Christopher G. Young

Array ( [id] => 1574217 [patent_doc_number] => 06468701 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-10-22 [patent_title] => 'Stencil mask and method of forming the same' [patent_app_type] => B1 [patent_app_number] => 09/678101 [patent_app_country] => US [patent_app_date] => 2000-10-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 8365 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/468/06468701.pdf [firstpage_image] =>[orig_patent_app_number] => 09678101 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1506663 [patent_doc_number] => 06440620 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-27 [patent_title] => 'Electron beam lithography focusing through spherical aberration introduction' [patent_app_type] => B1 [patent_app_number] => 09/679403 [patent_app_country] => US [patent_app_date] => 2000-10-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 20 [patent_no_of_words] => 3563 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/440/06440620.pdf [firstpage_image] =>[orig_patent_app_number] => 09679403 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1422711 [patent_doc_number] => 06503671 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-01-07 [patent_title] => 'Electron beam writing method' [patent_app_type] => B1 [patent_app_number] => 09/676847 [patent_app_country] => US [patent_app_date] => 2000-09-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 5743 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 119 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/503/06503671.pdf [firstpage_image] =>[orig_patent_app_number] => 09676847 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1414867 [patent_doc_number] => 06509127 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-01-21 [patent_title] => 'Method of electron-beam exposure' [patent_app_type] => B1 [patent_app_number] => 09/670540 [patent_app_country] => US [patent_app_date] => 2000-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 13 [patent_no_of_words] => 10587 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 139 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/509/06509127.pdf [firstpage_image] =>[orig_patent_app_number] => 09670540 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1564803 [patent_doc_number] => 06376139 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-23 [patent_title] => 'Control method for exposure apparatus and control method for semiconductor manufacturing apparatus' [patent_app_type] => B1 [patent_app_number] => 09/671502 [patent_app_country] => US [patent_app_date] => 2000-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 46 [patent_no_of_words] => 16505 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 220 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/376/06376139.pdf [firstpage_image] =>[orig_patent_app_number] => 09671502 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1101303 [patent_doc_number] => 06815129 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-11-09 [patent_title] => 'Compensation of flare-induced CD changes EUVL' [patent_app_type] => B1 [patent_app_number] => 09/669958 [patent_app_country] => US [patent_app_date] => 2000-09-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3110 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 17 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/815/06815129.pdf [firstpage_image] =>[orig_patent_app_number] => 09669958 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1541866 [patent_doc_number] => 06372391 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-16 [patent_title] => 'Template mask lithography utilizing structured beam' [patent_app_type] => B1 [patent_app_number] => 09/669288 [patent_app_country] => US [patent_app_date] => 2000-09-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 11 [patent_no_of_words] => 6240 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 140 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/372/06372391.pdf [firstpage_image] =>[orig_patent_app_number] => 09669288 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1446275 [patent_doc_number] => 06368762 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-09 [patent_title] => 'Active mask exposure compensation of underlying nitride thickness variation to reduce critical dimension (CD) variation' [patent_app_type] => B1 [patent_app_number] => 09/667573 [patent_app_country] => US [patent_app_date] => 2000-09-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 3035 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 165 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/368/06368762.pdf [firstpage_image] =>[orig_patent_app_number] => 09667573 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4356301 [patent_doc_number] => 06255036 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-03 [patent_title] => 'Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed' [patent_app_type] => 1 [patent_app_number] => 9/664554 [patent_app_country] => US [patent_app_date] => 2000-09-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 22 [patent_figures_cnt] => 92 [patent_no_of_words] => 18973 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/255/06255036.pdf [firstpage_image] =>[orig_patent_app_number] => 664554 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1564609 [patent_doc_number] => 06338926 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-15 [patent_title] => 'Focus measurement method' [patent_app_type] => B1 [patent_app_number] => 09/662051 [patent_app_country] => US [patent_app_date] => 2000-09-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 1887 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 227 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/338/06338926.pdf [firstpage_image] =>[orig_patent_app_number] => 09662051 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1535680 [patent_doc_number] => 06337162 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-08 [patent_title] => 'Method of exposure, photomask, method of production of photomask, microdevice, and method of production of microdevice' [patent_app_type] => B1 [patent_app_number] => 09/661396 [patent_app_country] => US [patent_app_date] => 2000-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 23 [patent_no_of_words] => 32396 [patent_no_of_claims] => 64 [patent_no_of_ind_claims] => 12 [patent_words_short_claim] => 62 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/337/06337162.pdf [firstpage_image] =>[orig_patent_app_number] => 09661396 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1309329 [patent_doc_number] => 06613482 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-09-02 [patent_title] => 'Member used for charged beam processing apparatus, and mask' [patent_app_type] => B1 [patent_app_number] => 09/661472 [patent_app_country] => US [patent_app_date] => 2000-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 26 [patent_no_of_words] => 6223 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/613/06613482.pdf [firstpage_image] =>[orig_patent_app_number] => 09661472 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1469362 [patent_doc_number] => 06406820 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-18 [patent_title] => 'Exposure method for a projection optical system' [patent_app_type] => B1 [patent_app_number] => 09/655366 [patent_app_country] => US [patent_app_date] => 2000-09-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 18 [patent_no_of_words] => 25877 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/406/06406820.pdf [firstpage_image] =>[orig_patent_app_number] => 09655366 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1309377 [patent_doc_number] => 06613487 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-09-02 [patent_title] => 'Pre-alignment system of exposure apparatus having wafer cooling means and exposure method using the same' [patent_app_type] => B1 [patent_app_number] => 09/655449 [patent_app_country] => US [patent_app_date] => 2000-09-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 2816 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/613/06613487.pdf [firstpage_image] =>[orig_patent_app_number] => 09655449 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1473834 [patent_doc_number] => 06387597 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-14 [patent_title] => 'Method for exposing features on non-planar resists' [patent_app_type] => B1 [patent_app_number] => 09/654042 [patent_app_country] => US [patent_app_date] => 2000-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 5202 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 162 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/387/06387597.pdf [firstpage_image] =>[orig_patent_app_number] => 09654042 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1602412 [patent_doc_number] => 06432591 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-13 [patent_title] => 'Overlay target design method with pitch determination to minimize impact of lens aberrations' [patent_app_type] => B1 [patent_app_number] => 09/649907 [patent_app_country] => US [patent_app_date] => 2000-08-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 16 [patent_no_of_words] => 4515 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/432/06432591.pdf [firstpage_image] =>[orig_patent_app_number] => 09649907 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1549487 [patent_doc_number] => 06399261 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-04 [patent_title] => 'Pattern generator with improved precision' [patent_app_type] => B1 [patent_app_number] => 09/623200 [patent_app_country] => US [patent_app_date] => 2000-08-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 15 [patent_no_of_words] => 7882 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 188 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/399/06399261.pdf [firstpage_image] =>[orig_patent_app_number] => 09623200 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1487356 [patent_doc_number] => 06428940 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-06 [patent_title] => 'Method for pattern generation with improved image quality' [patent_app_type] => B1 [patent_app_number] => 09/623194 [patent_app_country] => US [patent_app_date] => 2000-08-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 19 [patent_no_of_words] => 8558 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 208 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/428/06428940.pdf [firstpage_image] =>[orig_patent_app_number] => 09623194 [rel_patent_id] =>[rel_patent_doc_number] =>)