
Daniel D. Chang
Examiner (ID: 9281, Phone: (571)272-1801 , Office: P/2844 )
| Most Active Art Unit | 2844 |
| Art Unit(s) | 2844, 0, 2819 |
| Total Applications | 2537 |
| Issued Applications | 2319 |
| Pending Applications | 103 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 511946
[patent_doc_number] => 07192505
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-03-20
[patent_title] => 'Wafer probe for measuring plasma and surface characteristics in plasma processing environments'
[patent_app_type] => utility
[patent_app_number] => 10/951162
[patent_app_country] => US
[patent_app_date] => 2004-09-27
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[pdf_file] => patents/07/192/07192505.pdf
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Array
(
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[patent_issue_date] => 2006-03-30
[patent_title] => 'Methods and apparatus for monitoring a process in a plasma processing system by measuring impedance'
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[patent_app_date] => 2004-09-27
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/951548 | Methods and apparatus for monitoring a process in a plasma processing system by measuring impedance | Sep 26, 2004 | Abandoned |
Array
(
[id] => 6914874
[patent_doc_number] => 20050092435
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[patent_kind] => A1
[patent_issue_date] => 2005-05-05
[patent_title] => 'Processing device, electrode, electrode plate, and processing method'
[patent_app_type] => utility
[patent_app_number] => 10/948338
[patent_app_country] => US
[patent_app_date] => 2004-09-24
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Array
(
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[patent_kind] => A1
[patent_issue_date] => 2005-03-10
[patent_title] => 'Method for monitoring plasma processing apparatus'
[patent_app_type] => utility
[patent_app_number] => 10/944796
[patent_app_country] => US
[patent_app_date] => 2004-09-21
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/944796 | Method for monitoring plasma processing apparatus | Sep 20, 2004 | Abandoned |
Array
(
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[patent_issue_date] => 2009-01-27
[patent_title] => 'Substrate processing apparatus and method, high speed rotary valve and cleaning method'
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[patent_app_number] => 10/946511
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Array
(
[id] => 6971914
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[patent_issue_date] => 2005-02-17
[patent_title] => 'Method for plasma etching performance enhancement'
[patent_app_type] => utility
[patent_app_number] => 10/946181
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[firstpage_image] =>[orig_patent_app_number] => 10946181
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/946181 | Method for plasma etching performance enhancement | Sep 19, 2004 | Abandoned |
Array
(
[id] => 6968964
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[patent_title] => 'Processing apparatus for object to be processed and processing method using same'
[patent_app_type] => utility
[patent_app_number] => 10/940779
[patent_app_country] => US
[patent_app_date] => 2004-09-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[firstpage_image] =>[orig_patent_app_number] => 10940779
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/940779 | Processing apparatus for object to be processed and processing method using same | Sep 14, 2004 | Abandoned |
Array
(
[id] => 306996
[patent_doc_number] => 07531061
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[patent_kind] => B2
[patent_issue_date] => 2009-05-12
[patent_title] => 'Gas temperature control for a plasma process'
[patent_app_type] => utility
[patent_app_number] => 10/940019
[patent_app_country] => US
[patent_app_date] => 2004-09-14
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[firstpage_image] =>[orig_patent_app_number] => 10940019
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/940019 | Gas temperature control for a plasma process | Sep 13, 2004 | Issued |
Array
(
[id] => 5729407
[patent_doc_number] => 20060254521
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[patent_kind] => A1
[patent_issue_date] => 2006-11-16
[patent_title] => 'Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening'
[patent_app_type] => utility
[patent_app_number] => 10/571161
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/571161 | Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening | Sep 7, 2004 | Abandoned |
Array
(
[id] => 5795907
[patent_doc_number] => 20060032584
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[patent_issue_date] => 2006-02-16
[patent_title] => 'Plasma processing apparatus capable of suppressing variation of processing characteristics'
[patent_app_type] => utility
[patent_app_number] => 10/934510
[patent_app_country] => US
[patent_app_date] => 2004-09-07
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/934510 | Plasma processing apparatus capable of suppressing variation of processing characteristics | Sep 6, 2004 | Abandoned |
Array
(
[id] => 6918171
[patent_doc_number] => 20050095732
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[patent_issue_date] => 2005-05-05
[patent_title] => 'Plasma processing apparatus and method and apparatus for measuring DC potential'
[patent_app_type] => utility
[patent_app_number] => 10/933422
[patent_app_country] => US
[patent_app_date] => 2004-09-03
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/933422 | Plasma processing apparatus and method and apparatus for measuring DC potential | Sep 2, 2004 | Abandoned |
Array
(
[id] => 5897830
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[patent_title] => 'Electrically floating diagnostic plasma probe with ion property sensors'
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Array
(
[id] => 5897519
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[patent_title] => 'Plasma processing apparatuses and methods'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/930993 | Plasma processing apparatuses and methods | Aug 29, 2004 | Abandoned |
Array
(
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Array
(
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[patent_title] => 'Yttria insulator ring for use inside a plasma chamber'
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Array
(
[id] => 6914685
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Array
(
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Array
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