| Application number | Title of the application | Filing Date | Status |
|---|
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| 09/261786 | METHOD AND SYSTEM TO UNIFORMLY ETCH SUBSTRATES USING AN ETCHING COMPOSITION COMPRISING A FLUORIDE ION SOURCE AND A HYDROGEN ION SOURCE | Mar 2, 1999 | Abandoned |
Array
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[patent_issue_date] => 2000-06-13
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Array
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[patent_issue_date] => 2000-07-04
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[patent_app_number] => 9/253479
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| 09/251588 | MASKING METHODS AND ETCHING SEQUENCES FOR PATTERNING ELECTRODES OF HIGH DENSITY RAM CAPACITORS | Feb 16, 1999 | Abandoned |
Array
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[patent_issue_date] => 2001-11-27
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Array
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[id] => 7640279
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[patent_issue_date] => 2002-05-28
[patent_title] => 'Reduction of tungsten damascene residue'
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| 09/201589 | METHOD FOR REMOVING REDEPOSITED VEILS FROM ETCHED PLATINUM | Nov 29, 1998 | Abandoned |
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