| Application number | Title of the application | Filing Date | Status |
|---|
| 08/405264 | SOLID STATE CHAIN EXTENSION METHOD | Mar 13, 1995 | Abandoned |
| 08/399400 | ENERGY-SENSITIVE RESIST MATERIAL AND A PROCESS FOR DEVICE FABRICATION USING AN ENERGY-SENSITIVE RESIST MATERIAL | Mar 6, 1995 | Abandoned |
| 08/394762 | METHOD FOR MANUFACTURING PRINTED CIRCUIT BOARD | Feb 26, 1995 | Abandoned |
Array
(
[id] => 3553459
[patent_doc_number] => 05543262
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-08-06
[patent_title] => 'Benzanthrone polymerization gate in photopolymerizable compositions'
[patent_app_type] => 1
[patent_app_number] => 8/393969
[patent_app_country] => US
[patent_app_date] => 1995-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4800
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/543/05543262.pdf
[firstpage_image] =>[orig_patent_app_number] => 393969
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/393969 | Benzanthrone polymerization gate in photopolymerizable compositions | Feb 23, 1995 | Issued |
| 08/394154 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING THE SAME | Feb 23, 1995 | Abandoned |
Array
(
[id] => 3872614
[patent_doc_number] => 05747201
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-05-05
[patent_title] => 'Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method'
[patent_app_type] => 1
[patent_app_number] => 8/392196
[patent_app_country] => US
[patent_app_date] => 1995-02-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 20
[patent_no_of_words] => 8691
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 89
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/747/05747201.pdf
[firstpage_image] =>[orig_patent_app_number] => 392196
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/392196 | Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method | Feb 21, 1995 | Issued |
Array
(
[id] => 3619747
[patent_doc_number] => 05593812
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-01-14
[patent_title] => 'Photoresist having increased sensitivity and use thereof'
[patent_app_type] => 1
[patent_app_number] => 8/389864
[patent_app_country] => US
[patent_app_date] => 1995-02-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2814
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/593/05593812.pdf
[firstpage_image] =>[orig_patent_app_number] => 389864
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/389864 | Photoresist having increased sensitivity and use thereof | Feb 16, 1995 | Issued |
Array
(
[id] => 3591759
[patent_doc_number] => 05487967
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-01-30
[patent_title] => 'Surface-imaging technique for lithographic processes for device fabrication'
[patent_app_type] => 1
[patent_app_number] => 8/390733
[patent_app_country] => US
[patent_app_date] => 1995-02-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 8411
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 212
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/487/05487967.pdf
[firstpage_image] =>[orig_patent_app_number] => 390733
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/390733 | Surface-imaging technique for lithographic processes for device fabrication | Feb 16, 1995 | Issued |
| 08/388948 | METHOD OF APPLYING A PHOTOSENSITIVE RESIN TO A SUBSTRATE FOR USE IN PAPERMAKING | Feb 14, 1995 | Abandoned |
Array
(
[id] => 3579132
[patent_doc_number] => 05491046
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-02-13
[patent_title] => 'Method of imaging a lithographic printing plate'
[patent_app_type] => 1
[patent_app_number] => 8/386839
[patent_app_country] => US
[patent_app_date] => 1995-02-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6202
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 116
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/491/05491046.pdf
[firstpage_image] =>[orig_patent_app_number] => 386839
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/386839 | Method of imaging a lithographic printing plate | Feb 9, 1995 | Issued |
| 08/369500 | METHOD OF MAKING RESIST PATTERNS | Jan 5, 1995 | Abandoned |
Array
(
[id] => 3590536
[patent_doc_number] => 05521052
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-05-28
[patent_title] => 'Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom'
[patent_app_type] => 1
[patent_app_number] => 8/365659
[patent_app_country] => US
[patent_app_date] => 1994-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6875
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 295
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/521/05521052.pdf
[firstpage_image] =>[orig_patent_app_number] => 365659
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/365659 | Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom | Dec 29, 1994 | Issued |
Array
(
[id] => 3618597
[patent_doc_number] => 05614352
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-03-25
[patent_title] => 'Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin'
[patent_app_type] => 1
[patent_app_number] => 8/366614
[patent_app_country] => US
[patent_app_date] => 1994-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7117
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 355
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/614/05614352.pdf
[firstpage_image] =>[orig_patent_app_number] => 366614
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/366614 | Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin | Dec 29, 1994 | Issued |
| 08/365407 | RADIATION SENSITIVE MATERIAL AND METHOD FOR FORMING PATTERN | Dec 27, 1994 | Abandoned |
Array
(
[id] => 3826980
[patent_doc_number] => 05738975
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-14
[patent_title] => 'Photosensitive resin and method for patterning by use of the same'
[patent_app_type] => 1
[patent_app_number] => 8/364486
[patent_app_country] => US
[patent_app_date] => 1994-12-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 6
[patent_no_of_words] => 7466
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 199
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/738/05738975.pdf
[firstpage_image] =>[orig_patent_app_number] => 364486
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/364486 | Photosensitive resin and method for patterning by use of the same | Dec 26, 1994 | Issued |
| 08/355122 | PHOTOSENSITIVE COMPOSITIONS AND CLEAN RUNNING PHOTOPOLYMER PRINTING PLATES THEREFROM | Dec 12, 1994 | Abandoned |
| 08/355121 | SOFT RELIEF PHOTOPOLYMER PRINTING PLATES FOR FLEXOGRAPHIC PRINTING | Dec 12, 1994 | Abandoned |
Array
(
[id] => 4322744
[patent_doc_number] => 06329126
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-12-11
[patent_title] => 'Developer solution for acitinic ray sensitive resist'
[patent_app_type] => 1
[patent_app_number] => 8/339340
[patent_app_country] => US
[patent_app_date] => 1994-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3482
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 180
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/329/06329126.pdf
[firstpage_image] =>[orig_patent_app_number] => 339340
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/339340 | Developer solution for acitinic ray sensitive resist | Nov 13, 1994 | Issued |
Array
(
[id] => 3988132
[patent_doc_number] => 05985356
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-16
[patent_title] => 'Combinatorial synthesis of novel materials'
[patent_app_type] => 1
[patent_app_number] => 8/327513
[patent_app_country] => US
[patent_app_date] => 1994-10-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 39
[patent_no_of_words] => 21872
[patent_no_of_claims] => 67
[patent_no_of_ind_claims] => 34
[patent_words_short_claim] => 20
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/985/05985356.pdf
[firstpage_image] =>[orig_patent_app_number] => 327513
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/327513 | Combinatorial synthesis of novel materials | Oct 17, 1994 | Issued |
Array
(
[id] => 3631366
[patent_doc_number] => 05609993
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-03-11
[patent_title] => 'Process for producing lithographic printing plate, photosensitive plate and aqueous ink composition therefor'
[patent_app_type] => 1
[patent_app_number] => 8/318559
[patent_app_country] => US
[patent_app_date] => 1994-10-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5340
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 186
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/609/05609993.pdf
[firstpage_image] =>[orig_patent_app_number] => 318559
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/318559 | Process for producing lithographic printing plate, photosensitive plate and aqueous ink composition therefor | Oct 4, 1994 | Issued |