_app_number] => 10853760
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/853760 | Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method | May 25, 2004 | Issued |
Array
(
[id] => 913864
[patent_doc_number] => 07326505
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-02-05
[patent_title] => 'Lithographic apparatus and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 10/853722
[patent_app_country] => US
[patent_app_date] => 2004-05-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 5910
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 124
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/326/07326505.pdf
[firstpage_image] =>[orig_patent_app_number] => 10853722
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/853722 | Lithographic apparatus and device manufacturing method | May 25, 2004 | Issued |
Array
(
[id] => 7122247
[patent_doc_number] => 20050014076
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-20
[patent_title] => 'Method of generating mask distortion data, exposure method and method of producing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/848918
[patent_app_country] => US
[patent_app_date] => 2004-05-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 8980
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0014/20050014076.pdf
[firstpage_image] =>[orig_patent_app_number] => 10848918
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/848918 | Method of generating mask distortion data, exposure method and method of producing semiconductor device | May 18, 2004 | Issued |
Array
(
[id] => 7295694
[patent_doc_number] => 20040214095
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-10-28
[patent_title] => 'Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device'
[patent_app_type] => new
[patent_app_number] => 10/847294
[patent_app_country] => US
[patent_app_date] => 2004-05-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 9606
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0214/20040214095.pdf
[firstpage_image] =>[orig_patent_app_number] => 10847294
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/847294 | Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device | May 17, 2004 | Abandoned |
Array
(
[id] => 7033466
[patent_doc_number] => 20050031975
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-02-10
[patent_title] => 'Method of characterization, method of characterizing a process operation, and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 10/844572
[patent_app_country] => US
[patent_app_date] => 2004-05-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 5045
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0031/20050031975.pdf
[firstpage_image] =>[orig_patent_app_number] => 10844572
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/844572 | Method of characterization, method of characterizing a process operation, and device manufacturing method | May 12, 2004 | Issued |
Array
(
[id] => 7347287
[patent_doc_number] => 20040248021
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-09
[patent_title] => 'Reduction of imaging artifacts in a platesetter having a diffractive modulator'
[patent_app_type] => new
[patent_app_number] => 10/845042
[patent_app_country] => US
[patent_app_date] => 2004-05-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 5738
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 91
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0248/20040248021.pdf
[firstpage_image] =>[orig_patent_app_number] => 10845042
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/845042 | Reduction of imaging artifacts in a platesetter having a diffractive modulator | May 12, 2004 | Issued |
Array
(
[id] => 1098881
[patent_doc_number] => 06818364
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-11-16
[patent_title] => 'Charged particle beam exposure apparatus and exposure method'
[patent_app_type] => B2
[patent_app_number] => 10/843431
[patent_app_country] => US
[patent_app_date] => 2004-05-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
[patent_figures_cnt] => 38
[patent_no_of_words] => 9251
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 122
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/818/06818364.pdf
[firstpage_image] =>[orig_patent_app_number] => 10843431
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/843431 | Charged particle beam exposure apparatus and exposure method | May 11, 2004 | Issued |
Array
(
[id] => 7426964
[patent_doc_number] => 20040209177
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-10-21
[patent_title] => 'Dual wavelength method of determining a relative position of a substrate and a template'
[patent_app_type] => new
[patent_app_number] => 10/843195
[patent_app_country] => US
[patent_app_date] => 2004-05-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 38
[patent_figures_cnt] => 38
[patent_no_of_words] => 16346
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 125
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0209/20040209177.pdf
[firstpage_image] =>[orig_patent_app_number] => 10843195
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/843195 | Dual wavelength method of determining a relative position of a substrate and a template | May 10, 2004 | Issued |
Array
(
[id] => 7045431
[patent_doc_number] => 20050250026
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-10
[patent_title] => 'Overlay box structure for measuring process induced line shortening effect'
[patent_app_type] => utility
[patent_app_number] => 10/841147
[patent_app_country] => US
[patent_app_date] => 2004-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 4658
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0250/20050250026.pdf
[firstpage_image] =>[orig_patent_app_number] => 10841147
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/841147 | Overlay box structure for measuring process induced line shortening effect | May 6, 2004 | Issued |
Array
(
[id] => 7045430
[patent_doc_number] => 20050250025
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-10
[patent_title] => 'Method and lithographic structure for measuring lengths of lines and spaces'
[patent_app_type] => utility
[patent_app_number] => 10/840922
[patent_app_country] => US
[patent_app_date] => 2004-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 5236
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0250/20050250025.pdf
[firstpage_image] =>[orig_patent_app_number] => 10840922
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/840922 | Method and lithographic structure for measuring lengths of lines and spaces | May 6, 2004 | Issued |
Array
(
[id] => 7088834
[patent_doc_number] => 20050008946
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-13
[patent_title] => 'Mask for charged particle beam exposure, and method of forming the same'
[patent_app_type] => utility
[patent_app_number] => 10/839772
[patent_app_country] => US
[patent_app_date] => 2004-05-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 7659
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0008/20050008946.pdf
[firstpage_image] =>[orig_patent_app_number] => 10839772
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/839772 | Mask for charged particle beam exposure, and method of forming the same | May 3, 2004 | Issued |
Array
(
[id] => 539896
[patent_doc_number] => 07169515
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-01-30
[patent_title] => 'Phase conflict resolution for photolithographic masks'
[patent_app_type] => utility
[patent_app_number] => 10/834623
[patent_app_country] => US
[patent_app_date] => 2004-04-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 22
[patent_no_of_words] => 6886
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 116
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/169/07169515.pdf
[firstpage_image] =>[orig_patent_app_number] => 10834623
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/834623 | Phase conflict resolution for photolithographic masks | Apr 28, 2004 | Issued |
Array
(
[id] => 7069344
[patent_doc_number] => 20050244729
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-03
[patent_title] => 'Method of measuring the overlay accuracy of a multi-exposure process'
[patent_app_type] => utility
[patent_app_number] => 10/834117
[patent_app_country] => US
[patent_app_date] => 2004-04-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 3537
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0244/20050244729.pdf
[firstpage_image] =>[orig_patent_app_number] => 10834117
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/834117 | Method of measuring the overlay accuracy of a multi-exposure process | Apr 28, 2004 | Abandoned |
Array
(
[id] => 612581
[patent_doc_number] => 07147977
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-12-12
[patent_title] => 'Method for fabricating semiconductor device and method for fabricating semiconductor substrate used in the semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/833037
[patent_app_country] => US
[patent_app_date] => 2004-04-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 16
[patent_no_of_words] => 6760
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 184
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/147/07147977.pdf
[firstpage_image] =>[orig_patent_app_number] => 10833037
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/833037 | Method for fabricating semiconductor device and method for fabricating semiconductor substrate used in the semiconductor device | Apr 27, 2004 | Issued |
Array
(
[id] => 7425843
[patent_doc_number] => 20040265709
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-30
[patent_title] => 'Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/830399
[patent_app_country] => US
[patent_app_date] => 2004-04-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 6256
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 112
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0265/20040265709.pdf
[firstpage_image] =>[orig_patent_app_number] => 10830399
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/830399 | Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device | Apr 22, 2004 | Issued |
Array
(
[id] => 7460303
[patent_doc_number] => 20040197713
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-10-07
[patent_title] => 'Post exposure modification of critical dimensions in mask fabrication'
[patent_app_type] => new
[patent_app_number] => 10/831563
[patent_app_country] => US
[patent_app_date] => 2004-04-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 15
[patent_no_of_words] => 9551
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 3
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0197/20040197713.pdf
[firstpage_image] =>[orig_patent_app_number] => 10831563
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/831563 | Post exposure modification of critical dimensions in mask fabrication | Apr 22, 2004 | Issued |
Array
(
[id] => 456018
[patent_doc_number] => 07244534
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-07-17
[patent_title] => 'Device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 10/830408
[patent_app_country] => US
[patent_app_date] => 2004-04-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 7
[patent_no_of_words] => 3580
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/244/07244534.pdf
[firstpage_image] =>[orig_patent_app_number] => 10830408
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/830408 | Device manufacturing method | Apr 22, 2004 | Issued |
Array
(
[id] => 847011
[patent_doc_number] => 07384711
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-06-10
[patent_title] => 'Stencil mask having main and auxiliary strut and method of forming the same'
[patent_app_type] => utility
[patent_app_number] => 10/827513
[patent_app_country] => US
[patent_app_date] => 2004-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 29
[patent_no_of_words] => 5547
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 69
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/384/07384711.pdf
[firstpage_image] =>[orig_patent_app_number] => 10827513
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/827513 | Stencil mask having main and auxiliary strut and method of forming the same | Apr 18, 2004 | Issued |
Array
(
[id] => 6966330
[patent_doc_number] => 20050233227
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-10-20
[patent_title] => 'Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system'
[patent_app_type] => utility
[patent_app_number] => 10/824279
[patent_app_country] => US
[patent_app_date] => 2004-04-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 5341
[patent_no_of_claims] => 53
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0233/20050233227.pdf
[firstpage_image] =>[orig_patent_app_number] => 10824279
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/824279 | Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system | Apr 13, 2004 | Issued |
Array
(
[id] => 630243
[patent_doc_number] => 07132203
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-11-07
[patent_title] => 'Phase shift masking for complex patterns with proximity adjustments'
[patent_app_type] => utility
[patent_app_number] => 10/818727
[patent_app_country] => US
[patent_app_date] => 2004-04-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 27
[patent_figures_cnt] => 47
[patent_no_of_words] => 15517
[patent_no_of_claims] => 34
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 101
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/132/07132203.pdf
[firstpage_image] =>[orig_patent_app_number] => 10818727
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/818727 | Phase shift masking for complex patterns with proximity adjustments | Apr 5, 2004 | Issued |