
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 757095
[patent_doc_number] => 07014960
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-21
[patent_title] => 'Chelation cleaning process for repairing photomasks'
[patent_app_type] => utility
[patent_app_number] => 10/635982
[patent_app_country] => US
[patent_app_date] => 2003-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 1349
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 37
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/014/07014960.pdf
[firstpage_image] =>[orig_patent_app_number] => 10635982
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/635982 | Chelation cleaning process for repairing photomasks | Aug 6, 2003 | Issued |
Array
(
[id] => 931018
[patent_doc_number] => 06979522
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-12-27
[patent_title] => 'Method for exposing at least one or at least two semiconductor wafers'
[patent_app_type] => utility
[patent_app_number] => 10/635583
[patent_app_country] => US
[patent_app_date] => 2003-08-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 3884
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 160
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/979/06979522.pdf
[firstpage_image] =>[orig_patent_app_number] => 10635583
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/635583 | Method for exposing at least one or at least two semiconductor wafers | Aug 5, 2003 | Issued |
Array
(
[id] => 5692577
[patent_doc_number] => 20060152723
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-07-13
[patent_title] => 'Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 10/523563
[patent_app_country] => US
[patent_app_date] => 2003-08-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 4522
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0152/20060152723.pdf
[firstpage_image] =>[orig_patent_app_number] => 10523563
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/523563 | Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method | Aug 4, 2003 | Abandoned |
Array
(
[id] => 7381011
[patent_doc_number] => 20040029028
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-02-12
[patent_title] => 'Method for measuring gap between mask and substrate of display panel'
[patent_app_type] => new
[patent_app_number] => 10/633716
[patent_app_country] => US
[patent_app_date] => 2003-08-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 13
[patent_no_of_words] => 5123
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 108
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0029/20040029028.pdf
[firstpage_image] =>[orig_patent_app_number] => 10633716
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/633716 | Method for measuring gap between mask and substrate of display panel | Aug 4, 2003 | Issued |
Array
(
[id] => 7033495
[patent_doc_number] => 20050032004
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-02-10
[patent_title] => 'Method of controlling removal of photoresist in openings of a photoresist mask'
[patent_app_type] => utility
[patent_app_number] => 10/633602
[patent_app_country] => US
[patent_app_date] => 2003-08-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3200
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0032/20050032004.pdf
[firstpage_image] =>[orig_patent_app_number] => 10633602
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/633602 | Method of controlling removal of photoresist in openings of a photoresist mask | Aug 3, 2003 | Issued |
Array
(
[id] => 520249
[patent_doc_number] => 07186486
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-03-06
[patent_title] => 'Method to pattern a substrate'
[patent_app_type] => utility
[patent_app_number] => 10/634152
[patent_app_country] => US
[patent_app_date] => 2003-08-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 2786
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 30
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/186/07186486.pdf
[firstpage_image] =>[orig_patent_app_number] => 10634152
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/634152 | Method to pattern a substrate | Aug 3, 2003 | Issued |
Array
(
[id] => 7443697
[patent_doc_number] => 20040066963
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-08
[patent_title] => 'Method of inspecting a mask'
[patent_app_type] => new
[patent_app_number] => 10/631082
[patent_app_country] => US
[patent_app_date] => 2003-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 1345
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 77
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0066/20040066963.pdf
[firstpage_image] =>[orig_patent_app_number] => 10631082
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/631082 | Method of inspecting a mask | Jul 30, 2003 | Issued |
Array
(
[id] => 7397842
[patent_doc_number] => 20040023133
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-02-05
[patent_title] => 'Photoresist pattern and forming method thereof'
[patent_app_type] => new
[patent_app_number] => 10/628919
[patent_app_country] => US
[patent_app_date] => 2003-07-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 5020
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 39
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0023/20040023133.pdf
[firstpage_image] =>[orig_patent_app_number] => 10628919
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/628919 | Photoresist pattern and forming method thereof | Jul 28, 2003 | Abandoned |
Array
(
[id] => 7373802
[patent_doc_number] => 20040219442
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-04
[patent_title] => 'Exposure system and method with group compensation'
[patent_app_type] => new
[patent_app_number] => 10/629030
[patent_app_country] => US
[patent_app_date] => 2003-07-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 1558
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 61
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0219/20040219442.pdf
[firstpage_image] =>[orig_patent_app_number] => 10629030
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/629030 | Exposure system and method with group compensation | Jul 27, 2003 | Issued |
Array
(
[id] => 7313767
[patent_doc_number] => 20040222187
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-11
[patent_title] => 'METHOD OF FABRICATING POLYSILICON FILM BY EXCIMER LASER CRYSTALLIZATION PROCESS'
[patent_app_type] => new
[patent_app_number] => 10/604485
[patent_app_country] => US
[patent_app_date] => 2003-07-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 2785
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 129
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0222/20040222187.pdf
[firstpage_image] =>[orig_patent_app_number] => 10604485
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/604485 | Method of fabricating polysilicon film by excimer laser crystallization process | Jul 24, 2003 | Issued |
Array
(
[id] => 7025303
[patent_doc_number] => 20050019697
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-27
[patent_title] => 'Method of treating wafers with photoresist to perform metrology analysis using large current e-beam systems'
[patent_app_type] => utility
[patent_app_number] => 10/626355
[patent_app_country] => US
[patent_app_date] => 2003-07-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3169
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0019/20050019697.pdf
[firstpage_image] =>[orig_patent_app_number] => 10626355
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/626355 | Method of treating wafers with photoresist to perform metrology analysis using large current e-beam systems | Jul 23, 2003 | Abandoned |
Array
(
[id] => 7270018
[patent_doc_number] => 20040058536
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-25
[patent_title] => 'Electron beam lithography method'
[patent_app_type] => new
[patent_app_number] => 10/623612
[patent_app_country] => US
[patent_app_date] => 2003-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3500
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 50
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0058/20040058536.pdf
[firstpage_image] =>[orig_patent_app_number] => 10623612
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/623612 | Electron beam lithography method | Jul 21, 2003 | Issued |
Array
(
[id] => 7219174
[patent_doc_number] => 20040072104
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-15
[patent_title] => 'Method for forming ultra fine contact holes in semiconductor devices'
[patent_app_type] => new
[patent_app_number] => 10/623419
[patent_app_country] => US
[patent_app_date] => 2003-07-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 1393
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 174
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0072/20040072104.pdf
[firstpage_image] =>[orig_patent_app_number] => 10623419
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/623419 | Method for forming ultra fine contact holes in semiconductor devices | Jul 17, 2003 | Issued |
Array
(
[id] => 7677837
[patent_doc_number] => 20040151989
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-05
[patent_title] => 'Photo mask, method of manufacturing electronic device, and method of manufacturing photo mask'
[patent_app_type] => new
[patent_app_number] => 10/620367
[patent_app_country] => US
[patent_app_date] => 2003-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 4231
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 165
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0151/20040151989.pdf
[firstpage_image] =>[orig_patent_app_number] => 10620367
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/620367 | Photo mask, method of manufacturing electronic device, and method of manufacturing photo mask | Jul 16, 2003 | Abandoned |
Array
(
[id] => 1150963
[patent_doc_number] => 06767691
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-07-27
[patent_title] => 'Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion'
[patent_app_type] => B2
[patent_app_number] => 10/622529
[patent_app_country] => US
[patent_app_date] => 2003-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 4106
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 104
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/767/06767691.pdf
[firstpage_image] =>[orig_patent_app_number] => 10622529
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/622529 | Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion | Jul 16, 2003 | Issued |
Array
(
[id] => 7396920
[patent_doc_number] => 20040018449
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-01-29
[patent_title] => 'Method of manufacturing member pattern, method of manufacturing wiring structure, method of manufacturing electron source, and method of manufacturing image display device'
[patent_app_type] => new
[patent_app_number] => 10/619575
[patent_app_country] => US
[patent_app_date] => 2003-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 15
[patent_no_of_words] => 11014
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 93
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0018/20040018449.pdf
[firstpage_image] =>[orig_patent_app_number] => 10619575
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/619575 | Method of manufacturing member pattern, method of manufacturing wiring structure, method of manufacturing electron source, and method of manufacturing image display device | Jul 15, 2003 | Issued |
Array
(
[id] => 7088832
[patent_doc_number] => 20050008944
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-13
[patent_title] => 'Defect inspection of extreme ultraviolet lithography masks and the like'
[patent_app_type] => utility
[patent_app_number] => 10/616863
[patent_app_country] => US
[patent_app_date] => 2003-07-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4669
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0008/20050008944.pdf
[firstpage_image] =>[orig_patent_app_number] => 10616863
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/616863 | Defect inspection of extreme ultraviolet lithography masks and the like | Jul 9, 2003 | Issued |
Array
(
[id] => 520242
[patent_doc_number] => 07186485
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-03-06
[patent_title] => 'Inspection method and a photomask'
[patent_app_type] => utility
[patent_app_number] => 10/615228
[patent_app_country] => US
[patent_app_date] => 2003-07-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 30
[patent_no_of_words] => 9991
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 101
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/186/07186485.pdf
[firstpage_image] =>[orig_patent_app_number] => 10615228
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/615228 | Inspection method and a photomask | Jul 8, 2003 | Issued |
Array
(
[id] => 7607767
[patent_doc_number] => 07097946
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-08-29
[patent_title] => 'Photomask, method of manufacturing a photomask, and method of manufacturing an electronic product'
[patent_app_type] => utility
[patent_app_number] => 10/615194
[patent_app_country] => US
[patent_app_date] => 2003-07-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 13
[patent_no_of_words] => 7952
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 137
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/097/07097946.pdf
[firstpage_image] =>[orig_patent_app_number] => 10615194
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/615194 | Photomask, method of manufacturing a photomask, and method of manufacturing an electronic product | Jul 8, 2003 | Issued |
Array
(
[id] => 7269738
[patent_doc_number] => 20040058256
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-25
[patent_title] => 'Dose monitoring method and manufacturing method of semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/611247
[patent_app_country] => US
[patent_app_date] => 2003-07-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 7658
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 169
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0058/20040058256.pdf
[firstpage_image] =>[orig_patent_app_number] => 10611247
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/611247 | Dose monitoring method and manufacturing method of semiconductor device | Jul 1, 2003 | Issued |