
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7342882
[patent_doc_number] => 20040191640
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-30
[patent_title] => 'Nanopastes for use as patterning compositions'
[patent_app_type] => new
[patent_app_number] => 10/400715
[patent_app_country] => US
[patent_app_date] => 2003-03-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 6904
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0191/20040191640.pdf
[firstpage_image] =>[orig_patent_app_number] => 10400715
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/400715 | Nanopastes for use as patterning compositions | Mar 26, 2003 | Issued |
Array
(
[id] => 6769784
[patent_doc_number] => 20030215724
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-20
[patent_title] => 'Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit'
[patent_app_type] => new
[patent_app_number] => 10/394047
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 10394047
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/394047 | Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit | Mar 23, 2003 | Issued |
Array
(
[id] => 749093
[patent_doc_number] => 07022438
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-04-04
[patent_title] => 'Photomask for forming small contact hole array and methods of fabricating and using the same'
[patent_app_type] => utility
[patent_app_number] => 10/392590
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[patent_app_date] => 2003-03-20
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[firstpage_image] =>[orig_patent_app_number] => 10392590
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/392590 | Photomask for forming small contact hole array and methods of fabricating and using the same | Mar 19, 2003 | Issued |
Array
(
[id] => 6829575
[patent_doc_number] => 20030180633
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-09-25
[patent_title] => 'Mask pattern forming method and patterning method using the mask pattern'
[patent_app_type] => new
[patent_app_number] => 10/391799
[patent_app_country] => US
[patent_app_date] => 2003-03-20
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Array
(
[id] => 1202412
[patent_doc_number] => 06720117
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[patent_issue_date] => 2004-04-13
[patent_title] => 'Exposure mask with appended mask error data'
[patent_app_type] => B2
[patent_app_number] => 10/390670
[patent_app_country] => US
[patent_app_date] => 2003-03-19
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/720/06720117.pdf
[firstpage_image] =>[orig_patent_app_number] => 10390670
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/390670 | Exposure mask with appended mask error data | Mar 18, 2003 | Issued |
Array
(
[id] => 612577
[patent_doc_number] => 07147973
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-12-12
[patent_title] => 'Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect'
[patent_app_type] => utility
[patent_app_number] => 10/391708
[patent_app_country] => US
[patent_app_date] => 2003-03-19
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/391708 | Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect | Mar 18, 2003 | Issued |
Array
(
[id] => 6938918
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[patent_country] => US
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[patent_issue_date] => 2005-05-26
[patent_title] => 'Exposure method and apparatus'
[patent_app_type] => utility
[patent_app_number] => 10/390766
[patent_app_country] => US
[patent_app_date] => 2003-03-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[firstpage_image] =>[orig_patent_app_number] => 10390766
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/390766 | Exposure method and apparatus | Mar 18, 2003 | Abandoned |
Array
(
[id] => 7072626
[patent_doc_number] => 20050145892
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-07
[patent_title] => 'Mask, semiconductor device manufacturing method, and semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/506147
[patent_app_country] => US
[patent_app_date] => 2003-03-13
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[pdf_file] => publications/A1/0145/20050145892.pdf
[firstpage_image] =>[orig_patent_app_number] => 10506147
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/506147 | Mask, semiconductor device manufacturing method, and semiconductor device | Mar 12, 2003 | Abandoned |
Array
(
[id] => 913854
[patent_doc_number] => 07326501
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-02-05
[patent_title] => 'Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM)'
[patent_app_type] => utility
[patent_app_number] => 10/386141
[patent_app_country] => US
[patent_app_date] => 2003-03-10
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[patent_drawing_sheets_cnt] => 8
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[firstpage_image] =>[orig_patent_app_number] => 10386141
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/386141 | Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM) | Mar 9, 2003 | Issued |
Array
(
[id] => 6796726
[patent_doc_number] => 20030175600
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[patent_issue_date] => 2003-09-18
[patent_title] => 'Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation'
[patent_app_type] => new
[patent_app_number] => 10/383192
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/383192 | Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation | Mar 5, 2003 | Issued |
Array
(
[id] => 390133
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[patent_title] => 'Processor unit with provision for automated control of processing parameters'
[patent_app_type] => utility
[patent_app_number] => 10/376500
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Array
(
[id] => 1192690
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[patent_title] => 'Method for forming fine patterns through effective glass transition temperature reduction'
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Array
(
[id] => 6740047
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[patent_title] => 'MICRO DEVICES MANUFACTURING METHOD UTILIZING CONCAVE AND CONVEX ALIGNMENT MARK PATTERNS'
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[firstpage_image] =>[orig_patent_app_number] => 10375012
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/375012 | Micro devices manufacturing method utilizing concave and convex alignment mark patterns | Feb 27, 2003 | Issued |
Array
(
[id] => 946500
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[patent_title] => 'Semiconductor device and manufacturing method thereof'
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Array
(
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Array
(
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[patent_title] => 'Gray scale all-glass photomasks'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/374669 | Gray scale all-glass photomasks | Feb 24, 2003 | Abandoned |
Array
(
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Array
(
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[patent_title] => 'Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/370369 | Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device | Feb 17, 2003 | Issued |