Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 753838 [patent_doc_number] => 07018747 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-03-28 [patent_title] => 'Photomask having line end phase anchors' [patent_app_type] => utility [patent_app_number] => 10/261905 [patent_app_country] => US [patent_app_date] => 2002-10-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 23 [patent_no_of_words] => 4075 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/018/07018747.pdf [firstpage_image] =>[orig_patent_app_number] => 10261905 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/261905
Photomask having line end phase anchors Sep 30, 2002 Issued
Array ( [id] => 1098871 [patent_doc_number] => 06818360 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-11-16 [patent_title] => 'Quartz mask crack monitor system for reticle by acoustic and/or laser scatterometry' [patent_app_type] => B1 [patent_app_number] => 10/261571 [patent_app_country] => US [patent_app_date] => 2002-09-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 21 [patent_no_of_words] => 11368 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/818/06818360.pdf [firstpage_image] =>[orig_patent_app_number] => 10261571 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/261571
Quartz mask crack monitor system for reticle by acoustic and/or laser scatterometry Sep 29, 2002 Issued
Array ( [id] => 6715717 [patent_doc_number] => 20030027065 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-02-06 [patent_title] => 'Mask for measuring optical aberration and method of measuring optical aberration' [patent_app_type] => new [patent_app_number] => 10/255700 [patent_app_country] => US [patent_app_date] => 2002-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 18 [patent_no_of_words] => 29714 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 210 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0027/20030027065.pdf [firstpage_image] =>[orig_patent_app_number] => 10255700 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/255700
Method of measuring optical aberration Sep 26, 2002 Issued
Array ( [id] => 7376915 [patent_doc_number] => 20040028269 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-02-12 [patent_title] => 'Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device' [patent_app_type] => new [patent_app_number] => 10/239657 [patent_app_country] => US [patent_app_date] => 2002-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4401 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 15 [patent_words_short_claim] => 20 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0028/20040028269.pdf [firstpage_image] =>[orig_patent_app_number] => 10239657 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/239657
Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device Sep 23, 2002 Abandoned
Array ( [id] => 777083 [patent_doc_number] => 06998216 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-02-14 [patent_title] => 'Mechanically robust interconnect for low-k dielectric material using post treatment' [patent_app_type] => utility [patent_app_number] => 10/253723 [patent_app_country] => US [patent_app_date] => 2002-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 20 [patent_no_of_words] => 4396 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/998/06998216.pdf [firstpage_image] =>[orig_patent_app_number] => 10253723 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/253723
Mechanically robust interconnect for low-k dielectric material using post treatment Sep 23, 2002 Issued
Array ( [id] => 1188705 [patent_doc_number] => 06733936 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-05-11 [patent_title] => 'Method for generating a swing curve and photoresist feature formed using swing curve' [patent_app_type] => B1 [patent_app_number] => 10/247877 [patent_app_country] => US [patent_app_date] => 2002-09-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 5244 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/733/06733936.pdf [firstpage_image] =>[orig_patent_app_number] => 10247877 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/247877
Method for generating a swing curve and photoresist feature formed using swing curve Sep 18, 2002 Issued
Array ( [id] => 1049904 [patent_doc_number] => 06861181 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-03-01 [patent_title] => 'Photomask and method for evaluating an initial calibration for a scanning electron microscope' [patent_app_type] => utility [patent_app_number] => 10/247426 [patent_app_country] => US [patent_app_date] => 2002-09-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 11363 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/861/06861181.pdf [firstpage_image] =>[orig_patent_app_number] => 10247426 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/247426
Photomask and method for evaluating an initial calibration for a scanning electron microscope Sep 18, 2002 Issued
Array ( [id] => 6632172 [patent_doc_number] => 20030211411 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-11-13 [patent_title] => 'Method for monitoring focus in lithography' [patent_app_type] => new [patent_app_number] => 10/244735 [patent_app_country] => US [patent_app_date] => 2002-09-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1725 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0211/20030211411.pdf [firstpage_image] =>[orig_patent_app_number] => 10244735 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/244735
Method for monitoring focus in lithography Sep 16, 2002 Abandoned
Array ( [id] => 7462658 [patent_doc_number] => 20040053169 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-03-18 [patent_title] => 'Process and apparatus for minimizing thermal gradients across an advanced lithographic mask' [patent_app_type] => new [patent_app_number] => 10/065095 [patent_app_country] => US [patent_app_date] => 2002-09-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 2815 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0053/20040053169.pdf [firstpage_image] =>[orig_patent_app_number] => 10065095 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/065095
Process and apparatus for minimizing thermal gradients across an advanced lithographic mask Sep 16, 2002 Issued
Array ( [id] => 6778465 [patent_doc_number] => 20030049546 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-13 [patent_title] => 'Charged-particle-beam microlithography reticles including exposure alignment marks associated with individual subfields' [patent_app_type] => new [patent_app_number] => 10/236780 [patent_app_country] => US [patent_app_date] => 2002-09-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3860 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 39 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0049/20030049546.pdf [firstpage_image] =>[orig_patent_app_number] => 10236780 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/236780
Charged-particle-beam microlithography reticles including exposure alignment marks associated with individual subfields Sep 5, 2002 Abandoned
Array ( [id] => 6790021 [patent_doc_number] => 20030085365 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-08 [patent_title] => 'Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system' [patent_app_type] => new [patent_app_number] => 10/236681 [patent_app_country] => US [patent_app_date] => 2002-09-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 5354 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 225 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0085/20030085365.pdf [firstpage_image] =>[orig_patent_app_number] => 10236681 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/236681
Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system Sep 4, 2002 Issued
Array ( [id] => 1095433 [patent_doc_number] => 06821693 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-11-23 [patent_title] => 'Method for adjusting a multilevel phase-shifting mask or reticle' [patent_app_type] => B2 [patent_app_number] => 10/233970 [patent_app_country] => US [patent_app_date] => 2002-09-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 5 [patent_no_of_words] => 1614 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 124 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/821/06821693.pdf [firstpage_image] =>[orig_patent_app_number] => 10233970 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/233970
Method for adjusting a multilevel phase-shifting mask or reticle Sep 2, 2002 Issued
Array ( [id] => 6748838 [patent_doc_number] => 20030043358 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-06 [patent_title] => 'Methods for determining focus and astigmatism in charged-particle-beam microlithography' [patent_app_type] => new [patent_app_number] => 10/233083 [patent_app_country] => US [patent_app_date] => 2002-08-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 8154 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 197 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0043/20030043358.pdf [firstpage_image] =>[orig_patent_app_number] => 10233083 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/233083
Methods for determining focus and astigmatism in charged-particle-beam microlithography Aug 29, 2002 Abandoned
Array ( [id] => 6750177 [patent_doc_number] => 20030044697 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-06 [patent_title] => 'Methods and apparatus for correcting the proximity effect in a charged-particle-beam microlithography system and devices manufactured from the same' [patent_app_type] => new [patent_app_number] => 10/231587 [patent_app_country] => US [patent_app_date] => 2002-08-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 7916 [patent_no_of_claims] => 46 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20030044697.pdf [firstpage_image] =>[orig_patent_app_number] => 10231587 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/231587
Methods and apparatus for correcting the proximity effect in a charged-particle-beam microlithography system and devices manufactured from the same Aug 28, 2002 Abandoned
Array ( [id] => 7350995 [patent_doc_number] => 20040048173 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-03-11 [patent_title] => 'Using fiducial marks on a substrate for laser transfer of organic material from a donor to a substrate' [patent_app_type] => new [patent_app_number] => 10/230934 [patent_app_country] => US [patent_app_date] => 2002-08-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 8982 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0048/20040048173.pdf [firstpage_image] =>[orig_patent_app_number] => 10230934 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/230934
Using fiducial marks on a substrate for laser transfer of organic material from a donor to a substrate Aug 28, 2002 Issued
Array ( [id] => 6750183 [patent_doc_number] => 20030044703 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-06 [patent_title] => 'Methods for simulating resist development in microlithography' [patent_app_type] => new [patent_app_number] => 10/231822 [patent_app_country] => US [patent_app_date] => 2002-08-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 5457 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 244 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20030044703.pdf [firstpage_image] =>[orig_patent_app_number] => 10231822 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/231822
Methods for stimulating resist development in microlithography Aug 27, 2002 Issued
Array ( [id] => 1376592 [patent_doc_number] => 06555295 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-04-29 [patent_title] => 'Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed' [patent_app_type] => B1 [patent_app_number] => 10/229216 [patent_app_country] => US [patent_app_date] => 2002-08-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 22 [patent_figures_cnt] => 92 [patent_no_of_words] => 18778 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/555/06555295.pdf [firstpage_image] =>[orig_patent_app_number] => 10229216 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/229216
Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed Aug 27, 2002 Issued
Array ( [id] => 1148229 [patent_doc_number] => 06770408 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-08-03 [patent_title] => 'Dust particle inspection method for X-ray mask' [patent_app_type] => B2 [patent_app_number] => 10/223301 [patent_app_country] => US [patent_app_date] => 2002-08-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 43 [patent_no_of_words] => 8065 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 146 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/770/06770408.pdf [firstpage_image] =>[orig_patent_app_number] => 10223301 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/223301
Dust particle inspection method for X-ray mask Aug 19, 2002 Issued
Array ( [id] => 6838930 [patent_doc_number] => 20030036270 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-02-20 [patent_title] => 'Determining exposure time of wafer photolithography process' [patent_app_type] => new [patent_app_number] => 10/218376 [patent_app_country] => US [patent_app_date] => 2002-08-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5056 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 262 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0036/20030036270.pdf [firstpage_image] =>[orig_patent_app_number] => 10218376 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/218376
Determining exposure time of wafer photolithography process Aug 11, 2002 Issued
Array ( [id] => 6259569 [patent_doc_number] => 20020187410 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-12-12 [patent_title] => 'METHOD FOR PROVIDING AN ALIGNMENT DIFFRACTION GRATING FOR PHOTOLITHOGRAPHIC ALIGNMENT DURING SEMICONDUCTOR FABRICATION' [patent_app_type] => new [patent_app_number] => 10/213295 [patent_app_country] => US [patent_app_date] => 2002-08-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 5559 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0187/20020187410.pdf [firstpage_image] =>[orig_patent_app_number] => 10213295 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/213295
Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication Aug 5, 2002 Issued
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