
Cynthia Hamilton
Examiner (ID: 104, Phone: (571)272-1331 , Office: P/1722 )
| Most Active Art Unit | |
| Art Unit(s) | |
| Total Applications | |
| Issued Applications | |
| Pending Applications | |
| Abandoned Applications |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
| 08/510773 | PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | Aug 2, 1995 | Abandoned |
| 08/508721 | PHOTOPOLYMERIZABLE COMPOSITION BACKGROUND OF THE INVENTION | Jul 27, 1995 | Abandoned |
| 08/508190 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR USING SAME IN MANUFACTURE OF CIRCUIT BOARDS | Jul 26, 1995 | Abandoned |
| 08/502307 | IMPROVED PROCESS AND SYSTEM OF MAKING A PHOTOPOLYMER PRINTING PLATE | Jul 12, 1995 | Abandoned |
| 08/501605 | Method for forming submicroscopic patterns | Jul 11, 1995 | Issued |
| 08/499974 | Photosensitive material | Jul 9, 1995 | Issued |
| 08/498225 | Photosensitive resin composition and a process for forming a patterned polyimide film using the same | Jul 4, 1995 | Issued |
| 08/497886 | Method and apparatus for developing resist | Jul 2, 1995 | Issued |
| 08/497733 | ELECTRODEPOSITABLE PHOTOIMAGEABLE COMPOSITIONS WITH IMPROVED EDGE COVERAGE | Jul 2, 1995 | Abandoned |
| 08/494617 | Digital laser imagable lithographic printing plates | Jun 22, 1995 | Issued |
| 08/483614 | WATERBORNE PHOTORESIST EMULSIONS AND METHODS OF PREPARATION THEREOF | Jun 6, 1995 | Abandoned |
| 08/483976 | Photosensitive composition with cyanate esters and use thereof | Jun 6, 1995 | Issued |
| 08/477373 | IMPROVED COMPOSITION FOR PHOTOIMAGING | Jun 6, 1995 | Abandoned |
| 08/476482 | PHOTOHARDENABLE EPOXY COMPOSITION | Jun 6, 1995 | Abandoned |
| 08/482555 | Exposure method and apparatus | Jun 6, 1995 | Issued |
| 08/475703 | PHOTOSENSITIVE COMPOSITIONS AND CLEAN RUNNING PHOTOPOLYMER PRINTING PLATES THEREFROM | Jun 6, 1995 | Abandoned |
| 08/480007 | Combinatorial synthesis of novel materials | Jun 6, 1995 | Issued |
| 08/468744 | NEGATIVE TYPE COMPOSITION FOR CHEMICALLY AMPLIFIED RESIST AND PROCESS AND APPARATUS OF FORMATION OF CHEMICALLY AMPLIFIED RESIST PATTERN | Jun 5, 1995 | Abandoned |
| 08/466561 | Polymeric dyes for antireflective coatings | Jun 5, 1995 | Issued |
| 08/466136 | Light-sensitive composition | Jun 5, 1995 | Issued |