Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6886543 [patent_doc_number] => 20010019812 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-09-06 [patent_title] => 'Charged-particle-beam microlithography apparatus and methods for exposing a segmented reticle' [patent_app_type] => new [patent_app_number] => 09/749962 [patent_app_country] => US [patent_app_date] => 2000-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 5973 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0019/20010019812.pdf [firstpage_image] =>[orig_patent_app_number] => 09749962 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/749962
Charged-particle-beam microlithography methods for exposing a segmented reticle Dec 26, 2000 Issued
Array ( [id] => 6893926 [patent_doc_number] => 20010016292 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-08-23 [patent_title] => 'Electron beam mask, production method thereof, and exposure method' [patent_app_type] => new [patent_app_number] => 09/749235 [patent_app_country] => US [patent_app_date] => 2000-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4435 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0016/20010016292.pdf [firstpage_image] =>[orig_patent_app_number] => 09749235 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/749235
Electron beam mask, production method thereof, and exposure method Dec 26, 2000 Abandoned
Array ( [id] => 6877541 [patent_doc_number] => 20010003027 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-06-07 [patent_title] => 'Exposure method' [patent_app_type] => new-utility [patent_app_number] => 09/739627 [patent_app_country] => US [patent_app_date] => 2000-12-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 12656 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 240 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20010003027.pdf [firstpage_image] =>[orig_patent_app_number] => 09739627 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/739627
Exposure method Dec 19, 2000 Issued
Array ( [id] => 1412561 [patent_doc_number] => 06521385 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-02-18 [patent_title] => 'Position detecting method, position detecting unit, exposure method, exposure apparatus, and device manufacturing method' [patent_app_type] => B2 [patent_app_number] => 09/735651 [patent_app_country] => US [patent_app_date] => 2000-12-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 20 [patent_no_of_words] => 11988 [patent_no_of_claims] => 45 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/521/06521385.pdf [firstpage_image] =>[orig_patent_app_number] => 09735651 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/735651
Position detecting method, position detecting unit, exposure method, exposure apparatus, and device manufacturing method Dec 13, 2000 Issued
Array ( [id] => 1549478 [patent_doc_number] => 06399259 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-04 [patent_title] => 'Method of forming alignment marks for photolithographic processing' [patent_app_type] => B1 [patent_app_number] => 09/734285 [patent_app_country] => US [patent_app_date] => 2000-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 18 [patent_no_of_words] => 2070 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 117 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/399/06399259.pdf [firstpage_image] =>[orig_patent_app_number] => 09734285 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/734285
Method of forming alignment marks for photolithographic processing Dec 10, 2000 Issued
Array ( [id] => 6209167 [patent_doc_number] => 20020072131 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-13 [patent_title] => 'In-line method of measuring effective three-leaf aberration coefficient of lithography projection systems' [patent_app_type] => new [patent_app_number] => 09/734307 [patent_app_country] => US [patent_app_date] => 2000-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2996 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 61 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0072/20020072131.pdf [firstpage_image] =>[orig_patent_app_number] => 09734307 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/734307
In-line method of measuring effective three-leaf aberration coefficient of lithography projection systems Dec 10, 2000 Issued
Array ( [id] => 1544554 [patent_doc_number] => 06444374 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-03 [patent_title] => 'Manufacturing method of mask for electron beam proximity exposure and mask' [patent_app_type] => B1 [patent_app_number] => 09/732931 [patent_app_country] => US [patent_app_date] => 2000-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 13 [patent_no_of_words] => 5544 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 156 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/444/06444374.pdf [firstpage_image] =>[orig_patent_app_number] => 09732931 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/732931
Manufacturing method of mask for electron beam proximity exposure and mask Dec 10, 2000 Issued
Array ( [id] => 6902147 [patent_doc_number] => 20010001056 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-05-10 [patent_title] => 'Scanning exposure method and circuit element producing method employing the same' [patent_app_type] => new-utility [patent_app_number] => 09/730590 [patent_app_country] => US [patent_app_date] => 2000-12-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 10916 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 158 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0001/20010001056.pdf [firstpage_image] =>[orig_patent_app_number] => 09730590 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/730590
Scanning exposure method utilizing alignment marks based on scanning direction Dec 6, 2000 Issued
Array ( [id] => 6973570 [patent_doc_number] => 20010003655 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-06-14 [patent_title] => 'Electron-beam exposure method' [patent_app_type] => new-utility [patent_app_number] => 09/730546 [patent_app_country] => US [patent_app_date] => 2000-12-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4277 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 181 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20010003655.pdf [firstpage_image] =>[orig_patent_app_number] => 09730546 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/730546
Electron-beam exposure method utilizing specific alignment mask selection Dec 6, 2000 Issued
Array ( [id] => 1544572 [patent_doc_number] => 06444381 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-03 [patent_title] => 'Electron beam flood exposure technique to reduce the carbon contamination' [patent_app_type] => B1 [patent_app_number] => 09/729295 [patent_app_country] => US [patent_app_date] => 2000-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2726 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/444/06444381.pdf [firstpage_image] =>[orig_patent_app_number] => 09729295 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/729295
Electron beam flood exposure technique to reduce the carbon contamination Dec 3, 2000 Issued
Array ( [id] => 6615025 [patent_doc_number] => 20020064719 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-05-30 [patent_title] => 'Method and apparatus for controlling a stepper' [patent_app_type] => new [patent_app_number] => 09/726995 [patent_app_country] => US [patent_app_date] => 2000-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4715 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0064/20020064719.pdf [firstpage_image] =>[orig_patent_app_number] => 09726995 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/726995
Method for controlling and monitoring light source intensity Nov 29, 2000 Issued
Array ( [id] => 6893044 [patent_doc_number] => 20010015410 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-08-23 [patent_title] => 'Inspection apparatus and method' [patent_app_type] => new [patent_app_number] => 09/727144 [patent_app_country] => US [patent_app_date] => 2000-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 7079 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 160 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0015/20010015410.pdf [firstpage_image] =>[orig_patent_app_number] => 09727144 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/727144
Inspection apparatus and method Nov 29, 2000 Issued
Array ( [id] => 1489673 [patent_doc_number] => 06416913 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-09 [patent_title] => 'Scanning exposure method accounting for thermal transformation of mask' [patent_app_type] => B1 [patent_app_number] => 09/721716 [patent_app_country] => US [patent_app_date] => 2000-11-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 8 [patent_no_of_words] => 8721 [patent_no_of_claims] => 39 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 69 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/416/06416913.pdf [firstpage_image] =>[orig_patent_app_number] => 09721716 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/721716
Scanning exposure method accounting for thermal transformation of mask Nov 26, 2000 Issued
Array ( [id] => 633787 [patent_doc_number] => 07128842 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2006-10-31 [patent_title] => 'Polyimide as a mask in vapor hydrogen fluoride etching' [patent_app_type] => utility [patent_app_number] => 09/722400 [patent_app_country] => US [patent_app_date] => 2000-11-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 24 [patent_no_of_words] => 5606 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 33 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/128/07128842.pdf [firstpage_image] =>[orig_patent_app_number] => 09722400 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/722400
Polyimide as a mask in vapor hydrogen fluoride etching Nov 26, 2000 Issued
Array ( [id] => 1499711 [patent_doc_number] => 06485872 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-11-26 [patent_title] => 'Method and apparatus for measuring the composition and other properties of thin films utilizing infrared radiation' [patent_app_type] => B1 [patent_app_number] => 09/718602 [patent_app_country] => US [patent_app_date] => 2000-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 21 [patent_no_of_words] => 6766 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 318 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/485/06485872.pdf [firstpage_image] =>[orig_patent_app_number] => 09718602 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/718602
Method and apparatus for measuring the composition and other properties of thin films utilizing infrared radiation Nov 21, 2000 Issued
Array ( [id] => 1506666 [patent_doc_number] => 06440621 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-27 [patent_title] => 'Method of detecting film defects using chemical exposure of photoresist films' [patent_app_type] => B1 [patent_app_number] => 09/703081 [patent_app_country] => US [patent_app_date] => 2000-10-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 13 [patent_no_of_words] => 4212 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 130 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/440/06440621.pdf [firstpage_image] =>[orig_patent_app_number] => 09703081 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/703081
Method of detecting film defects using chemical exposure of photoresist films Oct 30, 2000 Issued
Array ( [id] => 1489670 [patent_doc_number] => 06416912 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-09 [patent_title] => 'Method of manufacturing microdevice utilizing combined alignment mark' [patent_app_type] => B1 [patent_app_number] => 09/699154 [patent_app_country] => US [patent_app_date] => 2000-10-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 21 [patent_no_of_words] => 12063 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/416/06416912.pdf [firstpage_image] =>[orig_patent_app_number] => 09699154 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/699154
Method of manufacturing microdevice utilizing combined alignment mark Oct 26, 2000 Issued
Array ( [id] => 7640475 [patent_doc_number] => 06395437 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-28 [patent_title] => 'Junction profiling using a scanning voltage micrograph' [patent_app_type] => B1 [patent_app_number] => 09/696670 [patent_app_country] => US [patent_app_date] => 2000-10-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 11 [patent_no_of_words] => 3961 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 11 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/395/06395437.pdf [firstpage_image] =>[orig_patent_app_number] => 09696670 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/696670
Junction profiling using a scanning voltage micrograph Oct 25, 2000 Issued
Array ( [id] => 1390819 [patent_doc_number] => 06541182 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-04-01 [patent_title] => 'Method for forming fine exposure patterns using dual exposure' [patent_app_type] => B1 [patent_app_number] => 09/690824 [patent_app_country] => US [patent_app_date] => 2000-10-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 16 [patent_no_of_words] => 4474 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 117 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/541/06541182.pdf [firstpage_image] =>[orig_patent_app_number] => 09690824 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/690824
Method for forming fine exposure patterns using dual exposure Oct 17, 2000 Issued
Array ( [id] => 1602415 [patent_doc_number] => 06432594 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-13 [patent_title] => 'Devices for reducing deflection aberrations in charged-particle-beam optical systems and microlithography apparatus comprising same, and related methods' [patent_app_type] => B1 [patent_app_number] => 09/688011 [patent_app_country] => US [patent_app_date] => 2000-10-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 8 [patent_no_of_words] => 4400 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/432/06432594.pdf [firstpage_image] =>[orig_patent_app_number] => 09688011 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/688011
Devices for reducing deflection aberrations in charged-particle-beam optical systems and microlithography apparatus comprising same, and related methods Oct 12, 2000 Issued
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