Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6582202 [patent_doc_number] => 20020041369 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-04-11 [patent_title] => 'Method and device for improved lithographic critical dimension control' [patent_app_type] => new [patent_app_number] => 10/000040 [patent_app_country] => US [patent_app_date] => 2001-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2554 [patent_no_of_claims] => 48 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0041/20020041369.pdf [firstpage_image] =>[orig_patent_app_number] => 10000040 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/000040
Method for improved lithographic critical dimension control Dec 3, 2001 Issued
Array ( [id] => 1266179 [patent_doc_number] => 06656648 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-12-02 [patent_title] => 'Pattern inspection apparatus, pattern inspection method and mask manufacturing method' [patent_app_type] => B2 [patent_app_number] => 09/990357 [patent_app_country] => US [patent_app_date] => 2001-11-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 17 [patent_no_of_words] => 4646 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/656/06656648.pdf [firstpage_image] =>[orig_patent_app_number] => 09990357 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/990357
Pattern inspection apparatus, pattern inspection method and mask manufacturing method Nov 22, 2001 Issued
Array ( [id] => 6860899 [patent_doc_number] => 20030091907 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-15 [patent_title] => 'Reverse tone process for masks' [patent_app_type] => new [patent_app_number] => 09/992767 [patent_app_country] => US [patent_app_date] => 2001-11-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1713 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 53 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0091/20030091907.pdf [firstpage_image] =>[orig_patent_app_number] => 09992767 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/992767
Reverse tone process for masks Nov 13, 2001 Issued
Array ( [id] => 1544557 [patent_doc_number] => 06444375 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-03 [patent_title] => 'Method for manufacturing a mask' [patent_app_type] => B1 [patent_app_number] => 10/054461 [patent_app_country] => US [patent_app_date] => 2001-11-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 14 [patent_no_of_words] => 5495 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/444/06444375.pdf [firstpage_image] =>[orig_patent_app_number] => 10054461 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/054461
Method for manufacturing a mask Nov 11, 2001 Issued
Array ( [id] => 1125862 [patent_doc_number] => 06790570 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-09-14 [patent_title] => 'Method of using scatterometry measurements to control stepper process parameters' [patent_app_type] => B1 [patent_app_number] => 10/005486 [patent_app_country] => US [patent_app_date] => 2001-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 9 [patent_no_of_words] => 7840 [patent_no_of_claims] => 98 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 118 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/790/06790570.pdf [firstpage_image] =>[orig_patent_app_number] => 10005486 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/005486
Method of using scatterometry measurements to control stepper process parameters Nov 7, 2001 Issued
Array ( [id] => 6316520 [patent_doc_number] => 20020195539 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-12-26 [patent_title] => 'Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device' [patent_app_type] => new [patent_app_number] => 09/986084 [patent_app_country] => US [patent_app_date] => 2001-11-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 18 [patent_no_of_words] => 6325 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0195/20020195539.pdf [firstpage_image] =>[orig_patent_app_number] => 09986084 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/986084
Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device Nov 6, 2001 Issued
Array ( [id] => 6357649 [patent_doc_number] => 20020058187 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-05-16 [patent_title] => 'Method of correcting mask patterns' [patent_app_type] => new [patent_app_number] => 09/985810 [patent_app_country] => US [patent_app_date] => 2001-11-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 4439 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0058/20020058187.pdf [firstpage_image] =>[orig_patent_app_number] => 09985810 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/985810
Method of correcting mask patterns Nov 5, 2001 Issued
Array ( [id] => 1544576 [patent_doc_number] => 06444382 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-03 [patent_title] => 'Straight line defect detection tool' [patent_app_type] => B1 [patent_app_number] => 09/985281 [patent_app_country] => US [patent_app_date] => 2001-11-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 11 [patent_no_of_words] => 6156 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 241 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/444/06444382.pdf [firstpage_image] =>[orig_patent_app_number] => 09985281 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/985281
Straight line defect detection tool Nov 1, 2001 Issued
Array ( [id] => 1247837 [patent_doc_number] => 06673498 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-01-06 [patent_title] => 'Method for reticle formation utilizing metal vaporization' [patent_app_type] => B1 [patent_app_number] => 10/053537 [patent_app_country] => US [patent_app_date] => 2001-11-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 16 [patent_no_of_words] => 4586 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/673/06673498.pdf [firstpage_image] =>[orig_patent_app_number] => 10053537 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/053537
Method for reticle formation utilizing metal vaporization Nov 1, 2001 Issued
Array ( [id] => 6869778 [patent_doc_number] => 20030082467 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-01 [patent_title] => 'Semiconductor design for improved detection of out-of-focus conditions' [patent_app_type] => new [patent_app_number] => 10/003508 [patent_app_country] => US [patent_app_date] => 2001-11-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2624 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0082/20030082467.pdf [firstpage_image] =>[orig_patent_app_number] => 10003508 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/003508
Semiconductor design for improved detection of out-of-focus conditions Oct 31, 2001 Issued
Array ( [id] => 1148165 [patent_doc_number] => 06770402 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-08-03 [patent_title] => 'Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same' [patent_app_type] => B2 [patent_app_number] => 09/984475 [patent_app_country] => US [patent_app_date] => 2001-10-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 106 [patent_no_of_words] => 17292 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 34 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/770/06770402.pdf [firstpage_image] =>[orig_patent_app_number] => 09984475 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/984475
Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same Oct 29, 2001 Issued
Array ( [id] => 1161756 [patent_doc_number] => 06759173 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-07-06 [patent_title] => 'Single mask process for patterning microchip having grayscale and micromachined features' [patent_app_type] => B2 [patent_app_number] => 09/999332 [patent_app_country] => US [patent_app_date] => 2001-10-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 13 [patent_no_of_words] => 3887 [patent_no_of_claims] => 44 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 162 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/759/06759173.pdf [firstpage_image] =>[orig_patent_app_number] => 09999332 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/999332
Single mask process for patterning microchip having grayscale and micromachined features Oct 25, 2001 Issued
Array ( [id] => 6095587 [patent_doc_number] => 20020051943 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-05-02 [patent_title] => 'Method of manufacturing an electronic device and a semiconductor integrated circuit device' [patent_app_type] => new [patent_app_number] => 09/983172 [patent_app_country] => US [patent_app_date] => 2001-10-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 9349 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 11 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0051/20020051943.pdf [firstpage_image] =>[orig_patent_app_number] => 09983172 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/983172
Method of manufacturing an electronic device and a semiconductor integrated circuit device Oct 22, 2001 Issued
Array ( [id] => 1230848 [patent_doc_number] => 06692877 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-02-17 [patent_title] => 'Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same' [patent_app_type] => B2 [patent_app_number] => 09/982051 [patent_app_country] => US [patent_app_date] => 2001-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 20 [patent_figures_cnt] => 58 [patent_no_of_words] => 4732 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 23 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/692/06692877.pdf [firstpage_image] =>[orig_patent_app_number] => 09982051 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/982051
Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same Oct 16, 2001 Issued
Array ( [id] => 6655071 [patent_doc_number] => 20030077529 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-04-24 [patent_title] => 'Check board replacement systems' [patent_app_type] => new [patent_app_number] => 09/978893 [patent_app_country] => US [patent_app_date] => 2001-10-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 1827 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0077/20030077529.pdf [firstpage_image] =>[orig_patent_app_number] => 09978893 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/978893
Check board replacement systems Oct 14, 2001 Abandoned
Array ( [id] => 6655068 [patent_doc_number] => 20030077527 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-04-24 [patent_title] => 'Combined layer-to-layer and within-layer overlay control system' [patent_app_type] => new [patent_app_number] => 09/977792 [patent_app_country] => US [patent_app_date] => 2001-10-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 4419 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 353 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0077/20030077527.pdf [firstpage_image] =>[orig_patent_app_number] => 09977792 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/977792
Combined layer-to-layer and within-layer overlay control system Oct 14, 2001 Issued
Array ( [id] => 5921466 [patent_doc_number] => 20020115002 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-22 [patent_title] => 'Template for room temperature, low pressure micro-and nano-imprint lithography' [patent_app_type] => new [patent_app_number] => 09/976681 [patent_app_country] => US [patent_app_date] => 2001-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 19557 [patent_no_of_claims] => 173 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0115/20020115002.pdf [firstpage_image] =>[orig_patent_app_number] => 09976681 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/976681
Template for room temperature, low pressure micro-and nano-imprint lithography Oct 11, 2001 Issued
Array ( [id] => 1230936 [patent_doc_number] => 06692901 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-02-17 [patent_title] => 'Method for fabricating a resist pattern, a method for patterning a thin film and a method for manufacturing a micro device' [patent_app_type] => B2 [patent_app_number] => 09/964398 [patent_app_country] => US [patent_app_date] => 2001-09-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 24 [patent_no_of_words] => 3261 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 123 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/692/06692901.pdf [firstpage_image] =>[orig_patent_app_number] => 09964398 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/964398
Method for fabricating a resist pattern, a method for patterning a thin film and a method for manufacturing a micro device Sep 27, 2001 Issued
Array ( [id] => 1239191 [patent_doc_number] => 06686108 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-02-03 [patent_title] => 'Fabrication method of semiconductor integrated circuit device' [patent_app_type] => B2 [patent_app_number] => 09/964341 [patent_app_country] => US [patent_app_date] => 2001-09-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 41 [patent_no_of_words] => 12448 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 144 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/686/06686108.pdf [firstpage_image] =>[orig_patent_app_number] => 09964341 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/964341
Fabrication method of semiconductor integrated circuit device Sep 27, 2001 Issued
Array ( [id] => 6674116 [patent_doc_number] => 20030059719 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-27 [patent_title] => 'Post exposure modification of critical dimensions in mask fabrication' [patent_app_type] => new [patent_app_number] => 09/965280 [patent_app_country] => US [patent_app_date] => 2001-09-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 9551 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 26 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0059/20030059719.pdf [firstpage_image] =>[orig_patent_app_number] => 09965280 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/965280
Post exposure modification of critical dimensions in mask fabrication Sep 25, 2001 Issued
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