
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1140597
[patent_doc_number] => 06777147
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[patent_title] => 'Method for evaluating the effects of multiple exposure processes in lithography'
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Array
(
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[patent_issue_date] => 2004-02-05
[patent_title] => 'Electron beam mask substrate, electron beam mask blank, electron beam mask, and fabrication method thereof'
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Array
(
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[patent_title] => 'Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems'
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Array
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[patent_title] => 'Reducing charging effects in photolithography reticle manufacturing'
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Array
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[patent_title] => 'Pre-alignment system of exposure apparatus having wafer cooling means and exposure method using the same'
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Array
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Array
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[patent_title] => 'Method and apparatus for performing target-image-based optical proximity correction'
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Array
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[patent_title] => 'Process for producing hard masks'
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Array
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[patent_title] => 'Quartz damage repair method for high-end mask'
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Array
(
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Array
(
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Array
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Array
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Array
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Array
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