
Daborah Chacko Davis
Examiner (ID: 2065)
| Most Active Art Unit | 1737 |
| Art Unit(s) | 1753, 1756, 1795, 1722, 1737 |
| Total Applications | 1471 |
| Issued Applications | 997 |
| Pending Applications | 123 |
| Abandoned Applications | 376 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1278060
[patent_doc_number] => 06645871
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-11-11
[patent_title] => 'Method of holding substrate and substrate holding system'
[patent_app_type] => B2
[patent_app_number] => 10/024723
[patent_app_country] => US
[patent_app_date] => 2001-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 16
[patent_no_of_words] => 11751
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 314
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/645/06645871.pdf
[firstpage_image] =>[orig_patent_app_number] => 10024723
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/024723 | Method of holding substrate and substrate holding system | Dec 20, 2001 | Issued |
Array
(
[id] => 6408947
[patent_doc_number] => 20020182823
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-05
[patent_title] => 'Wafer oxidation reactor and a method for forming a semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/007054
[patent_app_country] => US
[patent_app_date] => 2001-12-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 4116
[patent_no_of_claims] => 32
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0182/20020182823.pdf
[firstpage_image] =>[orig_patent_app_number] => 10007054
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/007054 | Wafer oxidation reactor and a method for forming a semiconductor device | Dec 2, 2001 | Abandoned |
Array
(
[id] => 1255124
[patent_doc_number] => 06666920
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-12-23
[patent_title] => 'Gas collector for providing an even flow of gasses through a reaction chamber of an epitaxial reactor'
[patent_app_type] => B1
[patent_app_number] => 09/993614
[patent_app_country] => US
[patent_app_date] => 2001-11-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 6025
[patent_no_of_claims] => 47
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/666/06666920.pdf
[firstpage_image] =>[orig_patent_app_number] => 09993614
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/993614 | Gas collector for providing an even flow of gasses through a reaction chamber of an epitaxial reactor | Nov 26, 2001 | Issued |
Array
(
[id] => 1204334
[patent_doc_number] => 06716289
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-04-06
[patent_title] => 'Rigid gas collector for providing an even flow of gasses'
[patent_app_type] => B1
[patent_app_number] => 09/993613
[patent_app_country] => US
[patent_app_date] => 2001-11-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 9
[patent_no_of_words] => 5524
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/716/06716289.pdf
[firstpage_image] =>[orig_patent_app_number] => 09993613
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/993613 | Rigid gas collector for providing an even flow of gasses | Nov 26, 2001 | Issued |
| 09/979912 | Apparatus for manufacturing semiconductor device | Nov 25, 2001 | Abandoned |
Array
(
[id] => 5932160
[patent_doc_number] => 20020059904
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-05-23
[patent_title] => 'Surface sealing showerhead for vapor deposition reactor having integrated flow diverters'
[patent_app_type] => new
[patent_app_number] => 09/990971
[patent_app_country] => US
[patent_app_date] => 2001-11-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 2671
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 144
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0059/20020059904.pdf
[firstpage_image] =>[orig_patent_app_number] => 09990971
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/990971 | Surface sealing showerhead for vapor deposition reactor having integrated flow diverters | Nov 19, 2001 | Issued |
Array
(
[id] => 6074567
[patent_doc_number] => 20020078893
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-27
[patent_title] => 'Plasma enhanced chemical processing reactor and method'
[patent_app_type] => new
[patent_app_number] => 09/994008
[patent_app_country] => US
[patent_app_date] => 2001-11-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[patent_no_of_words] => 7216
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0078/20020078893.pdf
[firstpage_image] =>[orig_patent_app_number] => 09994008
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/994008 | Plasma enhanced chemical processing reactor and method | Nov 15, 2001 | Abandoned |
Array
(
[id] => 1585642
[patent_doc_number] => 06481955
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-11-19
[patent_title] => 'Vacuum treatment equipment'
[patent_app_type] => B2
[patent_app_number] => 09/987605
[patent_app_country] => US
[patent_app_date] => 2001-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 18
[patent_no_of_words] => 5556
[patent_no_of_claims] => 41
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[patent_words_short_claim] => 173
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/481/06481955.pdf
[firstpage_image] =>[orig_patent_app_number] => 09987605
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/987605 | Vacuum treatment equipment | Nov 14, 2001 | Issued |
| 09/980583 | Device for film deposition | Nov 14, 2001 | Abandoned |
Array
(
[id] => 6860733
[patent_doc_number] => 20030091741
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-15
[patent_title] => 'Apparatus and method for sulfonating an article and articles made therefrom'
[patent_app_type] => new
[patent_app_number] => 10/008431
[patent_app_country] => US
[patent_app_date] => 2001-11-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 7478
[patent_no_of_claims] => 43
[patent_no_of_ind_claims] => 6
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0091/20030091741.pdf
[firstpage_image] =>[orig_patent_app_number] => 10008431
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/008431 | Apparatus and method for sulfonating an article and articles made therefrom | Nov 12, 2001 | Issued |
Array
(
[id] => 1148916
[patent_doc_number] => 06767429
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-07-27
[patent_title] => 'Vacuum processing apparatus'
[patent_app_type] => B2
[patent_app_number] => 09/890833
[patent_app_country] => US
[patent_app_date] => 2001-11-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 4215
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[pdf_file] => patents/06/767/06767429.pdf
[firstpage_image] =>[orig_patent_app_number] => 09890833
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/890833 | Vacuum processing apparatus | Nov 8, 2001 | Issued |
Array
(
[id] => 7212887
[patent_doc_number] => 20050054198
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-10
[patent_title] => 'Apparatus of chemical vapor deposition'
[patent_app_type] => utility
[patent_app_number] => 10/494556
[patent_app_country] => US
[patent_app_date] => 2001-11-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[pdf_file] => publications/A1/0054/20050054198.pdf
[firstpage_image] =>[orig_patent_app_number] => 10494556
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/494556 | Apparatus of chemical vapor deposition | Nov 4, 2001 | Abandoned |
Array
(
[id] => 1030572
[patent_doc_number] => 06878234
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-04-12
[patent_title] => 'Plasma processing device and exhaust ring'
[patent_app_type] => utility
[patent_app_number] => 10/416235
[patent_app_country] => US
[patent_app_date] => 2001-11-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/06/878/06878234.pdf
[firstpage_image] =>[orig_patent_app_number] => 10416235
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/416235 | Plasma processing device and exhaust ring | Nov 1, 2001 | Issued |
Array
(
[id] => 530994
[patent_doc_number] => 07172674
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-02-06
[patent_title] => 'Device for liquid treatment of wafer-shaped articles'
[patent_app_type] => utility
[patent_app_number] => 09/984707
[patent_app_country] => US
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[pdf_file] => patents/07/172/07172674.pdf
[firstpage_image] =>[orig_patent_app_number] => 09984707
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/984707 | Device for liquid treatment of wafer-shaped articles | Oct 30, 2001 | Issued |
Array
(
[id] => 1411649
[patent_doc_number] => 06508913
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-01-21
[patent_title] => 'Gas distribution apparatus for semiconductor processing'
[patent_app_type] => B2
[patent_app_number] => 09/983680
[patent_app_country] => US
[patent_app_date] => 2001-10-25
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[pdf_file] => patents/06/508/06508913.pdf
[firstpage_image] =>[orig_patent_app_number] => 09983680
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/983680 | Gas distribution apparatus for semiconductor processing | Oct 24, 2001 | Issued |
Array
(
[id] => 1219332
[patent_doc_number] => 06702901
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-03-09
[patent_title] => 'Chamber for chemical vapor deposition'
[patent_app_type] => B2
[patent_app_number] => 09/999611
[patent_app_country] => US
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[pdf_file] => patents/06/702/06702901.pdf
[firstpage_image] =>[orig_patent_app_number] => 09999611
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/999611 | Chamber for chemical vapor deposition | Oct 23, 2001 | Issued |
Array
(
[id] => 1271554
[patent_doc_number] => 06649019
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-11-18
[patent_title] => 'Apparatus for conditioning the atmosphere in a vacuum chamber'
[patent_app_type] => B2
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[pdf_file] => patents/06/649/06649019.pdf
[firstpage_image] =>[orig_patent_app_number] => 09981745
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/981745 | Apparatus for conditioning the atmosphere in a vacuum chamber | Oct 18, 2001 | Issued |
Array
(
[id] => 6242547
[patent_doc_number] => 20020045362
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-04-18
[patent_title] => 'Method of forming a silicon nitride layer on a semiconductor wafer'
[patent_app_type] => new
[patent_app_number] => 09/973403
[patent_app_country] => US
[patent_app_date] => 2001-10-08
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0045/20020045362.pdf
[firstpage_image] =>[orig_patent_app_number] => 09973403
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/973403 | Method of forming a silicon nitride layer on a semiconductor wafer | Oct 7, 2001 | Abandoned |
Array
(
[id] => 1118151
[patent_doc_number] => 06797108
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[patent_kind] => B2
[patent_issue_date] => 2004-09-28
[patent_title] => 'Apparatus and method for evenly flowing processing gas onto a semiconductor wafer'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/972544 | Apparatus and method for evenly flowing processing gas onto a semiconductor wafer | Oct 4, 2001 | Issued |
Array
(
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[patent_title] => 'Chemical vapor deposition apparatus and chemical vapor deposition method'
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[firstpage_image] =>[orig_patent_app_number] => 09962143
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/962143 | Chemical vapor deposition apparatus and chemical vapor deposition method | Sep 25, 2001 | Issued |