
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 753838
[patent_doc_number] => 07018747
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-28
[patent_title] => 'Photomask having line end phase anchors'
[patent_app_type] => utility
[patent_app_number] => 10/261905
[patent_app_country] => US
[patent_app_date] => 2002-10-01
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/018/07018747.pdf
[firstpage_image] =>[orig_patent_app_number] => 10261905
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/261905 | Photomask having line end phase anchors | Sep 30, 2002 | Issued |
Array
(
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[patent_doc_number] => 06818360
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-11-16
[patent_title] => 'Quartz mask crack monitor system for reticle by acoustic and/or laser scatterometry'
[patent_app_type] => B1
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/261571 | Quartz mask crack monitor system for reticle by acoustic and/or laser scatterometry | Sep 29, 2002 | Issued |
Array
(
[id] => 6715717
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[patent_title] => 'Mask for measuring optical aberration and method of measuring optical aberration'
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[patent_app_date] => 2002-09-27
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Array
(
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[patent_title] => 'Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device'
[patent_app_type] => new
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/239657 | Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device | Sep 23, 2002 | Abandoned |
Array
(
[id] => 777083
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[patent_title] => 'Mechanically robust interconnect for low-k dielectric material using post treatment'
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Array
(
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[patent_title] => 'Method for generating a swing curve and photoresist feature formed using swing curve'
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Array
(
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[patent_title] => 'Photomask and method for evaluating an initial calibration for a scanning electron microscope'
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Array
(
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[patent_title] => 'Method for monitoring focus in lithography'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/244735 | Method for monitoring focus in lithography | Sep 16, 2002 | Abandoned |
Array
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Array
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[patent_title] => 'Charged-particle-beam microlithography reticles including exposure alignment marks associated with individual subfields'
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Array
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Array
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Array
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/213295 | Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication | Aug 5, 2002 | Issued |