Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6704269 [patent_doc_number] => 20030151003 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-08-14 [patent_title] => 'Pattern writing and forming method' [patent_app_type] => new [patent_app_number] => 10/360801 [patent_app_country] => US [patent_app_date] => 2003-02-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 7986 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 267 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0151/20030151003.pdf [firstpage_image] =>[orig_patent_app_number] => 10360801 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/360801
Pattern writing and forming method Feb 9, 2003 Issued
Array ( [id] => 6706116 [patent_doc_number] => 20030152850 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-08-14 [patent_title] => 'Rule-based methods for proximity-effect correction of charged-particle-beam lithography pattern using subregion-approximation for determining pattern element bias' [patent_app_type] => new [patent_app_number] => 10/359800 [patent_app_country] => US [patent_app_date] => 2003-02-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 8661 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 153 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0152/20030152850.pdf [firstpage_image] =>[orig_patent_app_number] => 10359800 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/359800
Rule-based methods for proximity-effect correction of charged-particle-beam lithography pattern using subregion-approximation for determining pattern element bias Feb 5, 2003 Abandoned
Array ( [id] => 6706112 [patent_doc_number] => 20030152846 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-08-14 [patent_title] => 'Photolithographic mask' [patent_app_type] => new [patent_app_number] => 10/353463 [patent_app_country] => US [patent_app_date] => 2003-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3699 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 160 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0152/20030152846.pdf [firstpage_image] =>[orig_patent_app_number] => 10353463 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/353463
Photolithographic mask Jan 28, 2003 Issued
Array ( [id] => 1040442 [patent_doc_number] => 06869739 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-03-22 [patent_title] => 'Integrated lithographic print and detection model for optical CD' [patent_app_type] => utility [patent_app_number] => 10/353900 [patent_app_country] => US [patent_app_date] => 2003-01-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 19 [patent_no_of_words] => 6077 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 237 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/869/06869739.pdf [firstpage_image] =>[orig_patent_app_number] => 10353900 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/353900
Integrated lithographic print and detection model for optical CD Jan 27, 2003 Issued
Array ( [id] => 709982 [patent_doc_number] => 07056623 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-06-06 [patent_title] => 'Photomask and method for manufacturing the same' [patent_app_type] => utility [patent_app_number] => 10/350876 [patent_app_country] => US [patent_app_date] => 2003-01-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 5660 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 65 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/056/07056623.pdf [firstpage_image] =>[orig_patent_app_number] => 10350876 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/350876
Photomask and method for manufacturing the same Jan 23, 2003 Issued
Array ( [id] => 6851269 [patent_doc_number] => 20030143472 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-07-31 [patent_title] => 'Manufacturing method of photomask' [patent_app_type] => new [patent_app_number] => 10/349590 [patent_app_country] => US [patent_app_date] => 2003-01-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 5912 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 65 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0143/20030143472.pdf [firstpage_image] =>[orig_patent_app_number] => 10349590 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/349590
Manufacturing method of photomask Jan 22, 2003 Abandoned
Array ( [id] => 7308298 [patent_doc_number] => 20040142281 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-07-22 [patent_title] => 'Conductive bi-layer e-beam resist with amorphous carbon' [patent_app_type] => new [patent_app_number] => 10/348690 [patent_app_country] => US [patent_app_date] => 2003-01-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4542 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0142/20040142281.pdf [firstpage_image] =>[orig_patent_app_number] => 10348690 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/348690
Conductive bi-layer e-beam resist with amorphous carbon Jan 20, 2003 Issued
Array ( [id] => 7323200 [patent_doc_number] => 20040137336 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-07-15 [patent_title] => 'Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid' [patent_app_type] => new [patent_app_number] => 10/342240 [patent_app_country] => US [patent_app_date] => 2003-01-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 6250 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 53 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0137/20040137336.pdf [firstpage_image] =>[orig_patent_app_number] => 10342240 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/342240
Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid Jan 14, 2003 Issued
Array ( [id] => 499231 [patent_doc_number] => 07205074 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-04-17 [patent_title] => 'Venting of pellicle cavity for a mask' [patent_app_type] => utility [patent_app_number] => 10/334841 [patent_app_country] => US [patent_app_date] => 2002-12-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 13 [patent_no_of_words] => 6844 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 39 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/205/07205074.pdf [firstpage_image] =>[orig_patent_app_number] => 10334841 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/334841
Venting of pellicle cavity for a mask Dec 30, 2002 Issued
Array ( [id] => 7177483 [patent_doc_number] => 20050123851 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-06-09 [patent_title] => 'Coating material for pattern fineness enhancement and method of forming fine pattern with the same' [patent_app_type] => utility [patent_app_number] => 10/500227 [patent_app_country] => US [patent_app_date] => 2002-12-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5515 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0123/20050123851.pdf [firstpage_image] =>[orig_patent_app_number] => 10500227 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/500227
Coating material for pattern fineness enhancement and method of forming fine pattern with the same Dec 25, 2002 Abandoned
Array ( [id] => 1164084 [patent_doc_number] => 06756167 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-06-29 [patent_title] => 'Overlay target design method to minimize impact of lens aberrations' [patent_app_type] => B2 [patent_app_number] => 10/322613 [patent_app_country] => US [patent_app_date] => 2002-12-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 17 [patent_no_of_words] => 4524 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/756/06756167.pdf [firstpage_image] =>[orig_patent_app_number] => 10322613 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/322613
Overlay target design method to minimize impact of lens aberrations Dec 18, 2002 Issued
Array ( [id] => 1286552 [patent_doc_number] => 06635402 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-10-21 [patent_title] => 'Devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system' [patent_app_type] => B2 [patent_app_number] => 10/323085 [patent_app_country] => US [patent_app_date] => 2002-12-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 4256 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 173 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/635/06635402.pdf [firstpage_image] =>[orig_patent_app_number] => 10323085 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/323085
Devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system Dec 17, 2002 Issued
Array ( [id] => 1012527 [patent_doc_number] => 06896998 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-05-24 [patent_title] => 'Pattern forming method' [patent_app_type] => utility [patent_app_number] => 10/320398 [patent_app_country] => US [patent_app_date] => 2002-12-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 18 [patent_no_of_words] => 2992 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/896/06896998.pdf [firstpage_image] =>[orig_patent_app_number] => 10320398 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/320398
Pattern forming method Dec 16, 2002 Issued
Array ( [id] => 948726 [patent_doc_number] => 06962762 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-11-08 [patent_title] => 'Exposure positioning in photolithography' [patent_app_type] => utility [patent_app_number] => 10/318470 [patent_app_country] => US [patent_app_date] => 2002-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 1662 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/962/06962762.pdf [firstpage_image] =>[orig_patent_app_number] => 10318470 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/318470
Exposure positioning in photolithography Dec 12, 2002 Issued
Array ( [id] => 6683061 [patent_doc_number] => 20030118925 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-06-26 [patent_title] => 'Scanning projection exposure apparatus and aligning method therefor' [patent_app_type] => new [patent_app_number] => 10/316051 [patent_app_country] => US [patent_app_date] => 2002-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 7280 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 145 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0118/20030118925.pdf [firstpage_image] =>[orig_patent_app_number] => 10316051 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/316051
Aligning method for a scanning projection exposure apparatus Dec 10, 2002 Issued
Array ( [id] => 923021 [patent_doc_number] => 07318993 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-01-15 [patent_title] => 'Resistless lithography method for fabricating fine structures' [patent_app_type] => utility [patent_app_number] => 10/499417 [patent_app_country] => US [patent_app_date] => 2002-12-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 19 [patent_no_of_words] => 2325 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 32 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/318/07318993.pdf [firstpage_image] =>[orig_patent_app_number] => 10499417 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/499417
Resistless lithography method for fabricating fine structures Dec 9, 2002 Issued
Array ( [id] => 1043542 [patent_doc_number] => 06866975 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-03-15 [patent_title] => 'Best focus determining method' [patent_app_type] => utility [patent_app_number] => 10/313733 [patent_app_country] => US [patent_app_date] => 2002-12-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 1355 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 157 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/866/06866975.pdf [firstpage_image] =>[orig_patent_app_number] => 10313733 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/313733
Best focus determining method Dec 4, 2002 Issued
Array ( [id] => 6636238 [patent_doc_number] => 20030211700 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-11-13 [patent_title] => 'Methods for critical dimension and focus mapping using critical dimension test marks' [patent_app_type] => new [patent_app_number] => 10/310640 [patent_app_country] => US [patent_app_date] => 2002-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 6358 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0211/20030211700.pdf [firstpage_image] =>[orig_patent_app_number] => 10310640 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/310640
Methods for critical dimension and focus mapping using critical dimension test marks Dec 3, 2002 Issued
Array ( [id] => 698215 [patent_doc_number] => 07067220 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-06-27 [patent_title] => 'Pattern compensation techniques for charged particle lithographic masks' [patent_app_type] => utility [patent_app_number] => 10/065963 [patent_app_country] => US [patent_app_date] => 2002-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 8 [patent_no_of_words] => 1867 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/067/07067220.pdf [firstpage_image] =>[orig_patent_app_number] => 10065963 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/065963
Pattern compensation techniques for charged particle lithographic masks Dec 3, 2002 Issued
Array ( [id] => 6658773 [patent_doc_number] => 20030134206 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-07-17 [patent_title] => 'Mask with programmed defects and method for the fabrication thereof' [patent_app_type] => new [patent_app_number] => 10/307800 [patent_app_country] => US [patent_app_date] => 2002-12-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 3267 [patent_no_of_claims] => 37 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 53 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0134/20030134206.pdf [firstpage_image] =>[orig_patent_app_number] => 10307800 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/307800
Mask with programmed defects and method for the fabrication thereof Dec 1, 2002 Issued
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