
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6365226
[patent_doc_number] => 20020117620
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-29
[patent_title] => 'Method and apparatus for determining photoresist pattern linearity'
[patent_app_type] => new
[patent_app_number] => 09/792205
[patent_app_country] => US
[patent_app_date] => 2001-02-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3028
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0117/20020117620.pdf
[firstpage_image] =>[orig_patent_app_number] => 09792205
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/792205 | Method and apparatus for determining photoresist pattern linearity | Feb 22, 2001 | Issued |
Array
(
[id] => 1534131
[patent_doc_number] => 06489068
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-03
[patent_title] => 'Process for observing overlay errors on lithographic masks'
[patent_app_type] => B1
[patent_app_number] => 09/790135
[patent_app_country] => US
[patent_app_date] => 2001-02-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 12
[patent_no_of_words] => 4487
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 98
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/489/06489068.pdf
[firstpage_image] =>[orig_patent_app_number] => 09790135
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/790135 | Process for observing overlay errors on lithographic masks | Feb 20, 2001 | Issued |
Array
(
[id] => 1399196
[patent_doc_number] => 06534242
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-03-18
[patent_title] => 'Multiple exposure device formation'
[patent_app_type] => B2
[patent_app_number] => 09/783600
[patent_app_country] => US
[patent_app_date] => 2001-02-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 96
[patent_figures_cnt] => 186
[patent_no_of_words] => 39011
[patent_no_of_claims] => 104
[patent_no_of_ind_claims] => 38
[patent_words_short_claim] => 19
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/534/06534242.pdf
[firstpage_image] =>[orig_patent_app_number] => 09783600
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/783600 | Multiple exposure device formation | Feb 14, 2001 | Issued |
Array
(
[id] => 6901462
[patent_doc_number] => 20010023045
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-09-20
[patent_title] => 'Methods of reducing proximity effects in lithographic processes'
[patent_app_type] => new
[patent_app_number] => 09/780407
[patent_app_country] => US
[patent_app_date] => 2001-02-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2325
[patent_no_of_claims] => 36
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 85
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0023/20010023045.pdf
[firstpage_image] =>[orig_patent_app_number] => 09780407
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/780407 | Methods of reducing proximity effects in lithographic processes | Feb 11, 2001 | Issued |
Array
(
[id] => 6615861
[patent_doc_number] => 20020016015
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-02-07
[patent_title] => 'Microelectronic-device fabrication method'
[patent_app_type] => new
[patent_app_number] => 09/782590
[patent_app_country] => US
[patent_app_date] => 2001-02-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 13
[patent_no_of_words] => 7641
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 197
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0016/20020016015.pdf
[firstpage_image] =>[orig_patent_app_number] => 09782590
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/782590 | Microelectronic-device fabrication method | Feb 11, 2001 | Abandoned |
Array
(
[id] => 1588182
[patent_doc_number] => 06482558
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-11-19
[patent_title] => 'Conducting electron beam resist thin film layer for patterning of mask plates'
[patent_app_type] => B1
[patent_app_number] => 09/782382
[patent_app_country] => US
[patent_app_date] => 2001-02-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2727
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 94
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/482/06482558.pdf
[firstpage_image] =>[orig_patent_app_number] => 09782382
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/782382 | Conducting electron beam resist thin film layer for patterning of mask plates | Feb 11, 2001 | Issued |
Array
(
[id] => 1559148
[patent_doc_number] => 06436595
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-20
[patent_title] => 'Method of aligning lithographically printed product layers using non-zero overlay targets'
[patent_app_type] => B1
[patent_app_number] => 09/779421
[patent_app_country] => US
[patent_app_date] => 2001-02-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
[patent_figures_cnt] => 25
[patent_no_of_words] => 6795
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 211
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/436/06436595.pdf
[firstpage_image] =>[orig_patent_app_number] => 09779421
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/779421 | Method of aligning lithographically printed product layers using non-zero overlay targets | Feb 7, 2001 | Issued |
Array
(
[id] => 1387084
[patent_doc_number] => 06544699
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-04-08
[patent_title] => 'Method to improve accuracy of model-based optical proximity correction'
[patent_app_type] => B1
[patent_app_number] => 09/778583
[patent_app_country] => US
[patent_app_date] => 2001-02-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 2919
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 48
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/544/06544699.pdf
[firstpage_image] =>[orig_patent_app_number] => 09778583
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/778583 | Method to improve accuracy of model-based optical proximity correction | Feb 6, 2001 | Issued |
Array
(
[id] => 1352491
[patent_doc_number] => 06576385
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-06-10
[patent_title] => 'Method of varying stepper exposure dose to compensate for across-wafer variations in photoresist thickness'
[patent_app_type] => B2
[patent_app_number] => 09/776206
[patent_app_country] => US
[patent_app_date] => 2001-02-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 4990
[patent_no_of_claims] => 43
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 111
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/576/06576385.pdf
[firstpage_image] =>[orig_patent_app_number] => 09776206
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/776206 | Method of varying stepper exposure dose to compensate for across-wafer variations in photoresist thickness | Feb 1, 2001 | Issued |
| 09/701083 | Silver based photomasks | Jan 28, 2001 | Abandoned |
Array
(
[id] => 6878149
[patent_doc_number] => 20010002304
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-05-31
[patent_title] => 'Methods of reducing proximity effects in lithographic processes'
[patent_app_type] => new-utility
[patent_app_number] => 09/769603
[patent_app_country] => US
[patent_app_date] => 2001-01-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2325
[patent_no_of_claims] => 36
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 85
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0002/20010002304.pdf
[firstpage_image] =>[orig_patent_app_number] => 09769603
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/769603 | Methods of reducing proximity effects in lithographic processes | Jan 23, 2001 | Issued |
Array
(
[id] => 5985573
[patent_doc_number] => 20020098427
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-25
[patent_title] => 'CONTACT HOLE MODEL-BASED OPTICAL PROXIMITY CORRECTION METHOD'
[patent_app_type] => new
[patent_app_number] => 09/767304
[patent_app_country] => US
[patent_app_date] => 2001-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2801
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 184
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0098/20020098427.pdf
[firstpage_image] =>[orig_patent_app_number] => 09767304
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/767304 | Contact hole model-based optical proximity correction method | Jan 22, 2001 | Issued |
Array
(
[id] => 7028245
[patent_doc_number] => 20010014531
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-08-16
[patent_title] => 'Multilayer alignment keys and alignment method using the same'
[patent_app_type] => new
[patent_app_number] => 09/761618
[patent_app_country] => US
[patent_app_date] => 2001-01-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 3809
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0014/20010014531.pdf
[firstpage_image] =>[orig_patent_app_number] => 09761618
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/761618 | Multilayer alignment keys and alignment method using the same | Jan 15, 2001 | Issued |
Array
(
[id] => 1398899
[patent_doc_number] => 06534227
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-03-18
[patent_title] => 'Photoreceptor, method of evaluating the photoreceptor, method of producing the photoreceptor, and image formation apparatus using the photoreceptor'
[patent_app_type] => B2
[patent_app_number] => 09/758193
[patent_app_country] => US
[patent_app_date] => 2001-01-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 27
[patent_figures_cnt] => 30
[patent_no_of_words] => 34183
[patent_no_of_claims] => 90
[patent_no_of_ind_claims] => 18
[patent_words_short_claim] => 164
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/534/06534227.pdf
[firstpage_image] =>[orig_patent_app_number] => 09758193
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/758193 | Photoreceptor, method of evaluating the photoreceptor, method of producing the photoreceptor, and image formation apparatus using the photoreceptor | Jan 11, 2001 | Issued |
Array
(
[id] => 6876613
[patent_doc_number] => 20010006766
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-07-05
[patent_title] => 'Method for patterning thin films'
[patent_app_type] => new-utility
[patent_app_number] => 09/759794
[patent_app_country] => US
[patent_app_date] => 2001-01-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 6840
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 47
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0006/20010006766.pdf
[firstpage_image] =>[orig_patent_app_number] => 09759794
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/759794 | Method for patterning thin films | Jan 11, 2001 | Issued |
Array
(
[id] => 6893929
[patent_doc_number] => 20010016295
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-08-23
[patent_title] => 'Method of compensating for pattern dimension variation caused by re-scattered electron beam in electron beam lithography'
[patent_app_type] => new
[patent_app_number] => 09/758708
[patent_app_country] => US
[patent_app_date] => 2001-01-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 4335
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0016/20010016295.pdf
[firstpage_image] =>[orig_patent_app_number] => 09758708
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/758708 | Method of compensating for pattern dimension variation caused by re-scattered electron beam in electron beam lithography and recording medium in which the method is recorded | Jan 10, 2001 | Issued |
Array
(
[id] => 7640474
[patent_doc_number] => 06395438
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-28
[patent_title] => 'Method of etch bias proximity correction'
[patent_app_type] => B1
[patent_app_number] => 09/756540
[patent_app_country] => US
[patent_app_date] => 2001-01-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 11
[patent_no_of_words] => 4018
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 4
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/395/06395438.pdf
[firstpage_image] =>[orig_patent_app_number] => 09756540
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/756540 | Method of etch bias proximity correction | Jan 7, 2001 | Issued |
Array
(
[id] => 5951141
[patent_doc_number] => 20020006562
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-01-17
[patent_title] => 'Plate pattern forming method and its inspecting method'
[patent_app_type] => new
[patent_app_number] => 09/750694
[patent_app_country] => US
[patent_app_date] => 2001-01-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 8151
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 42
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0006/20020006562.pdf
[firstpage_image] =>[orig_patent_app_number] => 09750694
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/750694 | Plate pattern forming method and its inspecting method | Jan 1, 2001 | Issued |
Array
(
[id] => 6877542
[patent_doc_number] => 20010003028
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-06-07
[patent_title] => ' Scanning Exposure Method'
[patent_app_type] => new-utility
[patent_app_number] => 09/749561
[patent_app_country] => US
[patent_app_date] => 2000-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 11980
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0003/20010003028.pdf
[firstpage_image] =>[orig_patent_app_number] => 09749561
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/749561 | Scanning Exposure Method | Dec 27, 2000 | Abandoned |
Array
(
[id] => 1412686
[patent_doc_number] => 06521392
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-02-18
[patent_title] => 'Methods for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system'
[patent_app_type] => B2
[patent_app_number] => 09/750010
[patent_app_country] => US
[patent_app_date] => 2000-12-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 4220
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 179
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/521/06521392.pdf
[firstpage_image] =>[orig_patent_app_number] => 09750010
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/750010 | Methods for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system | Dec 26, 2000 | Issued |