
Cynthia Hamilton
Examiner (ID: 369)
| Most Active Art Unit | 1752 |
| Art Unit(s) | 1506, 1722, 1113, 1754, 1752, 1717, 1507, 1737, 1795 |
| Total Applications | 2262 |
| Issued Applications | 1774 |
| Pending Applications | 48 |
| Abandoned Applications | 444 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5742532
[patent_doc_number] => 20060088257
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-04-27
[patent_title] => 'Photosensitive resin composition for optical waveguides, and optical waveguide and manufacturing method thereof'
[patent_app_type] => utility
[patent_app_number] => 11/255030
[patent_app_country] => US
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[pdf_file] => publications/A1/0088/20060088257.pdf
[firstpage_image] =>[orig_patent_app_number] => 11255030
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/255030 | Photosensitive resin composition for optical waveguides, and optical waveguide and manufacturing method thereof | Oct 20, 2005 | Abandoned |
Array
(
[id] => 5045928
[patent_doc_number] => 20070264601
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-15
[patent_title] => 'Photosensitive Resin Composition and Photosensitive Dry Film by the Use Thereof'
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[patent_app_number] => 11/667051
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/667051 | Photosensitive Resin Composition and Photosensitive Dry Film by the Use Thereof | Oct 18, 2005 | Abandoned |
Array
(
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[patent_doc_number] => 07662538
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-02-16
[patent_title] => 'Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same'
[patent_app_type] => utility
[patent_app_number] => 11/250014
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[patent_app_date] => 2005-10-13
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/250014 | Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same | Oct 12, 2005 | Issued |
Array
(
[id] => 4982727
[patent_doc_number] => 20070087285
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-04-19
[patent_title] => 'Top antireflective coating composition with low refractive index at 193nm radiation wavelength'
[patent_app_type] => utility
[patent_app_number] => 11/249693
[patent_app_country] => US
[patent_app_date] => 2005-10-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/249693 | Top antireflective coating composition with low refractive index at 193nm radiation wavelength | Oct 12, 2005 | Issued |
| 11/245402 | Photothermographic and photographic elements having a transparent support having antihalation properties and properties for reducing woodgrain | Oct 5, 2005 | Abandoned |
Array
(
[id] => 816939
[patent_doc_number] => 07410747
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[patent_issue_date] => 2008-08-12
[patent_title] => 'Positive resist composition and pattern forming method using the same'
[patent_app_type] => utility
[patent_app_number] => 11/234187
[patent_app_country] => US
[patent_app_date] => 2005-09-26
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/234187 | Positive resist composition and pattern forming method using the same | Sep 25, 2005 | Issued |
Array
(
[id] => 5720636
[patent_doc_number] => 20060073411
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[patent_kind] => A1
[patent_issue_date] => 2006-04-06
[patent_title] => 'Chemically amplified resist composition'
[patent_app_type] => utility
[patent_app_number] => 11/233130
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 11233130
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/233130 | Chemically amplified resist composition | Sep 22, 2005 | Abandoned |
Array
(
[id] => 5637347
[patent_doc_number] => 20060068320
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-30
[patent_title] => 'Resist composition and method of pattern formation with the same'
[patent_app_type] => utility
[patent_app_number] => 11/229518
[patent_app_country] => US
[patent_app_date] => 2005-09-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => publications/A1/0068/20060068320.pdf
[firstpage_image] =>[orig_patent_app_number] => 11229518
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/229518 | Resist composition and method of pattern formation with the same | Sep 19, 2005 | Issued |
Array
(
[id] => 5903050
[patent_doc_number] => 20060046195
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-02
[patent_title] => 'Positive resist composition and pattern forming method using the same'
[patent_app_type] => utility
[patent_app_number] => 11/217422
[patent_app_country] => US
[patent_app_date] => 2005-09-02
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Array
(
[id] => 800262
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[patent_title] => 'Chemical amplification resist composition and pattern-forming method using the same'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/206220 | Chemical amplification resist composition and pattern-forming method using the same | Aug 17, 2005 | Issued |
Array
(
[id] => 7607754
[patent_doc_number] => 07097959
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[patent_kind] => B1
[patent_issue_date] => 2006-08-29
[patent_title] => 'Negative resist composition'
[patent_app_type] => utility
[patent_app_number] => 11/207143
[patent_app_country] => US
[patent_app_date] => 2005-08-17
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[firstpage_image] =>[orig_patent_app_number] => 11207143
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/207143 | Negative resist composition | Aug 16, 2005 | Issued |
Array
(
[id] => 5303329
[patent_doc_number] => 20090297981
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[patent_issue_date] => 2009-12-03
[patent_title] => 'Photosensitive Resin Composition and Photosensitive Film Made with the Same'
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Array
(
[id] => 5648815
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[patent_title] => 'Low refractive index polymers as underlayers for silicon-containing photoresists'
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Array
(
[id] => 5820301
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[patent_title] => 'Photopolymerizable composition'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/193681 | Photopolymerizable composition | Jul 28, 2005 | Issued |
Array
(
[id] => 5710356
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[patent_title] => 'Polymerizable composition and planographic printing plate precursor'
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/182830 | Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same | Jul 17, 2005 | Abandoned |
Array
(
[id] => 5101119
[patent_doc_number] => 20070184381
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[patent_issue_date] => 2007-08-09
[patent_title] => 'Lithographic printing plates with high print run stability'
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[firstpage_image] =>[orig_patent_app_number] => 11571934
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/571934 | Lithographic printing plates with high print run stability | Jul 13, 2005 | Abandoned |
Array
(
[id] => 404535
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[patent_title] => 'Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same'
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Array
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/173466 | Method for making a lithographic printing plate | Jun 29, 2005 | Issued |