
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 740499
[patent_doc_number] => 07029827
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-04-18
[patent_title] => 'Pattern formation method'
[patent_app_type] => utility
[patent_app_number] => 10/610920
[patent_app_country] => US
[patent_app_date] => 2003-07-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 14
[patent_no_of_words] => 2479
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/029/07029827.pdf
[firstpage_image] =>[orig_patent_app_number] => 10610920
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/610920 | Pattern formation method | Jul 1, 2003 | Issued |
Array
(
[id] => 757090
[patent_doc_number] => 07014958
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-21
[patent_title] => 'Method for dry etching photomask material'
[patent_app_type] => utility
[patent_app_number] => 10/604181
[patent_app_country] => US
[patent_app_date] => 2003-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/07/014/07014958.pdf
[firstpage_image] =>[orig_patent_app_number] => 10604181
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/604181 | Method for dry etching photomask material | Jun 29, 2003 | Issued |
Array
(
[id] => 765807
[patent_doc_number] => 07008734
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-07
[patent_title] => 'Phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/608412
[patent_app_country] => US
[patent_app_date] => 2003-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/07/008/07008734.pdf
[firstpage_image] =>[orig_patent_app_number] => 10608412
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/608412 | Phase shift mask | Jun 29, 2003 | Issued |
Array
(
[id] => 6912168
[patent_doc_number] => 20050175926
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-08-11
[patent_title] => 'Coating forming agent for reducing pattern dimension and method of forming fine pattern therewith'
[patent_app_type] => utility
[patent_app_number] => 10/519542
[patent_app_country] => US
[patent_app_date] => 2003-06-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6263
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[pdf_file] => publications/A1/0175/20050175926.pdf
[firstpage_image] =>[orig_patent_app_number] => 10519542
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/519542 | Coating forming agent for reducing pattern dimension and method of forming fine pattern therewith | Jun 25, 2003 | Abandoned |
Array
(
[id] => 516744
[patent_doc_number] => 07189499
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-03-13
[patent_title] => 'Method of forming fine patterns'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/602883 | Method of forming fine patterns | Jun 24, 2003 | Issued |
Array
(
[id] => 740432
[patent_doc_number] => 07029798
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2006-04-18
[patent_title] => 'Ultrasonic agitation-assisted development of resist layer of master stamper/imprinter'
[patent_app_type] => utility
[patent_app_number] => 10/602881
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[pdf_file] => patents/07/029/07029798.pdf
[firstpage_image] =>[orig_patent_app_number] => 10602881
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/602881 | Ultrasonic agitation-assisted development of resist layer of master stamper/imprinter | Jun 24, 2003 | Issued |
Array
(
[id] => 768548
[patent_doc_number] => 07005220
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-02-28
[patent_title] => 'Method for structuring a lithography mask'
[patent_app_type] => utility
[patent_app_number] => 10/465103
[patent_app_country] => US
[patent_app_date] => 2003-06-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/07/005/07005220.pdf
[firstpage_image] =>[orig_patent_app_number] => 10465103
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/465103 | Method for structuring a lithography mask | Jun 18, 2003 | Issued |
Array
(
[id] => 1012528
[patent_doc_number] => 06896999
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-05-24
[patent_title] => 'Method of exposing a semiconductor wafer in an exposer'
[patent_app_type] => utility
[patent_app_number] => 10/465294
[patent_app_country] => US
[patent_app_date] => 2003-06-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/06/896/06896999.pdf
[firstpage_image] =>[orig_patent_app_number] => 10465294
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/465294 | Method of exposing a semiconductor wafer in an exposer | Jun 18, 2003 | Issued |
Array
(
[id] => 7327858
[patent_doc_number] => 20040253523
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-16
[patent_title] => 'Embedded bi-layer structure for attenuated phase shifting mask'
[patent_app_type] => new
[patent_app_number] => 10/462359
[patent_app_country] => US
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[pdf_file] => publications/A1/0253/20040253523.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/462359 | Embedded bi-layer structure for attenuated phase shifting mask | Jun 15, 2003 | Issued |
Array
(
[id] => 765805
[patent_doc_number] => 07008732
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-07
[patent_title] => 'Photomask pattern'
[patent_app_type] => utility
[patent_app_number] => 10/457978
[patent_app_country] => US
[patent_app_date] => 2003-06-09
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/008/07008732.pdf
[firstpage_image] =>[orig_patent_app_number] => 10457978
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/457978 | Photomask pattern | Jun 8, 2003 | Issued |
Array
(
[id] => 7347279
[patent_doc_number] => 20040248016
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-09
[patent_title] => 'Method of designing a reticle and forming a semiconductor device therewith'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/455856 | Method of designing a reticle and forming a semiconductor device therewith | Jun 5, 2003 | Abandoned |
Array
(
[id] => 7396834
[patent_doc_number] => 20040018437
[patent_country] => US
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[patent_issue_date] => 2004-01-29
[patent_title] => 'Photomask covered with light-transmissive and electrically-conductive polymer material'
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Array
(
[id] => 7397827
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Array
(
[id] => 6804864
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[patent_title] => 'EPL mask processing method and device thereof'
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Array
(
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Array
(
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Array
(
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Array
(
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Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/443924 | Method to control gate CD | May 21, 2003 | Issued |