
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6704269
[patent_doc_number] => 20030151003
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-08-14
[patent_title] => 'Pattern writing and forming method'
[patent_app_type] => new
[patent_app_number] => 10/360801
[patent_app_country] => US
[patent_app_date] => 2003-02-10
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[pdf_file] => publications/A1/0151/20030151003.pdf
[firstpage_image] =>[orig_patent_app_number] => 10360801
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/360801 | Pattern writing and forming method | Feb 9, 2003 | Issued |
Array
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[patent_issue_date] => 2003-08-14
[patent_title] => 'Rule-based methods for proximity-effect correction of charged-particle-beam lithography pattern using subregion-approximation for determining pattern element bias'
[patent_app_type] => new
[patent_app_number] => 10/359800
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/359800 | Rule-based methods for proximity-effect correction of charged-particle-beam lithography pattern using subregion-approximation for determining pattern element bias | Feb 5, 2003 | Abandoned |
Array
(
[id] => 6706112
[patent_doc_number] => 20030152846
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[patent_issue_date] => 2003-08-14
[patent_title] => 'Photolithographic mask'
[patent_app_type] => new
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Array
(
[id] => 1040442
[patent_doc_number] => 06869739
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-03-22
[patent_title] => 'Integrated lithographic print and detection model for optical CD'
[patent_app_type] => utility
[patent_app_number] => 10/353900
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[patent_app_date] => 2003-01-28
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Array
(
[id] => 709982
[patent_doc_number] => 07056623
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[patent_kind] => B2
[patent_issue_date] => 2006-06-06
[patent_title] => 'Photomask and method for manufacturing the same'
[patent_app_type] => utility
[patent_app_number] => 10/350876
[patent_app_country] => US
[patent_app_date] => 2003-01-24
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Array
(
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[patent_title] => 'Manufacturing method of photomask'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/349590 | Manufacturing method of photomask | Jan 22, 2003 | Abandoned |
Array
(
[id] => 7308298
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[patent_title] => 'Conductive bi-layer e-beam resist with amorphous carbon'
[patent_app_type] => new
[patent_app_number] => 10/348690
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Array
(
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[patent_title] => 'Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid'
[patent_app_type] => new
[patent_app_number] => 10/342240
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[patent_app_date] => 2003-01-15
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Array
(
[id] => 499231
[patent_doc_number] => 07205074
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[patent_title] => 'Venting of pellicle cavity for a mask'
[patent_app_type] => utility
[patent_app_number] => 10/334841
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/334841 | Venting of pellicle cavity for a mask | Dec 30, 2002 | Issued |
Array
(
[id] => 7177483
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[patent_issue_date] => 2005-06-09
[patent_title] => 'Coating material for pattern fineness enhancement and method of forming fine pattern with the same'
[patent_app_type] => utility
[patent_app_number] => 10/500227
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Array
(
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[patent_title] => 'Overlay target design method to minimize impact of lens aberrations'
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Array
(
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[patent_title] => 'Devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system'
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Array
(
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Array
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Array
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Array
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[id] => 923021
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Array
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