Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6157312 [patent_doc_number] => 20020146628 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-10-10 [patent_title] => 'Method and apparatus for exposure, and device manufacturing method' [patent_app_type] => new [patent_app_number] => 10/162383 [patent_app_country] => US [patent_app_date] => 2002-06-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 21407 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0146/20020146628.pdf [firstpage_image] =>[orig_patent_app_number] => 10162383 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/162383
Method and apparatus for exposure, and device manufacturing method Jun 4, 2002 Issued
Array ( [id] => 1092349 [patent_doc_number] => 06824937 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-11-30 [patent_title] => 'Method and system for determining optimum optical proximity corrections within a photolithography system' [patent_app_type] => B1 [patent_app_number] => 10/161450 [patent_app_country] => US [patent_app_date] => 2002-05-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 10 [patent_no_of_words] => 4248 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/824/06824937.pdf [firstpage_image] =>[orig_patent_app_number] => 10161450 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/161450
Method and system for determining optimum optical proximity corrections within a photolithography system May 30, 2002 Issued
Array ( [id] => 1409301 [patent_doc_number] => 06524756 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-25 [patent_title] => 'Gray scale all-glass photomasks' [patent_app_type] => B1 [patent_app_number] => 10/160573 [patent_app_country] => US [patent_app_date] => 2002-05-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 29 [patent_figures_cnt] => 35 [patent_no_of_words] => 41742 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/524/06524756.pdf [firstpage_image] =>[orig_patent_app_number] => 10160573 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/160573
Gray scale all-glass photomasks May 29, 2002 Issued
Array ( [id] => 938336 [patent_doc_number] => 06972165 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-12-06 [patent_title] => 'Electron beam exposure mask and electron beam exposure method using the same' [patent_app_type] => utility [patent_app_number] => 10/343228 [patent_app_country] => US [patent_app_date] => 2002-05-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 4125 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/972/06972165.pdf [firstpage_image] =>[orig_patent_app_number] => 10343228 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/343228
Electron beam exposure mask and electron beam exposure method using the same May 29, 2002 Issued
Array ( [id] => 6701372 [patent_doc_number] => 20030224252 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-12-04 [patent_title] => 'In-line focus monitor structure and method using top-down SEM' [patent_app_type] => new [patent_app_number] => 10/158469 [patent_app_country] => US [patent_app_date] => 2002-05-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 6354 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0224/20030224252.pdf [firstpage_image] =>[orig_patent_app_number] => 10158469 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/158469
In-line focus monitor structure and method using top-down SEM May 29, 2002 Issued
Array ( [id] => 6735231 [patent_doc_number] => 20030012866 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-01-16 [patent_title] => 'Heat-depolymerizable polycarbonate sacrificial layer' [patent_app_type] => new [patent_app_number] => 10/155855 [patent_app_country] => US [patent_app_date] => 2002-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2298 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 43 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0012/20030012866.pdf [firstpage_image] =>[orig_patent_app_number] => 10155855 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/155855
Method of using heat-depolymerizable polycarbonate sacrificial layer to create nano-fluidic devices May 23, 2002 Issued
Array ( [id] => 744039 [patent_doc_number] => 07026081 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-04-11 [patent_title] => 'Optical proximity correction method utilizing phase-edges as sub-resolution assist features' [patent_app_type] => utility [patent_app_number] => 10/152686 [patent_app_country] => US [patent_app_date] => 2002-05-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 23 [patent_figures_cnt] => 24 [patent_no_of_words] => 8027 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/026/07026081.pdf [firstpage_image] =>[orig_patent_app_number] => 10152686 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/152686
Optical proximity correction method utilizing phase-edges as sub-resolution assist features May 22, 2002 Issued
Array ( [id] => 1167359 [patent_doc_number] => 06753120 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-06-22 [patent_title] => 'Alignment measuring method of photolithography process' [patent_app_type] => B2 [patent_app_number] => 10/151163 [patent_app_country] => US [patent_app_date] => 2002-05-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 10 [patent_no_of_words] => 4142 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/753/06753120.pdf [firstpage_image] =>[orig_patent_app_number] => 10151163 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/151163
Alignment measuring method of photolithography process May 20, 2002 Issued
Array ( [id] => 1133091 [patent_doc_number] => 06783904 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-08-31 [patent_title] => 'Lithography correction method and device' [patent_app_type] => B2 [patent_app_number] => 10/150564 [patent_app_country] => US [patent_app_date] => 2002-05-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 4594 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 138 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/783/06783904.pdf [firstpage_image] =>[orig_patent_app_number] => 10150564 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/150564
Lithography correction method and device May 16, 2002 Issued
Array ( [id] => 5786804 [patent_doc_number] => 20020160284 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-10-31 [patent_title] => 'Overlay target design method to minimize impact of lens aberrations' [patent_app_type] => new [patent_app_number] => 10/141861 [patent_app_country] => US [patent_app_date] => 2002-05-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 4569 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0160/20020160284.pdf [firstpage_image] =>[orig_patent_app_number] => 10141861 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/141861
Overlay target exposure device utilizing pitch determination to minimize impact of lens aberrations May 9, 2002 Issued
Array ( [id] => 6632151 [patent_doc_number] => 20030211409 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-11-13 [patent_title] => 'Through-the-lens alignment for photolithography' [patent_app_type] => new [patent_app_number] => 10/143595 [patent_app_country] => US [patent_app_date] => 2002-05-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1874 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 196 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0211/20030211409.pdf [firstpage_image] =>[orig_patent_app_number] => 10143595 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/143595
Through-the-lens alignment for photolithography May 9, 2002 Issued
Array ( [id] => 6645532 [patent_doc_number] => 20030104292 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-06-05 [patent_title] => 'Semiconductor device and fabrication method therefor' [patent_app_type] => new [patent_app_number] => 10/142057 [patent_app_country] => US [patent_app_date] => 2002-05-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 5999 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 138 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0104/20030104292.pdf [firstpage_image] =>[orig_patent_app_number] => 10142057 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/142057
Semiconductor device and fabrication method therefor May 9, 2002 Abandoned
Array ( [id] => 6110809 [patent_doc_number] => 20020172876 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-11-21 [patent_title] => 'Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby' [patent_app_type] => new [patent_app_number] => 10/139625 [patent_app_country] => US [patent_app_date] => 2002-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 5550 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0172/20020172876.pdf [firstpage_image] =>[orig_patent_app_number] => 10139625 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/139625
Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby May 6, 2002 Issued
Array ( [id] => 1115041 [patent_doc_number] => 06800407 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-10-05 [patent_title] => 'Method for experimentally verifying imaging errors in photomasks' [patent_app_type] => B2 [patent_app_number] => 10/135684 [patent_app_country] => US [patent_app_date] => 2002-04-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 6563 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 255 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/800/06800407.pdf [firstpage_image] =>[orig_patent_app_number] => 10135684 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/135684
Method for experimentally verifying imaging errors in photomasks Apr 29, 2002 Issued
Array ( [id] => 6720580 [patent_doc_number] => 20030054268 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-20 [patent_title] => 'Method for experimentally verifying imaging errors in optical exposure units' [patent_app_type] => new [patent_app_number] => 10/135471 [patent_app_country] => US [patent_app_date] => 2002-04-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 7179 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0054/20030054268.pdf [firstpage_image] =>[orig_patent_app_number] => 10135471 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/135471
Method for experimentally verifying imaging errors in optical exposure units Apr 29, 2002 Issued
Array ( [id] => 1180102 [patent_doc_number] => 06737205 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-05-18 [patent_title] => 'Arrangement and method for transferring a pattern from a mask to a wafer' [patent_app_type] => B2 [patent_app_number] => 10/135463 [patent_app_country] => US [patent_app_date] => 2002-04-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 3741 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/737/06737205.pdf [firstpage_image] =>[orig_patent_app_number] => 10135463 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/135463
Arrangement and method for transferring a pattern from a mask to a wafer Apr 29, 2002 Issued
Array ( [id] => 6750182 [patent_doc_number] => 20030044702 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-06 [patent_title] => 'Semiconductor structure and method for determining critical dimensions and overlay error' [patent_app_type] => new [patent_app_number] => 10/134576 [patent_app_country] => US [patent_app_date] => 2002-04-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4945 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20030044702.pdf [firstpage_image] =>[orig_patent_app_number] => 10134576 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/134576
Semiconductor structure and method for determining critical dimensions and overlay error Apr 28, 2002 Issued
Array ( [id] => 6524921 [patent_doc_number] => 20020192598 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-12-19 [patent_title] => 'Methods and apparatus for detecting and correcting reticle deformations in microlithography' [patent_app_type] => new [patent_app_number] => 10/132343 [patent_app_country] => US [patent_app_date] => 2002-04-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 10773 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 235 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0192/20020192598.pdf [firstpage_image] =>[orig_patent_app_number] => 10132343 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/132343
Methods and apparatus for detecting and correcting reticle deformations in microlithography Apr 23, 2002 Issued
Array ( [id] => 6800083 [patent_doc_number] => 20030095247 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-22 [patent_title] => 'Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device' [patent_app_type] => new [patent_app_number] => 10/127434 [patent_app_country] => US [patent_app_date] => 2002-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 9607 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 166 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0095/20030095247.pdf [firstpage_image] =>[orig_patent_app_number] => 10127434 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/127434
Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device Apr 22, 2002 Issued
Array ( [id] => 1104306 [patent_doc_number] => 06811939 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-11-02 [patent_title] => 'Focus monitoring method, focus monitoring system, and device fabricating method' [patent_app_type] => B2 [patent_app_number] => 10/126607 [patent_app_country] => US [patent_app_date] => 2002-04-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 18 [patent_no_of_words] => 5549 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/811/06811939.pdf [firstpage_image] =>[orig_patent_app_number] => 10126607 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/126607
Focus monitoring method, focus monitoring system, and device fabricating method Apr 21, 2002 Issued
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