
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6110866
[patent_doc_number] => 20020172896
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-11-21
[patent_title] => 'Antireflective coating compositions'
[patent_app_type] => new
[patent_app_number] => 10/126636
[patent_app_country] => US
[patent_app_date] => 2002-04-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10316
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 25
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0172/20020172896.pdf
[firstpage_image] =>[orig_patent_app_number] => 10126636
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/126636 | Antireflective coating compositions and exposure methods under 200 nm | Apr 19, 2002 | Issued |
Array
(
[id] => 532604
[patent_doc_number] => 07175951
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2007-02-13
[patent_title] => 'Two mask in-situ overlay checking method'
[patent_app_type] => utility
[patent_app_number] => 10/126388
[patent_app_country] => US
[patent_app_date] => 2002-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 17
[patent_no_of_words] => 3650
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 78
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/175/07175951.pdf
[firstpage_image] =>[orig_patent_app_number] => 10126388
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/126388 | Two mask in-situ overlay checking method | Apr 18, 2002 | Issued |
Array
(
[id] => 6469447
[patent_doc_number] => 20020151140
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-17
[patent_title] => 'Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same'
[patent_app_type] => new
[patent_app_number] => 10/122393
[patent_app_country] => US
[patent_app_date] => 2002-04-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 13
[patent_no_of_words] => 9042
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 163
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0151/20020151140.pdf
[firstpage_image] =>[orig_patent_app_number] => 10122393
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/122393 | Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same | Apr 15, 2002 | Issued |
Array
(
[id] => 1245454
[patent_doc_number] => 06677089
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-01-13
[patent_title] => 'Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method'
[patent_app_type] => B2
[patent_app_number] => 10/120171
[patent_app_country] => US
[patent_app_date] => 2002-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 53
[patent_figures_cnt] => 81
[patent_no_of_words] => 20885
[patent_no_of_claims] => 47
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/677/06677089.pdf
[firstpage_image] =>[orig_patent_app_number] => 10120171
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/120171 | Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method | Apr 10, 2002 | Issued |
Array
(
[id] => 1263917
[patent_doc_number] => 06660439
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-12-09
[patent_title] => 'Method to reduce data size and data preparation time for optical proximity correction of photo masks'
[patent_app_type] => B1
[patent_app_number] => 10/117949
[patent_app_country] => US
[patent_app_date] => 2002-04-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 1909
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 178
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/660/06660439.pdf
[firstpage_image] =>[orig_patent_app_number] => 10117949
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/117949 | Method to reduce data size and data preparation time for optical proximity correction of photo masks | Apr 7, 2002 | Issued |
Array
(
[id] => 6813459
[patent_doc_number] => 20030073009
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-04-17
[patent_title] => 'Photomask for focus monitoring, method of focus monitoring, unit for focus monitoring and manufacturing method for a unit'
[patent_app_type] => new
[patent_app_number] => 10/115246
[patent_app_country] => US
[patent_app_date] => 2002-04-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 42
[patent_figures_cnt] => 42
[patent_no_of_words] => 22634
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 151
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0073/20030073009.pdf
[firstpage_image] =>[orig_patent_app_number] => 10115246
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/115246 | Photomask for focus monitoring | Apr 3, 2002 | Issued |
Array
(
[id] => 5905532
[patent_doc_number] => 20020142238
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-03
[patent_title] => 'Manufacturing method of semiconductor device, exposure data preparing method, preparing method of aperture mask data, and charge beam exposure apparatus'
[patent_app_type] => new
[patent_app_number] => 10/107042
[patent_app_country] => US
[patent_app_date] => 2002-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3087
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0142/20020142238.pdf
[firstpage_image] =>[orig_patent_app_number] => 10107042
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/107042 | Method of preparing exposure data and method of preparing aperture mask data | Mar 27, 2002 | Issued |
Array
(
[id] => 1255812
[patent_doc_number] => 06667139
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-12-23
[patent_title] => 'Method of manufacturing semiconductor device'
[patent_app_type] => B2
[patent_app_number] => 10/107246
[patent_app_country] => US
[patent_app_date] => 2002-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 26
[patent_figures_cnt] => 46
[patent_no_of_words] => 12873
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 505
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/667/06667139.pdf
[firstpage_image] =>[orig_patent_app_number] => 10107246
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/107246 | Method of manufacturing semiconductor device | Mar 27, 2002 | Issued |
Array
(
[id] => 1148220
[patent_doc_number] => 06770407
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-03
[patent_title] => 'Methods for monitoring photoresists'
[patent_app_type] => B2
[patent_app_number] => 10/108194
[patent_app_country] => US
[patent_app_date] => 2002-03-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 4219
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 63
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/770/06770407.pdf
[firstpage_image] =>[orig_patent_app_number] => 10108194
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/108194 | Methods for monitoring photoresists | Mar 25, 2002 | Issued |
Array
(
[id] => 6533608
[patent_doc_number] => 20020136971
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-26
[patent_title] => 'Manufacturing system in electronic devices'
[patent_app_type] => new
[patent_app_number] => 10/092486
[patent_app_country] => US
[patent_app_date] => 2002-03-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 21
[patent_figures_cnt] => 21
[patent_no_of_words] => 13158
[patent_no_of_claims] => 60
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 54
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0136/20020136971.pdf
[firstpage_image] =>[orig_patent_app_number] => 10092486
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/092486 | Manufacturing system in electronic devices | Mar 7, 2002 | Issued |
Array
(
[id] => 6696624
[patent_doc_number] => 20030108818
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-06-12
[patent_title] => 'Method and apparatus for modification of chemically amplified photoresist by electron beam exposure'
[patent_app_type] => new
[patent_app_number] => 10/090465
[patent_app_country] => US
[patent_app_date] => 2002-03-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 10327
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 127
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0108/20030108818.pdf
[firstpage_image] =>[orig_patent_app_number] => 10090465
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/090465 | Method and apparatus for modification of chemically amplified photoresist by electron beam exposure | Mar 3, 2002 | Issued |
Array
(
[id] => 1235177
[patent_doc_number] => 06689520
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-02-10
[patent_title] => 'Exposure method for correcting dimension variation in electron beam lithography'
[patent_app_type] => B2
[patent_app_number] => 10/080032
[patent_app_country] => US
[patent_app_date] => 2002-02-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 2670
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 157
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/689/06689520.pdf
[firstpage_image] =>[orig_patent_app_number] => 10080032
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/080032 | Exposure method for correcting dimension variation in electron beam lithography | Feb 20, 2002 | Issued |
Array
(
[id] => 1266247
[patent_doc_number] => 06656663
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-12-02
[patent_title] => 'Microlithographic exposure methods using a segmented reticle defining pattern elements exhibiting reduced incidence of stitching anomalies when imaged on a substrate'
[patent_app_type] => B2
[patent_app_number] => 10/077337
[patent_app_country] => US
[patent_app_date] => 2002-02-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 64
[patent_no_of_words] => 8318
[patent_no_of_claims] => 58
[patent_no_of_ind_claims] => 12
[patent_words_short_claim] => 121
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/656/06656663.pdf
[firstpage_image] =>[orig_patent_app_number] => 10077337
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/077337 | Microlithographic exposure methods using a segmented reticle defining pattern elements exhibiting reduced incidence of stitching anomalies when imaged on a substrate | Feb 14, 2002 | Issued |
Array
(
[id] => 6842850
[patent_doc_number] => 20030148197
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-08-07
[patent_title] => 'METHOD FOR PATTERNING SEMICONDUCTORS THROUGH ADJUSTMENT OF IMAGE PEAK SIDE LOBES'
[patent_app_type] => new
[patent_app_number] => 10/060769
[patent_app_country] => US
[patent_app_date] => 2002-02-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 2479
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0148/20030148197.pdf
[firstpage_image] =>[orig_patent_app_number] => 10060769
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/060769 | Method for patterning semiconductors through adjustment of image peak side lobes | Jan 31, 2002 | Issued |
Array
(
[id] => 6206732
[patent_doc_number] => 20020071107
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-13
[patent_title] => 'Layout designing method of a dispaly device'
[patent_app_type] => new
[patent_app_number] => 10/058990
[patent_app_country] => US
[patent_app_date] => 2002-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 26
[patent_figures_cnt] => 26
[patent_no_of_words] => 4533
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0071/20020071107.pdf
[firstpage_image] =>[orig_patent_app_number] => 10058990
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/058990 | Layout designing method of a display device | Jan 29, 2002 | Issued |
Array
(
[id] => 6850082
[patent_doc_number] => 20030142284
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-07-31
[patent_title] => 'Multiple mask step and scan aligner'
[patent_app_type] => new
[patent_app_number] => 10/056650
[patent_app_country] => US
[patent_app_date] => 2002-01-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 4592
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 93
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0142/20030142284.pdf
[firstpage_image] =>[orig_patent_app_number] => 10056650
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/056650 | Multiple mask step and scan aligner | Jan 27, 2002 | Issued |
Array
(
[id] => 1453040
[patent_doc_number] => 06461776
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-08
[patent_title] => 'Resist pattern forming method using anti-reflective layer, with variable extinction coefficient'
[patent_app_type] => B1
[patent_app_number] => 10/054932
[patent_app_country] => US
[patent_app_date] => 2002-01-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
[patent_figures_cnt] => 92
[patent_no_of_words] => 18902
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 141
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/461/06461776.pdf
[firstpage_image] =>[orig_patent_app_number] => 10054932
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/054932 | Resist pattern forming method using anti-reflective layer, with variable extinction coefficient | Jan 24, 2002 | Issued |
Array
(
[id] => 6738155
[patent_doc_number] => 20030155523
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-08-21
[patent_title] => 'Apparatus and a method for forming a pattern using a crystal structure of material'
[patent_app_type] => new
[patent_app_number] => 10/220364
[patent_app_country] => US
[patent_app_date] => 2002-08-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
[patent_figures_cnt] => 25
[patent_no_of_words] => 5341
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 65
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0155/20030155523.pdf
[firstpage_image] =>[orig_patent_app_number] => 10220364
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/220364 | Apparatus and a method for forming a pattern using a crystal structure of material | Jan 23, 2002 | Issued |
Array
(
[id] => 5985568
[patent_doc_number] => 20020098423
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-25
[patent_title] => 'Electron beam projection mask'
[patent_app_type] => new
[patent_app_number] => 10/055689
[patent_app_country] => US
[patent_app_date] => 2002-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2550
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 26
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0098/20020098423.pdf
[firstpage_image] =>[orig_patent_app_number] => 10055689
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/055689 | Electron beam projection mask | Jan 22, 2002 | Issued |
Array
(
[id] => 6548570
[patent_doc_number] => 20020111038
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-15
[patent_title] => 'Method and system for processing a semi-conductor device'
[patent_app_type] => new
[patent_app_number] => 10/052513
[patent_app_country] => US
[patent_app_date] => 2002-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 8812
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 237
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0111/20020111038.pdf
[firstpage_image] =>[orig_patent_app_number] => 10052513
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/052513 | Method and system for processing a semi-conductor device | Jan 22, 2002 | Issued |