
Daborah Chacko Davis
Examiner (ID: 2065)
| Most Active Art Unit | 1737 |
| Art Unit(s) | 1753, 1756, 1795, 1722, 1737 |
| Total Applications | 1471 |
| Issued Applications | 997 |
| Pending Applications | 123 |
| Abandoned Applications | 376 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7062841
[patent_doc_number] => 20010042511
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-22
[patent_title] => 'Reduction of plasma edge effect on plasma enhanced CVD processes'
[patent_app_type] => new
[patent_app_number] => 09/853397
[patent_app_country] => US
[patent_app_date] => 2001-05-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 3337
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 29
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0042/20010042511.pdf
[firstpage_image] =>[orig_patent_app_number] => 09853397
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/853397 | Reduction of plasma edge effect on plasma enhanced CVD processes | May 10, 2001 | Issued |
Array
(
[id] => 1403369
[patent_doc_number] => 06524428
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-02-25
[patent_title] => 'Method of holding substrate and substrate holding system'
[patent_app_type] => B2
[patent_app_number] => 09/849405
[patent_app_country] => US
[patent_app_date] => 2001-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 16
[patent_no_of_words] => 11771
[patent_no_of_claims] => 11
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[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/524/06524428.pdf
[firstpage_image] =>[orig_patent_app_number] => 09849405
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/849405 | Method of holding substrate and substrate holding system | May 6, 2001 | Issued |
Array
(
[id] => 1342747
[patent_doc_number] => 06579372
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-06-17
[patent_title] => 'Apparatus and method for depositing thin film on wafer using atomic layer deposition'
[patent_app_type] => B2
[patent_app_number] => 09/848579
[patent_app_country] => US
[patent_app_date] => 2001-05-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 9
[patent_no_of_words] => 7011
[patent_no_of_claims] => 19
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[patent_words_short_claim] => 228
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/579/06579372.pdf
[firstpage_image] =>[orig_patent_app_number] => 09848579
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/848579 | Apparatus and method for depositing thin film on wafer using atomic layer deposition | May 2, 2001 | Issued |
Array
(
[id] => 6469968
[patent_doc_number] => 20020151186
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-17
[patent_title] => 'Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment'
[patent_app_type] => new
[patent_app_number] => 09/833437
[patent_app_country] => US
[patent_app_date] => 2001-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2545
[patent_no_of_claims] => 11
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[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0151/20020151186.pdf
[firstpage_image] =>[orig_patent_app_number] => 09833437
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/833437 | Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment | Apr 10, 2001 | Issued |
Array
(
[id] => 5888095
[patent_doc_number] => 20020012749
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-01-31
[patent_title] => 'Method and apparatus for coating and/or treating substrates'
[patent_app_type] => new
[patent_app_number] => 09/821763
[patent_app_country] => US
[patent_app_date] => 2001-03-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 4852
[patent_no_of_claims] => 25
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0012/20020012749.pdf
[firstpage_image] =>[orig_patent_app_number] => 09821763
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/821763 | Method and apparatus for coating and/or treating substrates | Mar 29, 2001 | Abandoned |
Array
(
[id] => 6539854
[patent_doc_number] => 20020137312
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-26
[patent_title] => 'Emissivity-change-free pumping plate kit in a single wafer chamber'
[patent_app_type] => new
[patent_app_number] => 09/798424
[patent_app_country] => US
[patent_app_date] => 2001-03-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 2274
[patent_no_of_claims] => 14
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[pdf_file] => publications/A1/0137/20020137312.pdf
[firstpage_image] =>[orig_patent_app_number] => 09798424
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/798424 | Emissivity-change-free pumping plate kit in a single wafer chamber | Mar 1, 2001 | Issued |
Array
(
[id] => 5858666
[patent_doc_number] => 20020122885
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-05
[patent_title] => 'Methods, systems, and apparatus for uniform chemical-vapor depositions'
[patent_app_type] => new
[patent_app_number] => 09/797324
[patent_app_country] => US
[patent_app_date] => 2001-03-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3310
[patent_no_of_claims] => 62
[patent_no_of_ind_claims] => 15
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0122/20020122885.pdf
[firstpage_image] =>[orig_patent_app_number] => 09797324
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/797324 | Methods, systems, and apparatus for uniform chemical-vapor depositions | Feb 28, 2001 | Issued |
Array
(
[id] => 1492719
[patent_doc_number] => 06402849
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-06-11
[patent_title] => 'Process tube having slit type process gas injection portion and hole type waste gas exhaust portion, and apparatus for fabricating semiconductor device'
[patent_app_type] => B2
[patent_app_number] => 09/793314
[patent_app_country] => US
[patent_app_date] => 2001-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 8
[patent_no_of_words] => 4354
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/402/06402849.pdf
[firstpage_image] =>[orig_patent_app_number] => 09793314
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/793314 | Process tube having slit type process gas injection portion and hole type waste gas exhaust portion, and apparatus for fabricating semiconductor device | Feb 25, 2001 | Issued |
Array
(
[id] => 7062723
[patent_doc_number] => 20010042439
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-22
[patent_title] => 'Molecular contamination control system'
[patent_app_type] => new
[patent_app_number] => 09/790769
[patent_app_country] => US
[patent_app_date] => 2001-02-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 4219
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[pdf_file] => publications/A1/0042/20010042439.pdf
[firstpage_image] =>[orig_patent_app_number] => 09790769
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/790769 | Molecular contamination control system | Feb 20, 2001 | Issued |
Array
(
[id] => 1370048
[patent_doc_number] => 06539891
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-04-01
[patent_title] => 'Chemical deposition reactor and method of forming a thin film using the same'
[patent_app_type] => B1
[patent_app_number] => 09/763238
[patent_app_country] => US
[patent_app_date] => 2001-02-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => patents/06/539/06539891.pdf
[firstpage_image] =>[orig_patent_app_number] => 09763238
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/763238 | Chemical deposition reactor and method of forming a thin film using the same | Feb 13, 2001 | Issued |
Array
(
[id] => 6894814
[patent_doc_number] => 20010025604
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-04
[patent_title] => 'Substrate processing apparatus'
[patent_app_type] => new
[patent_app_number] => 09/779549
[patent_app_country] => US
[patent_app_date] => 2001-02-09
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0025/20010025604.pdf
[firstpage_image] =>[orig_patent_app_number] => 09779549
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/779549 | Substrate processing apparatus | Feb 8, 2001 | Abandoned |
Array
(
[id] => 1381604
[patent_doc_number] => 06544379
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[patent_issue_date] => 2003-04-08
[patent_title] => 'Method of holding substrate and substrate holding system'
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Array
(
[id] => 1472590
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[patent_issue_date] => 2002-05-14
[patent_title] => 'Processing chamber for atomic layer deposition processes'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/764035 | Processing chamber for atomic layer deposition processes | Jan 15, 2001 | Issued |
Array
(
[id] => 1527067
[patent_doc_number] => 06478877
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-11-12
[patent_title] => 'Gas collector for epitaxial reactors'
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[firstpage_image] =>[orig_patent_app_number] => 09757612
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/757612 | Gas collector for epitaxial reactors | Jan 10, 2001 | Issued |
Array
(
[id] => 6959264
[patent_doc_number] => 20010011524
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-08-09
[patent_title] => 'Linear aperture deposition apparatus and coating process'
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Array
(
[id] => 7062838
[patent_doc_number] => 20010042509
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-22
[patent_title] => 'Method and apparatus for controlling the thickness of a gate oxide in a semiconductor manufacturing process'
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[patent_app_number] => 09/756123
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[pdf_file] => publications/A1/0042/20010042509.pdf
[firstpage_image] =>[orig_patent_app_number] => 09756123
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/756123 | Method and apparatus for controlling the thickness of a gate oxide in a semiconductor manufacturing process | Jan 8, 2001 | Abandoned |
Array
(
[id] => 7039700
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Array
(
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Array
(
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[firstpage_image] =>[orig_patent_app_number] => 09749988
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/749988 | Machine for production of granular silicon | Dec 25, 2000 | Issued |
Array
(
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[patent_doc_number] => 07648610
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[patent_issue_date] => 2010-01-19
[patent_title] => 'Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate'
[patent_app_type] => utility
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[pdf_file] => patents/07/648/07648610.pdf
[firstpage_image] =>[orig_patent_app_number] => 10168451
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/168451 | Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate | Dec 20, 2000 | Issued |