
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6157312
[patent_doc_number] => 20020146628
[patent_country] => US
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[patent_issue_date] => 2002-10-10
[patent_title] => 'Method and apparatus for exposure, and device manufacturing method'
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[pdf_file] => publications/A1/0146/20020146628.pdf
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Array
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[patent_issue_date] => 2004-11-30
[patent_title] => 'Method and system for determining optimum optical proximity corrections within a photolithography system'
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Array
(
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[patent_title] => 'Gray scale all-glass photomasks'
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Array
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[patent_title] => 'Electron beam exposure mask and electron beam exposure method using the same'
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Array
(
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Array
(
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[patent_title] => 'Heat-depolymerizable polycarbonate sacrificial layer'
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Array
(
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[patent_title] => 'Optical proximity correction method utilizing phase-edges as sub-resolution assist features'
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Array
(
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[patent_title] => 'Alignment measuring method of photolithography process'
[patent_app_type] => B2
[patent_app_number] => 10/151163
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Array
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[id] => 1133091
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[patent_title] => 'Lithography correction method and device'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/150564 | Lithography correction method and device | May 16, 2002 | Issued |
Array
(
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[patent_title] => 'Overlay target design method to minimize impact of lens aberrations'
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Array
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Array
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Array
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Array
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