
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1212308
[patent_doc_number] => 06709797
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-03-23
[patent_title] => 'Method and apparatus for controlling focus based on a thickness of a layer of photoresist'
[patent_app_type] => B1
[patent_app_number] => 09/851900
[patent_app_country] => US
[patent_app_date] => 2001-05-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 4465
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/709/06709797.pdf
[firstpage_image] =>[orig_patent_app_number] => 09851900
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/851900 | Method and apparatus for controlling focus based on a thickness of a layer of photoresist | May 8, 2001 | Issued |
Array
(
[id] => 1435757
[patent_doc_number] => 06355400
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-03-12
[patent_title] => 'Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed'
[patent_app_type] => B1
[patent_app_number] => 09/849487
[patent_app_country] => US
[patent_app_date] => 2001-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
[patent_figures_cnt] => 92
[patent_no_of_words] => 18814
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 89
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/355/06355400.pdf
[firstpage_image] =>[orig_patent_app_number] => 09849487
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/849487 | Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed | May 6, 2001 | Issued |
Array
(
[id] => 1235173
[patent_doc_number] => 06689519
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-02-10
[patent_title] => 'Methods and systems for lithography process control'
[patent_app_type] => B2
[patent_app_number] => 09/849622
[patent_app_country] => US
[patent_app_date] => 2001-05-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 9498
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/689/06689519.pdf
[firstpage_image] =>[orig_patent_app_number] => 09849622
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/849622 | Methods and systems for lithography process control | May 3, 2001 | Issued |
Array
(
[id] => 1383272
[patent_doc_number] => 06548214
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-15
[patent_title] => 'Method of lithography utilizing orthogonal experiment to improve profile'
[patent_app_type] => B2
[patent_app_number] => 09/847329
[patent_app_country] => US
[patent_app_date] => 2001-05-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3541
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 65
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/548/06548214.pdf
[firstpage_image] =>[orig_patent_app_number] => 09847329
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/847329 | Method of lithography utilizing orthogonal experiment to improve profile | May 2, 2001 | Issued |
Array
(
[id] => 7064769
[patent_doc_number] => 20010044055
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-22
[patent_title] => 'Mask for electron beam drawing'
[patent_app_type] => new
[patent_app_number] => 09/848124
[patent_app_country] => US
[patent_app_date] => 2001-05-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2504
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 90
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0044/20010044055.pdf
[firstpage_image] =>[orig_patent_app_number] => 09848124
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/848124 | Mask for electron beam drawing utilizing auxiliary patterns that do not bore through the substrate | May 2, 2001 | Issued |
Array
(
[id] => 1279942
[patent_doc_number] => 06641963
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-11-04
[patent_title] => 'System and method for in situ control of post exposure bake time and temperature'
[patent_app_type] => B1
[patent_app_number] => 09/845239
[patent_app_country] => US
[patent_app_date] => 2001-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 16
[patent_no_of_words] => 6614
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 142
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/641/06641963.pdf
[firstpage_image] =>[orig_patent_app_number] => 09845239
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/845239 | System and method for in situ control of post exposure bake time and temperature | Apr 29, 2001 | Issued |
Array
(
[id] => 6901459
[patent_doc_number] => 20010023042
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-09-20
[patent_title] => 'Test object for detecting aberrations of an optical imaging system'
[patent_app_type] => new
[patent_app_number] => 09/844122
[patent_app_country] => US
[patent_app_date] => 2001-04-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 15
[patent_no_of_words] => 11099
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 26
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0023/20010023042.pdf
[firstpage_image] =>[orig_patent_app_number] => 09844122
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/844122 | Test object for use in detecting aberrations of an optical imaging system | Apr 26, 2001 | Issued |
Array
(
[id] => 6884797
[patent_doc_number] => 20010038958
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-08
[patent_title] => 'Method for evaluating lithography system, method for adjusting substrate-processing apparatus, lithography system, and exposure apparatus'
[patent_app_type] => new
[patent_app_number] => 09/839202
[patent_app_country] => US
[patent_app_date] => 2001-04-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 16269
[patent_no_of_claims] => 53
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 96
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0038/20010038958.pdf
[firstpage_image] =>[orig_patent_app_number] => 09839202
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/839202 | Method for evaluating lithography system and method for adjusting substrate-processing apparatus | Apr 22, 2001 | Issued |
Array
(
[id] => 1364257
[patent_doc_number] => 06566018
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-20
[patent_title] => 'Dual-member pellicle assemblies and methods of use'
[patent_app_type] => B2
[patent_app_number] => 09/840407
[patent_app_country] => US
[patent_app_date] => 2001-04-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 3642
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 32
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/566/06566018.pdf
[firstpage_image] =>[orig_patent_app_number] => 09840407
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/840407 | Dual-member pellicle assemblies and methods of use | Apr 22, 2001 | Issued |
Array
(
[id] => 6175390
[patent_doc_number] => 20020155358
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-24
[patent_title] => 'Hinged pellicles and methods of use'
[patent_app_type] => new
[patent_app_number] => 09/840373
[patent_app_country] => US
[patent_app_date] => 2001-04-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 4245
[patent_no_of_claims] => 29
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 29
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0155/20020155358.pdf
[firstpage_image] =>[orig_patent_app_number] => 09840373
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/840373 | Hinged pellicles and methods of use | Apr 22, 2001 | Issued |
Array
(
[id] => 1594632
[patent_doc_number] => 06492073
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-10
[patent_title] => 'Removal of line end shortening in microlithography and mask set for removal'
[patent_app_type] => B1
[patent_app_number] => 09/839926
[patent_app_country] => US
[patent_app_date] => 2001-04-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 25
[patent_no_of_words] => 3641
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 117
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/492/06492073.pdf
[firstpage_image] =>[orig_patent_app_number] => 09839926
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/839926 | Removal of line end shortening in microlithography and mask set for removal | Apr 22, 2001 | Issued |
Array
(
[id] => 1594653
[patent_doc_number] => 06492077
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-10
[patent_title] => 'Multiple-reticle mask holder and aligner'
[patent_app_type] => B1
[patent_app_number] => 09/839961
[patent_app_country] => US
[patent_app_date] => 2001-04-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 2240
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/492/06492077.pdf
[firstpage_image] =>[orig_patent_app_number] => 09839961
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/839961 | Multiple-reticle mask holder and aligner | Apr 22, 2001 | Issued |
Array
(
[id] => 1323061
[patent_doc_number] => 06602641
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-08-05
[patent_title] => 'Wafer\'s zero-layer and alignment mark print without mask when using scanner'
[patent_app_type] => B1
[patent_app_number] => 09/837598
[patent_app_country] => US
[patent_app_date] => 2001-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 1977
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 85
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/602/06602641.pdf
[firstpage_image] =>[orig_patent_app_number] => 09837598
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/837598 | Wafer's zero-layer and alignment mark print without mask when using scanner | Apr 18, 2001 | Issued |
Array
(
[id] => 6095495
[patent_doc_number] => 20020051916
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-05-02
[patent_title] => 'Method of correcting line width variation due to loading effect caused during etching of a photomask and recording medium formed according to the method'
[patent_app_type] => new
[patent_app_number] => 09/839189
[patent_app_country] => US
[patent_app_date] => 2001-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 5996
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 186
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0051/20020051916.pdf
[firstpage_image] =>[orig_patent_app_number] => 09839189
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/839189 | Method of correcting line width variation due to loading effect caused during etching of a photomask and recording medium formed according to the method | Apr 18, 2001 | Issued |
Array
(
[id] => 1594748
[patent_doc_number] => 06492094
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-10
[patent_title] => 'Lithography for fast processing of large areas utilizing electron beam exposure'
[patent_app_type] => B1
[patent_app_number] => 09/839197
[patent_app_country] => US
[patent_app_date] => 2001-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 11
[patent_no_of_words] => 2856
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 126
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/492/06492094.pdf
[firstpage_image] =>[orig_patent_app_number] => 09839197
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/839197 | Lithography for fast processing of large areas utilizing electron beam exposure | Apr 18, 2001 | Issued |
Array
(
[id] => 1376273
[patent_doc_number] => 06555276
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-29
[patent_title] => 'Substrate coating and semiconductor processing method of improving uniformity of liquid deposition'
[patent_app_type] => B2
[patent_app_number] => 09/839959
[patent_app_country] => US
[patent_app_date] => 2001-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 2080
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/555/06555276.pdf
[firstpage_image] =>[orig_patent_app_number] => 09839959
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/839959 | Substrate coating and semiconductor processing method of improving uniformity of liquid deposition | Apr 18, 2001 | Issued |
Array
(
[id] => 7092752
[patent_doc_number] => 20010033976
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-25
[patent_title] => 'Reticle for manufacturing semiconductor integrated circuit'
[patent_app_type] => new
[patent_app_number] => 09/835516
[patent_app_country] => US
[patent_app_date] => 2001-04-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 3631
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 208
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0033/20010033976.pdf
[firstpage_image] =>[orig_patent_app_number] => 09835516
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/835516 | Reticle for manufacturing semiconductor integrated circuit | Apr 16, 2001 | Issued |
Array
(
[id] => 1296471
[patent_doc_number] => 06627357
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-09-30
[patent_title] => 'Reticle'
[patent_app_type] => B2
[patent_app_number] => 09/837721
[patent_app_country] => US
[patent_app_date] => 2001-04-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 14
[patent_no_of_words] => 4693
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 125
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/627/06627357.pdf
[firstpage_image] =>[orig_patent_app_number] => 09837721
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/837721 | Reticle | Apr 16, 2001 | Issued |
Array
(
[id] => 1574224
[patent_doc_number] => 06468704
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-22
[patent_title] => 'Method for improved photomask alignment after epitaxial process through 90 orientation change'
[patent_app_type] => B1
[patent_app_number] => 09/835027
[patent_app_country] => US
[patent_app_date] => 2001-04-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 3135
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 138
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/468/06468704.pdf
[firstpage_image] =>[orig_patent_app_number] => 09835027
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/835027 | Method for improved photomask alignment after epitaxial process through 90 orientation change | Apr 15, 2001 | Issued |
Array
(
[id] => 6465346
[patent_doc_number] => 20020150841
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-17
[patent_title] => 'Photomask set for photolithographic operation'
[patent_app_type] => new
[patent_app_number] => 09/833124
[patent_app_country] => US
[patent_app_date] => 2001-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2656
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 33
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0150/20020150841.pdf
[firstpage_image] =>[orig_patent_app_number] => 09833124
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/833124 | Photomask set for photolithographic operation | Apr 10, 2001 | Issued |