
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1511817
[patent_doc_number] => 06472112
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-10-29
[patent_title] => 'Method for measuring reticle leveling in stepper'
[patent_app_type] => B2
[patent_app_number] => 09/823982
[patent_app_country] => US
[patent_app_date] => 2001-04-03
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/472/06472112.pdf
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Array
(
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[patent_doc_number] => 20010028984
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[patent_kind] => A1
[patent_issue_date] => 2001-10-11
[patent_title] => 'Electron beam exposure mask and pattern designing method thereof'
[patent_app_type] => new
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[patent_app_date] => 2001-03-28
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Array
(
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[patent_kind] => A1
[patent_issue_date] => 2002-10-03
[patent_title] => 'Lithographic template and method of formation and use'
[patent_app_type] => new
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[patent_app_date] => 2001-03-28
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Array
(
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[patent_issue_date] => 2003-01-07
[patent_title] => 'Electron beam projection utilizing multiple exposures with different current densities'
[patent_app_type] => B2
[patent_app_number] => 09/820101
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[patent_app_date] => 2001-03-27
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Array
(
[id] => 1417404
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[patent_kind] => B2
[patent_issue_date] => 2003-01-14
[patent_title] => 'Method of repairing an opaque defect in a photomask'
[patent_app_type] => B2
[patent_app_number] => 09/816364
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Array
(
[id] => 1196122
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[patent_issue_date] => 2004-04-27
[patent_title] => 'Semiconductor integrated circuit patterns'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/815004 | Semiconductor integrated circuit patterns | Mar 22, 2001 | Issued |
Array
(
[id] => 5999611
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[patent_title] => 'Charged particle beam exposure method and charged particle beam exposure apparatus'
[patent_app_type] => new
[patent_app_number] => 09/809113
[patent_app_country] => US
[patent_app_date] => 2001-03-16
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Array
(
[id] => 714816
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[patent_kind] => B2
[patent_issue_date] => 2006-05-30
[patent_title] => 'Exposure controlling photomask and production method therefor'
[patent_app_type] => utility
[patent_app_number] => 10/220973
[patent_app_country] => US
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[pdf_file] => patents/07/052/07052806.pdf
[firstpage_image] =>[orig_patent_app_number] => 10220973
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/220973 | Exposure controlling photomask and production method therefor | Mar 13, 2001 | Issued |
Array
(
[id] => 6900074
[patent_doc_number] => 20010009750
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[patent_issue_date] => 2001-07-26
[patent_title] => 'Laminate film and processes for preparing printed wiring board'
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Array
(
[id] => 1359196
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[patent_kind] => B2
[patent_issue_date] => 2003-05-27
[patent_title] => 'Semiconductor mask alignment system utilizing pellicle with zero layer image placement indicator'
[patent_app_type] => B2
[patent_app_number] => 09/805846
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Array
(
[id] => 1334439
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[patent_title] => 'Structure for a reflection lithography mask and method for making same'
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Array
(
[id] => 1330911
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Array
(
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Array
(
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Array
(
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Array
(
[id] => 6886533
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Array
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Array
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Array
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