| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 13416621
[patent_doc_number] => 20180259853
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-09-13
[patent_title] => CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE
[patent_app_type] => utility
[patent_app_number] => 15/909070
[patent_app_country] => US
[patent_app_date] => 2018-03-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 22016
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -5
[patent_words_short_claim] => 164
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15909070
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/909070 | Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated article | Feb 28, 2018 | Issued |
Array
(
[id] => 14378297
[patent_doc_number] => 20190163061
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-05-30
[patent_title] => POLYIMIDE PRECURSOR AND LITHOGRAPHY PATTERN FORMED BY THE SAME
[patent_app_type] => utility
[patent_app_number] => 15/908781
[patent_app_country] => US
[patent_app_date] => 2018-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4922
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -16
[patent_words_short_claim] => 54
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15908781
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/908781 | POLYIMIDE PRECURSOR AND LITHOGRAPHY PATTERN FORMED BY THE SAME | Feb 27, 2018 | Abandoned |
Array
(
[id] => 12867484
[patent_doc_number] => 20180181003
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-06-28
[patent_title] => PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE
[patent_app_type] => utility
[patent_app_number] => 15/904438
[patent_app_country] => US
[patent_app_date] => 2018-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 40512
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 19
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15904438
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/904438 | Pattern forming method, method for manufacturing electronic device, and laminate | Feb 25, 2018 | Issued |
Array
(
[id] => 16278401
[patent_doc_number] => 10761426
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2020-09-01
[patent_title] => Pattern forming method, method for manufacturing electronic device, and laminate
[patent_app_type] => utility
[patent_app_number] => 15/904439
[patent_app_country] => US
[patent_app_date] => 2018-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 39056
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15904439
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/904439 | Pattern forming method, method for manufacturing electronic device, and laminate | Feb 25, 2018 | Issued |
Array
(
[id] => 16129121
[patent_doc_number] => 10698317
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2020-06-30
[patent_title] => Underlayer material for photoresist
[patent_app_type] => utility
[patent_app_number] => 15/903796
[patent_app_country] => US
[patent_app_date] => 2018-02-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 18
[patent_no_of_words] => 6969
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 138
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15903796
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/903796 | Underlayer material for photoresist | Feb 22, 2018 | Issued |
Array
(
[id] => 13447947
[patent_doc_number] => 20180275516
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-09-27
[patent_title] => SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
[patent_app_type] => utility
[patent_app_number] => 15/903652
[patent_app_country] => US
[patent_app_date] => 2018-02-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 23541
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -22
[patent_words_short_claim] => 155
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15903652
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/903652 | Sulfonium salt, resist composition, and patterning process | Feb 22, 2018 | Issued |
Array
(
[id] => 13360701
[patent_doc_number] => 20180231890
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-08-16
[patent_title] => AGENT FOR RESIST HYDROPHILIZATION TREATMENT
[patent_app_type] => utility
[patent_app_number] => 15/893079
[patent_app_country] => US
[patent_app_date] => 2018-02-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7135
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15893079
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/893079 | Agent for resist hydrophilization treatment | Feb 8, 2018 | Issued |
Array
(
[id] => 13343197
[patent_doc_number] => 20180223138
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-08-09
[patent_title] => PRESSURE SENSITIVE ADHESIVE COMPOSITION AND PRESSURE SENSITIVE ADHESIVE PATTERN FORMED THERFROM
[patent_app_type] => utility
[patent_app_number] => 15/893267
[patent_app_country] => US
[patent_app_date] => 2018-02-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5564
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15893267
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/893267 | Pressure sensitive adhesive composition and pressure sensitive adhesive pattern formed therfrom | Feb 8, 2018 | Issued |
Array
(
[id] => 13375415
[patent_doc_number] => 20180239249
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-08-23
[patent_title] => RESIST COMPOSITION AND PATTERNING PROCESS
[patent_app_type] => utility
[patent_app_number] => 15/891633
[patent_app_country] => US
[patent_app_date] => 2018-02-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10930
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -13
[patent_words_short_claim] => 320
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15891633
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/891633 | Resist composition and patterning process | Feb 7, 2018 | Issued |
Array
(
[id] => 12686605
[patent_doc_number] => 20180120701
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-05-03
[patent_title] => ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
[patent_app_type] => utility
[patent_app_number] => 15/856064
[patent_app_country] => US
[patent_app_date] => 2017-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 29056
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 129
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15856064
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/856064 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing | Dec 27, 2017 | Issued |
Array
(
[id] => 12627795
[patent_doc_number] => 20180101095
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-04-12
[patent_title] => Silicon-Containing Photoresist for Lithography
[patent_app_type] => utility
[patent_app_number] => 15/837232
[patent_app_country] => US
[patent_app_date] => 2017-12-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6032
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 33
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15837232
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/837232 | Silicon-containing photoresist for lithography | Dec 10, 2017 | Issued |
Array
(
[id] => 12818539
[patent_doc_number] => 20180164685
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-06-14
[patent_title] => METHOD USING SILICON-CONTAINING UNDERLAYERS
[patent_app_type] => utility
[patent_app_number] => 15/826925
[patent_app_country] => US
[patent_app_date] => 2017-11-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9853
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15826925
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/826925 | METHOD USING SILICON-CONTAINING UNDERLAYERS | Nov 29, 2017 | Abandoned |
Array
(
[id] => 15227739
[patent_doc_number] => 10501580
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2019-12-10
[patent_title] => Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition
[patent_app_type] => utility
[patent_app_number] => 15/824360
[patent_app_country] => US
[patent_app_date] => 2017-11-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 28828
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 108
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15824360
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/824360 | Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition | Nov 27, 2017 | Issued |
Array
(
[id] => 15227739
[patent_doc_number] => 10501580
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2019-12-10
[patent_title] => Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition
[patent_app_type] => utility
[patent_app_number] => 15/824360
[patent_app_country] => US
[patent_app_date] => 2017-11-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 28828
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 108
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15824360
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/824360 | Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition | Nov 27, 2017 | Issued |
Array
(
[id] => 12262081
[patent_doc_number] => 20180081277
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-03-22
[patent_title] => 'PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOSITION FOR FORMING UPPER LAYER FILM'
[patent_app_type] => utility
[patent_app_number] => 15/823593
[patent_app_country] => US
[patent_app_date] => 2017-11-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 39537
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15823593
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/823593 | Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer film | Nov 27, 2017 | Issued |
Array
(
[id] => 15227739
[patent_doc_number] => 10501580
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2019-12-10
[patent_title] => Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition
[patent_app_type] => utility
[patent_app_number] => 15/824360
[patent_app_country] => US
[patent_app_date] => 2017-11-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 28828
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 108
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15824360
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/824360 | Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition | Nov 27, 2017 | Issued |
Array
(
[id] => 15227739
[patent_doc_number] => 10501580
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2019-12-10
[patent_title] => Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition
[patent_app_type] => utility
[patent_app_number] => 15/824360
[patent_app_country] => US
[patent_app_date] => 2017-11-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 28828
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 108
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15824360
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/824360 | Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition | Nov 27, 2017 | Issued |
Array
(
[id] => 15885979
[patent_doc_number] => 10649330
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2020-05-12
[patent_title] => Resist composition, method of forming resist pattern, compound, and acid generator
[patent_app_type] => utility
[patent_app_number] => 15/822999
[patent_app_country] => US
[patent_app_date] => 2017-11-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 39288
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 124
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15822999
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/822999 | Resist composition, method of forming resist pattern, compound, and acid generator | Nov 26, 2017 | Issued |
Array
(
[id] => 15283877
[patent_doc_number] => 10514601
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2019-12-24
[patent_title] => Chemically amplified positive resist film laminate and pattern forming process
[patent_app_type] => utility
[patent_app_number] => 15/819532
[patent_app_country] => US
[patent_app_date] => 2017-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 10297
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 143
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15819532
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/819532 | Chemically amplified positive resist film laminate and pattern forming process | Nov 20, 2017 | Issued |
Array
(
[id] => 16431021
[patent_doc_number] => 10831100
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2020-11-10
[patent_title] => Iodine-containing photoacid generators and compositions comprising the same
[patent_app_type] => utility
[patent_app_number] => 15/817864
[patent_app_country] => US
[patent_app_date] => 2017-11-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 7084
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 238
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15817864
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/817864 | Iodine-containing photoacid generators and compositions comprising the same | Nov 19, 2017 | Issued |