
Colin Wright Kreutzer
Examiner (ID: 12581, Phone: (571)270-7931 , Office: P/2882 )
| Most Active Art Unit | 2882 |
| Art Unit(s) | 2882 |
| Total Applications | 803 |
| Issued Applications | 652 |
| Pending Applications | 1 |
| Abandoned Applications | 152 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 8204175
[patent_doc_number] => 08189172
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-05-29
[patent_title] => 'Lithographic apparatus and method'
[patent_app_type] => utility
[patent_app_number] => 11/763275
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[pdf_file] => patents/08/189/08189172.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/763275 | Lithographic apparatus and method | Jun 13, 2007 | Issued |
Array
(
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[patent_issue_date] => 2012-02-28
[patent_title] => 'Apparatus and method for immersion lithography'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/762651 | Apparatus and method for immersion lithography | Jun 12, 2007 | Issued |
Array
(
[id] => 4686516
[patent_doc_number] => 20080030697
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[patent_title] => 'Exposure apparatus and device fabrication method'
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[patent_app_date] => 2007-06-08
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Array
(
[id] => 4947908
[patent_doc_number] => 20080304034
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[patent_issue_date] => 2008-12-11
[patent_title] => 'DOSE CONTROL FOR OPTICAL MASKLESS LITHOGRAPHY'
[patent_app_type] => utility
[patent_app_number] => 11/759587
[patent_app_country] => US
[patent_app_date] => 2007-06-07
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/759587 | DOSE CONTROL FOR OPTICAL MASKLESS LITHOGRAPHY | Jun 6, 2007 | Abandoned |
Array
(
[id] => 4481418
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Array
(
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[patent_title] => 'APPARATUS AND METHOD FOR DEFECT-FREE MICROLITHOGRAPHY'
[patent_app_type] => utility
[patent_app_number] => 11/756307
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Array
(
[id] => 4447119
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[patent_title] => 'Focus sensitive lithographic apparatus, systems, and methods'
[patent_app_type] => utility
[patent_app_number] => 11/754578
[patent_app_country] => US
[patent_app_date] => 2007-05-29
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[pdf_file] => patents/07/864/07864294.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/754578 | Focus sensitive lithographic apparatus, systems, and methods | May 28, 2007 | Issued |
Array
(
[id] => 5083808
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[patent_title] => 'Illumination optical apparatus, exposure apparatus, and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 11/802686
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Array
(
[id] => 7731803
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/751225 | Stage device, exposure apparatus, and microdevice manufacturing method | May 20, 2007 | Issued |
Array
(
[id] => 4655888
[patent_doc_number] => 20080024749
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[patent_issue_date] => 2008-01-31
[patent_title] => 'Low mass six degree of freedom stage for lithography tools'
[patent_app_type] => utility
[patent_app_number] => 11/804734
[patent_app_country] => US
[patent_app_date] => 2007-05-18
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Array
(
[id] => 5027030
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[patent_title] => 'KINEMATIC CHUCKS FOR RETICLES AND OTHER PLANAR BODIES'
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Array
(
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Array
(
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Array
(
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Array
(
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[patent_title] => 'PHOTOMASK HAZE REDUCTION VIA VENTILATION'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/740166 | Photomask haze reduction via ventilation | Apr 24, 2007 | Issued |
Array
(
[id] => 5014867
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Array
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Array
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Array
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Array
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