
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5814630
[patent_doc_number] => 20020039705
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-04-04
[patent_title] => 'Stamper manufacturing method'
[patent_app_type] => new
[patent_app_number] => 09/960492
[patent_app_country] => US
[patent_app_date] => 2001-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 4398
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0039/20020039705.pdf
[firstpage_image] =>[orig_patent_app_number] => 09960492
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/960492 | Stamper manufacturing method | Sep 23, 2001 | Issued |
Array
(
[id] => 1283950
[patent_doc_number] => 06638665
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-10-28
[patent_title] => 'Method and apparatus for designing EB mask'
[patent_app_type] => B2
[patent_app_number] => 09/956143
[patent_app_country] => US
[patent_app_date] => 2001-09-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 13
[patent_no_of_words] => 5303
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 93
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/638/06638665.pdf
[firstpage_image] =>[orig_patent_app_number] => 09956143
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/956143 | Method and apparatus for designing EB mask | Sep 19, 2001 | Issued |
Array
(
[id] => 6592116
[patent_doc_number] => 20020042009
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-04-11
[patent_title] => 'Methods and apparatus for controlling beam blur in charged-particle-beam microlithography'
[patent_app_type] => new
[patent_app_number] => 09/951111
[patent_app_country] => US
[patent_app_date] => 2001-09-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 4812
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 126
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0042/20020042009.pdf
[firstpage_image] =>[orig_patent_app_number] => 09951111
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/951111 | Methods and apparatus for controlling beam blur in charged-particle-beam microlithography | Sep 9, 2001 | Issued |
Array
(
[id] => 6592049
[patent_doc_number] => 20020042006
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-04-11
[patent_title] => 'Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion'
[patent_app_type] => new
[patent_app_number] => 09/944531
[patent_app_country] => US
[patent_app_date] => 2001-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4098
[patent_no_of_claims] => 33
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0042/20020042006.pdf
[firstpage_image] =>[orig_patent_app_number] => 09944531
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/944531 | Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion | Aug 30, 2001 | Issued |
Array
(
[id] => 1239189
[patent_doc_number] => 06686107
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-02-03
[patent_title] => 'Method for producing a semiconductor device'
[patent_app_type] => B2
[patent_app_number] => 09/943140
[patent_app_country] => US
[patent_app_date] => 2001-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 14
[patent_no_of_words] => 5984
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 295
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/686/06686107.pdf
[firstpage_image] =>[orig_patent_app_number] => 09943140
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/943140 | Method for producing a semiconductor device | Aug 30, 2001 | Issued |
Array
(
[id] => 6750180
[patent_doc_number] => 20030044700
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-06
[patent_title] => 'Method of figuring exposure energy'
[patent_app_type] => new
[patent_app_number] => 09/945068
[patent_app_country] => US
[patent_app_date] => 2001-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2191
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0044/20030044700.pdf
[firstpage_image] =>[orig_patent_app_number] => 09945068
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/945068 | Method of figuring exposure energy | Aug 30, 2001 | Issued |
Array
(
[id] => 6750181
[patent_doc_number] => 20030044701
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-06
[patent_title] => 'Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates'
[patent_app_type] => new
[patent_app_number] => 09/945316
[patent_app_country] => US
[patent_app_date] => 2001-08-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 5349
[patent_no_of_claims] => 69
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 134
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0044/20030044701.pdf
[firstpage_image] =>[orig_patent_app_number] => 09945316
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/945316 | Method for controlling radiation beam intensity directed to microlithographic substrates | Aug 29, 2001 | Issued |
Array
(
[id] => 757085
[patent_doc_number] => 07014955
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-21
[patent_title] => 'System and method for indentifying dummy features on a mask layer'
[patent_app_type] => utility
[patent_app_number] => 09/941453
[patent_app_country] => US
[patent_app_date] => 2001-08-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 22
[patent_no_of_words] => 7406
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 45
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/014/07014955.pdf
[firstpage_image] =>[orig_patent_app_number] => 09941453
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/941453 | System and method for indentifying dummy features on a mask layer | Aug 27, 2001 | Issued |
Array
(
[id] => 1266175
[patent_doc_number] => 06656647
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-12-02
[patent_title] => 'Method for examining structures on a wafer'
[patent_app_type] => B2
[patent_app_number] => 09/935353
[patent_app_country] => US
[patent_app_date] => 2001-08-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2701
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/656/06656647.pdf
[firstpage_image] =>[orig_patent_app_number] => 09935353
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/935353 | Method for examining structures on a wafer | Aug 21, 2001 | Issued |
Array
(
[id] => 6033292
[patent_doc_number] => 20020019305
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-02-14
[patent_title] => 'Gray scale all-glass photomasks'
[patent_app_type] => new
[patent_app_number] => 09/934218
[patent_app_country] => US
[patent_app_date] => 2001-08-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 29
[patent_figures_cnt] => 29
[patent_no_of_words] => 42116
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 114
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0019/20020019305.pdf
[firstpage_image] =>[orig_patent_app_number] => 09934218
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/934218 | Gray scale all-glass photomasks | Aug 20, 2001 | Abandoned |
Array
(
[id] => 6325565
[patent_doc_number] => 20020197543
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-26
[patent_title] => 'Phase conflict resolution for photolithographic masks'
[patent_app_type] => new
[patent_app_number] => 09/932239
[patent_app_country] => US
[patent_app_date] => 2001-08-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 6931
[patent_no_of_claims] => 95
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 39
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0197/20020197543.pdf
[firstpage_image] =>[orig_patent_app_number] => 09932239
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/932239 | Phase conflict resolution for photolithographic masks | Aug 16, 2001 | Issued |
Array
(
[id] => 1286479
[patent_doc_number] => 06635395
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-10-21
[patent_title] => 'Method for exposing a layout comprising multiple layers on a wafer'
[patent_app_type] => B2
[patent_app_number] => 09/927238
[patent_app_country] => US
[patent_app_date] => 2001-08-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 8154
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 233
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/635/06635395.pdf
[firstpage_image] =>[orig_patent_app_number] => 09927238
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/927238 | Method for exposing a layout comprising multiple layers on a wafer | Aug 12, 2001 | Issued |
Array
(
[id] => 6715732
[patent_doc_number] => 20030027080
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-06
[patent_title] => 'Method for reducing line edge roughness of photoresist'
[patent_app_type] => new
[patent_app_number] => 09/919868
[patent_app_country] => US
[patent_app_date] => 2001-08-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 1834
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 34
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0027/20030027080.pdf
[firstpage_image] =>[orig_patent_app_number] => 09919868
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/919868 | Method for reducing line edge roughness of patterned photoresist | Aug 1, 2001 | Issued |
Array
(
[id] => 6404363
[patent_doc_number] => 20020037460
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-03-28
[patent_title] => 'Stage unit, measurement unit and measurement method, and exposure apparatus and exposure method'
[patent_app_type] => new
[patent_app_number] => 09/919940
[patent_app_country] => US
[patent_app_date] => 2001-08-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 12871
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 61
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0037/20020037460.pdf
[firstpage_image] =>[orig_patent_app_number] => 09919940
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/919940 | Stage unit, measurement unit and measurement method, and exposure apparatus and exposure method | Aug 1, 2001 | Abandoned |
Array
(
[id] => 1276827
[patent_doc_number] => 06645683
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-11-11
[patent_title] => 'Control system and methods for photolithographic processes'
[patent_app_type] => B2
[patent_app_number] => 09/919230
[patent_app_country] => US
[patent_app_date] => 2001-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 4405
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 146
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/645/06645683.pdf
[firstpage_image] =>[orig_patent_app_number] => 09919230
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/919230 | Control system and methods for photolithographic processes | Jul 30, 2001 | Issued |
Array
(
[id] => 6746218
[patent_doc_number] => 20030023401
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-30
[patent_title] => 'Method and apparatus for allowing phase conflicts in phase shifting mask and chromeless phase edges'
[patent_app_type] => new
[patent_app_number] => 09/917581
[patent_app_country] => US
[patent_app_date] => 2001-07-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 4839
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0023/20030023401.pdf
[firstpage_image] =>[orig_patent_app_number] => 09917581
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/917581 | Method and apparatus for allowing phase conflicts in phase shifting mask and chromeless phase edges | Jul 26, 2001 | Issued |
Array
(
[id] => 5888280
[patent_doc_number] => 20020012858
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-01-31
[patent_title] => 'Exposure method for overlaying one mask pattern on another'
[patent_app_type] => new
[patent_app_number] => 09/915285
[patent_app_country] => US
[patent_app_date] => 2001-07-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 28
[patent_figures_cnt] => 28
[patent_no_of_words] => 39427
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 169
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0012/20020012858.pdf
[firstpage_image] =>[orig_patent_app_number] => 09915285
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/915285 | Exposure method for overlaying one mask pattern on another | Jul 26, 2001 | Issued |
Array
(
[id] => 1564784
[patent_doc_number] => 06376134
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-04-23
[patent_title] => 'Direct image processing of printed circuits boards'
[patent_app_type] => B2
[patent_app_number] => 09/909546
[patent_app_country] => US
[patent_app_date] => 2001-07-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 21
[patent_figures_cnt] => 23
[patent_no_of_words] => 8986
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 182
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/376/06376134.pdf
[firstpage_image] =>[orig_patent_app_number] => 09909546
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/909546 | Direct image processing of printed circuits boards | Jul 18, 2001 | Issued |
Array
(
[id] => 1484612
[patent_doc_number] => 06365333
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-04-02
[patent_title] => 'Low temperature anti-reflective coating for IC lithography'
[patent_app_type] => B2
[patent_app_number] => 09/907339
[patent_app_country] => US
[patent_app_date] => 2001-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 5059
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 60
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/365/06365333.pdf
[firstpage_image] =>[orig_patent_app_number] => 09907339
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/907339 | Low temperature anti-reflective coating for IC lithography | Jul 16, 2001 | Issued |
Array
(
[id] => 988060
[patent_doc_number] => 06921615
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-07-26
[patent_title] => 'High-resolution overlay alignment methods for imprint lithography'
[patent_app_type] => utility
[patent_app_number] => 09/907512
[patent_app_country] => US
[patent_app_date] => 2001-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 37
[patent_figures_cnt] => 68
[patent_no_of_words] => 18350
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/921/06921615.pdf
[firstpage_image] =>[orig_patent_app_number] => 09907512
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/907512 | High-resolution overlay alignment methods for imprint lithography | Jul 15, 2001 | Issued |