Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1212308 [patent_doc_number] => 06709797 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-03-23 [patent_title] => 'Method and apparatus for controlling focus based on a thickness of a layer of photoresist' [patent_app_type] => B1 [patent_app_number] => 09/851900 [patent_app_country] => US [patent_app_date] => 2001-05-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 4465 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/709/06709797.pdf [firstpage_image] =>[orig_patent_app_number] => 09851900 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/851900
Method and apparatus for controlling focus based on a thickness of a layer of photoresist May 8, 2001 Issued
Array ( [id] => 1435757 [patent_doc_number] => 06355400 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-12 [patent_title] => 'Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed' [patent_app_type] => B1 [patent_app_number] => 09/849487 [patent_app_country] => US [patent_app_date] => 2001-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 22 [patent_figures_cnt] => 92 [patent_no_of_words] => 18814 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/355/06355400.pdf [firstpage_image] =>[orig_patent_app_number] => 09849487 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/849487
Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed May 6, 2001 Issued
Array ( [id] => 1235173 [patent_doc_number] => 06689519 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-02-10 [patent_title] => 'Methods and systems for lithography process control' [patent_app_type] => B2 [patent_app_number] => 09/849622 [patent_app_country] => US [patent_app_date] => 2001-05-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 9498 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/689/06689519.pdf [firstpage_image] =>[orig_patent_app_number] => 09849622 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/849622
Methods and systems for lithography process control May 3, 2001 Issued
Array ( [id] => 1383272 [patent_doc_number] => 06548214 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-04-15 [patent_title] => 'Method of lithography utilizing orthogonal experiment to improve profile' [patent_app_type] => B2 [patent_app_number] => 09/847329 [patent_app_country] => US [patent_app_date] => 2001-05-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3541 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 65 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/548/06548214.pdf [firstpage_image] =>[orig_patent_app_number] => 09847329 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/847329
Method of lithography utilizing orthogonal experiment to improve profile May 2, 2001 Issued
Array ( [id] => 7064769 [patent_doc_number] => 20010044055 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-11-22 [patent_title] => 'Mask for electron beam drawing' [patent_app_type] => new [patent_app_number] => 09/848124 [patent_app_country] => US [patent_app_date] => 2001-05-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 2504 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20010044055.pdf [firstpage_image] =>[orig_patent_app_number] => 09848124 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/848124
Mask for electron beam drawing utilizing auxiliary patterns that do not bore through the substrate May 2, 2001 Issued
Array ( [id] => 1279942 [patent_doc_number] => 06641963 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-11-04 [patent_title] => 'System and method for in situ control of post exposure bake time and temperature' [patent_app_type] => B1 [patent_app_number] => 09/845239 [patent_app_country] => US [patent_app_date] => 2001-04-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 16 [patent_no_of_words] => 6614 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 142 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/641/06641963.pdf [firstpage_image] =>[orig_patent_app_number] => 09845239 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/845239
System and method for in situ control of post exposure bake time and temperature Apr 29, 2001 Issued
Array ( [id] => 6901459 [patent_doc_number] => 20010023042 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-09-20 [patent_title] => 'Test object for detecting aberrations of an optical imaging system' [patent_app_type] => new [patent_app_number] => 09/844122 [patent_app_country] => US [patent_app_date] => 2001-04-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 11099 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 26 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0023/20010023042.pdf [firstpage_image] =>[orig_patent_app_number] => 09844122 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/844122
Test object for use in detecting aberrations of an optical imaging system Apr 26, 2001 Issued
Array ( [id] => 6884797 [patent_doc_number] => 20010038958 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-11-08 [patent_title] => 'Method for evaluating lithography system, method for adjusting substrate-processing apparatus, lithography system, and exposure apparatus' [patent_app_type] => new [patent_app_number] => 09/839202 [patent_app_country] => US [patent_app_date] => 2001-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 16269 [patent_no_of_claims] => 53 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 96 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0038/20010038958.pdf [firstpage_image] =>[orig_patent_app_number] => 09839202 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/839202
Method for evaluating lithography system and method for adjusting substrate-processing apparatus Apr 22, 2001 Issued
Array ( [id] => 1364257 [patent_doc_number] => 06566018 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-05-20 [patent_title] => 'Dual-member pellicle assemblies and methods of use' [patent_app_type] => B2 [patent_app_number] => 09/840407 [patent_app_country] => US [patent_app_date] => 2001-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 3642 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 32 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/566/06566018.pdf [firstpage_image] =>[orig_patent_app_number] => 09840407 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/840407
Dual-member pellicle assemblies and methods of use Apr 22, 2001 Issued
Array ( [id] => 6175390 [patent_doc_number] => 20020155358 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-10-24 [patent_title] => 'Hinged pellicles and methods of use' [patent_app_type] => new [patent_app_number] => 09/840373 [patent_app_country] => US [patent_app_date] => 2001-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4245 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0155/20020155358.pdf [firstpage_image] =>[orig_patent_app_number] => 09840373 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/840373
Hinged pellicles and methods of use Apr 22, 2001 Issued
Array ( [id] => 1594632 [patent_doc_number] => 06492073 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-10 [patent_title] => 'Removal of line end shortening in microlithography and mask set for removal' [patent_app_type] => B1 [patent_app_number] => 09/839926 [patent_app_country] => US [patent_app_date] => 2001-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 25 [patent_no_of_words] => 3641 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 117 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/492/06492073.pdf [firstpage_image] =>[orig_patent_app_number] => 09839926 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/839926
Removal of line end shortening in microlithography and mask set for removal Apr 22, 2001 Issued
Array ( [id] => 1594653 [patent_doc_number] => 06492077 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-10 [patent_title] => 'Multiple-reticle mask holder and aligner' [patent_app_type] => B1 [patent_app_number] => 09/839961 [patent_app_country] => US [patent_app_date] => 2001-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 2240 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/492/06492077.pdf [firstpage_image] =>[orig_patent_app_number] => 09839961 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/839961
Multiple-reticle mask holder and aligner Apr 22, 2001 Issued
Array ( [id] => 1323061 [patent_doc_number] => 06602641 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-08-05 [patent_title] => 'Wafer\'s zero-layer and alignment mark print without mask when using scanner' [patent_app_type] => B1 [patent_app_number] => 09/837598 [patent_app_country] => US [patent_app_date] => 2001-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 1977 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 85 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/602/06602641.pdf [firstpage_image] =>[orig_patent_app_number] => 09837598 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/837598
Wafer's zero-layer and alignment mark print without mask when using scanner Apr 18, 2001 Issued
Array ( [id] => 6095495 [patent_doc_number] => 20020051916 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-05-02 [patent_title] => 'Method of correcting line width variation due to loading effect caused during etching of a photomask and recording medium formed according to the method' [patent_app_type] => new [patent_app_number] => 09/839189 [patent_app_country] => US [patent_app_date] => 2001-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 5996 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 186 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0051/20020051916.pdf [firstpage_image] =>[orig_patent_app_number] => 09839189 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/839189
Method of correcting line width variation due to loading effect caused during etching of a photomask and recording medium formed according to the method Apr 18, 2001 Issued
Array ( [id] => 1594748 [patent_doc_number] => 06492094 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-10 [patent_title] => 'Lithography for fast processing of large areas utilizing electron beam exposure' [patent_app_type] => B1 [patent_app_number] => 09/839197 [patent_app_country] => US [patent_app_date] => 2001-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 11 [patent_no_of_words] => 2856 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 126 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/492/06492094.pdf [firstpage_image] =>[orig_patent_app_number] => 09839197 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/839197
Lithography for fast processing of large areas utilizing electron beam exposure Apr 18, 2001 Issued
Array ( [id] => 1376273 [patent_doc_number] => 06555276 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-04-29 [patent_title] => 'Substrate coating and semiconductor processing method of improving uniformity of liquid deposition' [patent_app_type] => B2 [patent_app_number] => 09/839959 [patent_app_country] => US [patent_app_date] => 2001-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 2080 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/555/06555276.pdf [firstpage_image] =>[orig_patent_app_number] => 09839959 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/839959
Substrate coating and semiconductor processing method of improving uniformity of liquid deposition Apr 18, 2001 Issued
Array ( [id] => 7092752 [patent_doc_number] => 20010033976 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-10-25 [patent_title] => 'Reticle for manufacturing semiconductor integrated circuit' [patent_app_type] => new [patent_app_number] => 09/835516 [patent_app_country] => US [patent_app_date] => 2001-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3631 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 208 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0033/20010033976.pdf [firstpage_image] =>[orig_patent_app_number] => 09835516 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/835516
Reticle for manufacturing semiconductor integrated circuit Apr 16, 2001 Issued
Array ( [id] => 1296471 [patent_doc_number] => 06627357 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-09-30 [patent_title] => 'Reticle' [patent_app_type] => B2 [patent_app_number] => 09/837721 [patent_app_country] => US [patent_app_date] => 2001-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 14 [patent_no_of_words] => 4693 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/627/06627357.pdf [firstpage_image] =>[orig_patent_app_number] => 09837721 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/837721
Reticle Apr 16, 2001 Issued
Array ( [id] => 1574224 [patent_doc_number] => 06468704 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-10-22 [patent_title] => 'Method for improved photomask alignment after epitaxial process through 90 orientation change' [patent_app_type] => B1 [patent_app_number] => 09/835027 [patent_app_country] => US [patent_app_date] => 2001-04-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 3135 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 138 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/468/06468704.pdf [firstpage_image] =>[orig_patent_app_number] => 09835027 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/835027
Method for improved photomask alignment after epitaxial process through 90 orientation change Apr 15, 2001 Issued
Array ( [id] => 6465346 [patent_doc_number] => 20020150841 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-10-17 [patent_title] => 'Photomask set for photolithographic operation' [patent_app_type] => new [patent_app_number] => 09/833124 [patent_app_country] => US [patent_app_date] => 2001-04-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 2656 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 33 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0150/20020150841.pdf [firstpage_image] =>[orig_patent_app_number] => 09833124 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/833124
Photomask set for photolithographic operation Apr 10, 2001 Issued
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