
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6886543
[patent_doc_number] => 20010019812
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-09-06
[patent_title] => 'Charged-particle-beam microlithography apparatus and methods for exposing a segmented reticle'
[patent_app_type] => new
[patent_app_number] => 09/749962
[patent_app_country] => US
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[pdf_file] => publications/A1/0019/20010019812.pdf
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Array
(
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[patent_doc_number] => 20010016292
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[patent_issue_date] => 2001-08-23
[patent_title] => 'Electron beam mask, production method thereof, and exposure method'
[patent_app_type] => new
[patent_app_number] => 09/749235
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[patent_app_date] => 2000-12-27
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Array
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Array
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[patent_title] => 'Position detecting method, position detecting unit, exposure method, exposure apparatus, and device manufacturing method'
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Array
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Array
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Array
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[patent_title] => 'Manufacturing method of mask for electron beam proximity exposure and mask'
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Array
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[patent_issue_date] => 2001-05-10
[patent_title] => 'Scanning exposure method and circuit element producing method employing the same'
[patent_app_type] => new-utility
[patent_app_number] => 09/730590
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Array
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Array
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[patent_title] => 'Electron beam flood exposure technique to reduce the carbon contamination'
[patent_app_type] => B1
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Array
(
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[patent_title] => 'Method and apparatus for controlling a stepper'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/726995 | Method for controlling and monitoring light source intensity | Nov 29, 2000 | Issued |
Array
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Array
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Array
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