Cynthia Hamilton

Array ( [id] => 9964516 [patent_doc_number] => 09012126 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-04-21 [patent_title] => 'Positive photosensitive material' [patent_app_type] => utility [patent_app_number] => 13/524790 [patent_app_country] => US [patent_app_date] => 2012-06-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6642 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13524790 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9937576 [patent_doc_number] => 08987386 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-03-24 [patent_title] => 'Method of producing polymeric compound, resist composition, and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 13/491860 [patent_app_country] => US [patent_app_date] => 2012-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 49909 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 65 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13491860 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10072020 [patent_doc_number] => 09110373 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-08-18 [patent_title] => 'Phenolic resin and material for forming underlayer film for lithography' [patent_app_type] => utility [patent_app_number] => 14/123471 [patent_app_country] => US [patent_app_date] => 2012-05-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15494 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 36 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14123471 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9383655 [patent_doc_number] => 20140087136 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-03-27 [patent_title] => 'RESIN COMPOSITION AND SEMICONDUCTOR DEVICE BOARD' [patent_app_type] => utility [patent_app_number] => 14/123026 [patent_app_country] => US [patent_app_date] => 2012-05-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 27418 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14123026 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8509522 [patent_doc_number] => 20120308930 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-12-06 [patent_title] => 'PATTERNING PROCESS AND RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/482650 [patent_app_country] => US [patent_app_date] => 2012-05-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 13 [patent_no_of_words] => 16555 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13482650 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8502415 [patent_doc_number] => 20120301823 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-11-29 [patent_title] => 'POLYMER COMPOSITION AND PHOTORESIST COMPRISING THE POLYMER' [patent_app_type] => utility [patent_app_number] => 13/482559 [patent_app_country] => US [patent_app_date] => 2012-05-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 7556 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13482559 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9518134 [patent_doc_number] => 20140154626 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-06-05 [patent_title] => 'EPOXY-FUNCTIONAL RADIATION-CURABLE COMPOSITION CONTAINING AN EPOXY-FUNCTIONAL SILOXANE OLIGOMER FOR ENHANCED FILM RETENTION AND ADHESION DURING SOLVENT DEVELOPMENT' [patent_app_type] => utility [patent_app_number] => 14/119950 [patent_app_country] => US [patent_app_date] => 2012-05-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 12706 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14119950 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9503230 [patent_doc_number] => 08741541 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-06-03 [patent_title] => 'Compound, resin, photoresist composition, and method for producing photoresist pattern' [patent_app_type] => utility [patent_app_number] => 13/475594 [patent_app_country] => US [patent_app_date] => 2012-05-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 18426 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 20 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13475594 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8477074 [patent_doc_number] => 20120276482 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-11-01 [patent_title] => 'RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND' [patent_app_type] => utility [patent_app_number] => 13/459023 [patent_app_country] => US [patent_app_date] => 2012-04-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20619 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13459023 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8464990 [patent_doc_number] => 20120270155 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-10-25 [patent_title] => 'COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 13/449727 [patent_app_country] => US [patent_app_date] => 2012-04-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 45816 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13449727 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8464985 [patent_doc_number] => 20120270154 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-10-25 [patent_title] => 'RESIN AND PHOTORESIST COMPOSITION COMPRISING SAME' [patent_app_type] => utility [patent_app_number] => 13/447796 [patent_app_country] => US [patent_app_date] => 2012-04-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16466 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13447796 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9280693 [patent_doc_number] => 20140030661 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-01-30 [patent_title] => 'UPPER SURFACE ANTIREFLECTIVE FILM FORMING COMPOSITION AND PATTERN FORMING METHOD USING SAME' [patent_app_type] => utility [patent_app_number] => 14/110324 [patent_app_country] => US [patent_app_date] => 2012-04-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6360 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14110324 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8453108 [patent_doc_number] => 20120264055 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-10-18 [patent_title] => 'PHOTORESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/443155 [patent_app_country] => US [patent_app_date] => 2012-04-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17595 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13443155 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9269052 [patent_doc_number] => 20140023969 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-01-23 [patent_title] => 'POSITIVE PHOTORESIST COMPOSITION, COATING FILM THEREOF, AND NOVOLAC PHENOL RESIN' [patent_app_type] => utility [patent_app_number] => 14/110311 [patent_app_country] => US [patent_app_date] => 2012-04-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 11562 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14110311 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11924198 [patent_doc_number] => 09791776 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-10-17 [patent_title] => 'Resist composition and method for producing resist pattern' [patent_app_type] => utility [patent_app_number] => 13/441032 [patent_app_country] => US [patent_app_date] => 2012-04-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15480 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 65 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13441032 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9269053 [patent_doc_number] => 20140023970 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-01-23 [patent_title] => 'Photo-Patternable and Developable Silsesquioxane Resins for Use in Device Fabrication' [patent_app_type] => utility [patent_app_number] => 14/007671 [patent_app_country] => US [patent_app_date] => 2012-03-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 5257 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14007671 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9454912 [patent_doc_number] => 08715916 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-05-06 [patent_title] => 'Pattern forming method and resist underlayer film-forming composition' [patent_app_type] => utility [patent_app_number] => 13/430691 [patent_app_country] => US [patent_app_date] => 2012-03-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14485 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 145 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13430691 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8430070 [patent_doc_number] => 20120251945 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-10-04 [patent_title] => 'PHOTORESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/428555 [patent_app_country] => US [patent_app_date] => 2012-03-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16240 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13428555 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8289693 [patent_doc_number] => 20120178024 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-07-12 [patent_title] => 'POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND' [patent_app_type] => utility [patent_app_number] => 13/427855 [patent_app_country] => US [patent_app_date] => 2012-03-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 15663 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13427855 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9086075 [patent_doc_number] => 08557501 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-10-15 [patent_title] => 'Developable bottom antireflective coating compositions especially suitable for ion implant applications' [patent_app_type] => utility [patent_app_number] => 13/425903 [patent_app_country] => US [patent_app_date] => 2012-03-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4179 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13425903 [rel_patent_id] =>[rel_patent_doc_number] =>)