| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2292164
[patent_doc_number] => 04659648
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-04-21
[patent_title] => 'Plasma developable photoresist compositions containing N-substituted 3-vinylcarbazoles'
[patent_app_type] => 1
[patent_app_number] => 6/789601
[patent_app_country] => US
[patent_app_date] => 1985-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 1841
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 144
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/659/04659648.pdf
[firstpage_image] =>[orig_patent_app_number] => 789601
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/789601 | Plasma developable photoresist compositions containing N-substituted 3-vinylcarbazoles | Oct 20, 1985 | Issued |
Array
(
[id] => 2324990
[patent_doc_number] => 04636532
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-01-13
[patent_title] => 'Method for preparing polyglutarimide having a lower molecular weight and a low polydispersity'
[patent_app_type] => 1
[patent_app_number] => 6/786531
[patent_app_country] => US
[patent_app_date] => 1985-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 2283
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 17
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/636/04636532.pdf
[firstpage_image] =>[orig_patent_app_number] => 786531
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/786531 | Method for preparing polyglutarimide having a lower molecular weight and a low polydispersity | Oct 10, 1985 | Issued |
Array
(
[id] => 2303744
[patent_doc_number] => 04690882
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-09-01
[patent_title] => 'Positive acting resist material comprised of novoloc resin derived from phenylphenol'
[patent_app_type] => 1
[patent_app_number] => 6/780038
[patent_app_country] => US
[patent_app_date] => 1985-09-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 4171
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 48
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/690/04690882.pdf
[firstpage_image] =>[orig_patent_app_number] => 780038
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/780038 | Positive acting resist material comprised of novoloc resin derived from phenylphenol | Sep 24, 1985 | Issued |
Array
(
[id] => 2244092
[patent_doc_number] => 04632891
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-12-30
[patent_title] => 'Process for the production of images'
[patent_app_type] => 1
[patent_app_number] => 6/779914
[patent_app_country] => US
[patent_app_date] => 1985-09-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8444
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 148
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/632/04632891.pdf
[firstpage_image] =>[orig_patent_app_number] => 779914
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/779914 | Process for the production of images | Sep 24, 1985 | Issued |
Array
(
[id] => 2385946
[patent_doc_number] => 04707432
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-11-17
[patent_title] => 'Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions'
[patent_app_type] => 1
[patent_app_number] => 6/779343
[patent_app_country] => US
[patent_app_date] => 1985-09-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6467
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 146
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/707/04707432.pdf
[firstpage_image] =>[orig_patent_app_number] => 779343
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/779343 | Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions | Sep 22, 1985 | Issued |
Array
(
[id] => 2335252
[patent_doc_number] => 04677047
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-06-30
[patent_title] => 'Compositions of matter which crosslink under the action of light in the presence of sensitizers'
[patent_app_type] => 1
[patent_app_number] => 6/779184
[patent_app_country] => US
[patent_app_date] => 1985-09-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2512
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 209
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/677/04677047.pdf
[firstpage_image] =>[orig_patent_app_number] => 779184
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/779184 | Compositions of matter which crosslink under the action of light in the presence of sensitizers | Sep 22, 1985 | Issued |
| 06/778794 | RESIN COMPOSITION FOR SOLDER RESIST INK | Sep 22, 1985 | Abandoned |
Array
(
[id] => 2317908
[patent_doc_number] => 04689288
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-08-25
[patent_title] => 'Photosensitive film based on silicon-containing polymer and its use as a masking resin in a lithography process'
[patent_app_type] => 1
[patent_app_number] => 6/777611
[patent_app_country] => US
[patent_app_date] => 1985-09-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 8
[patent_no_of_words] => 5256
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 25
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/689/04689288.pdf
[firstpage_image] =>[orig_patent_app_number] => 777611
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/777611 | Photosensitive film based on silicon-containing polymer and its use as a masking resin in a lithography process | Sep 18, 1985 | Issued |
Array
(
[id] => 2352618
[patent_doc_number] => 04654292
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-03-31
[patent_title] => 'Photoresist composition containing a pyrazole compound anti-halation agent'
[patent_app_type] => 1
[patent_app_number] => 6/776781
[patent_app_country] => US
[patent_app_date] => 1985-09-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2537
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/654/04654292.pdf
[firstpage_image] =>[orig_patent_app_number] => 776781
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/776781 | Photoresist composition containing a pyrazole compound anti-halation agent | Sep 16, 1985 | Issued |
Array
(
[id] => 2344624
[patent_doc_number] => 04656118
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-04-07
[patent_title] => 'Information recording medium using laser beam'
[patent_app_type] => 1
[patent_app_number] => 6/771192
[patent_app_country] => US
[patent_app_date] => 1985-08-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 3973
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 51
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/656/04656118.pdf
[firstpage_image] =>[orig_patent_app_number] => 771192
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/771192 | Information recording medium using laser beam | Aug 29, 1985 | Issued |
| 06/767347 | POLYIMIDE FORMULATION FOR FORMING A PATTERNED FILM ON A SUBSTRATE | Aug 19, 1985 | Abandoned |
Array
(
[id] => 2389004
[patent_doc_number] => 04663269
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-05-05
[patent_title] => 'Method of forming highly sensitive photoresist film in the absence of water'
[patent_app_type] => 1
[patent_app_number] => 6/763371
[patent_app_country] => US
[patent_app_date] => 1985-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 1114
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/663/04663269.pdf
[firstpage_image] =>[orig_patent_app_number] => 763371
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/763371 | Method of forming highly sensitive photoresist film in the absence of water | Aug 6, 1985 | Issued |
Array
(
[id] => 2456790
[patent_doc_number] => 04717643
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1988-01-05
[patent_title] => 'No thermal cure dry film solder mask'
[patent_app_type] => 1
[patent_app_number] => 6/762906
[patent_app_country] => US
[patent_app_date] => 1985-08-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2492
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/717/04717643.pdf
[firstpage_image] =>[orig_patent_app_number] => 762906
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/762906 | No thermal cure dry film solder mask | Aug 5, 1985 | Issued |
Array
(
[id] => 2449990
[patent_doc_number] => 04732843
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1988-03-22
[patent_title] => 'Irradiation cross-linkable thermostable polymer system, for microelectronic applications'
[patent_app_type] => 1
[patent_app_number] => 6/762513
[patent_app_country] => US
[patent_app_date] => 1985-08-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 3914
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/732/04732843.pdf
[firstpage_image] =>[orig_patent_app_number] => 762513
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/762513 | Irradiation cross-linkable thermostable polymer system, for microelectronic applications | Aug 4, 1985 | Issued |
Array
(
[id] => 2422276
[patent_doc_number] => 04780392
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1988-10-25
[patent_title] => 'Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer'
[patent_app_type] => 1
[patent_app_number] => 6/762010
[patent_app_country] => US
[patent_app_date] => 1985-08-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5848
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 176
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/780/04780392.pdf
[firstpage_image] =>[orig_patent_app_number] => 762010
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/762010 | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer | Aug 1, 1985 | Issued |
| 06/762080 | WATER DEVELOPABLE SCREEN PRINTING COMPOSITION | Aug 1, 1985 | Abandoned |
Array
(
[id] => 2387104
[patent_doc_number] => 04772538
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1988-09-20
[patent_title] => 'Water developable lithographic composition'
[patent_app_type] => 1
[patent_app_number] => 6/762090
[patent_app_country] => US
[patent_app_date] => 1985-08-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6085
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 181
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/772/04772538.pdf
[firstpage_image] =>[orig_patent_app_number] => 762090
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/762090 | Water developable lithographic composition | Aug 1, 1985 | Issued |
Array
(
[id] => 2354618
[patent_doc_number] => 04650743
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-03-17
[patent_title] => 'Optical coating composition'
[patent_app_type] => 1
[patent_app_number] => 6/760946
[patent_app_country] => US
[patent_app_date] => 1985-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5621
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 139
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/650/04650743.pdf
[firstpage_image] =>[orig_patent_app_number] => 760946
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/760946 | Optical coating composition | Jul 30, 1985 | Issued |
Array
(
[id] => 2346962
[patent_doc_number] => 04649099
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-03-10
[patent_title] => 'Negative-type resist sensitive to ionizing radiation'
[patent_app_type] => 1
[patent_app_number] => 6/757475
[patent_app_country] => US
[patent_app_date] => 1985-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3871
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 144
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/649/04649099.pdf
[firstpage_image] =>[orig_patent_app_number] => 757475
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/757475 | Negative-type resist sensitive to ionizing radiation | Jul 21, 1985 | Issued |
Array
(
[id] => 2315990
[patent_doc_number] => 04686172
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-08-11
[patent_title] => 'Photosensitive elastomeric composition for flexographic printing plates having improved softness'
[patent_app_type] => 1
[patent_app_number] => 6/756861
[patent_app_country] => US
[patent_app_date] => 1985-07-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3526
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 155
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/686/04686172.pdf
[firstpage_image] =>[orig_patent_app_number] => 756861
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/756861 | Photosensitive elastomeric composition for flexographic printing plates having improved softness | Jul 17, 1985 | Issued |