Search

Daniel D. Chang

Examiner (ID: 9281, Phone: (571)272-1801 , Office: P/2844 )

Most Active Art Unit
2844
Art Unit(s)
2844, 0, 2819
Total Applications
2537
Issued Applications
2319
Pending Applications
103
Abandoned Applications
143

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 511946 [patent_doc_number] => 07192505 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-03-20 [patent_title] => 'Wafer probe for measuring plasma and surface characteristics in plasma processing environments' [patent_app_type] => utility [patent_app_number] => 10/951162 [patent_app_country] => US [patent_app_date] => 2004-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 16 [patent_no_of_words] => 8546 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/192/07192505.pdf [firstpage_image] =>[orig_patent_app_number] => 10951162 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/951162
Wafer probe for measuring plasma and surface characteristics in plasma processing environments Sep 26, 2004 Issued
Array ( [id] => 5634658 [patent_doc_number] => 20060065631 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-30 [patent_title] => 'Methods and apparatus for monitoring a process in a plasma processing system by measuring impedance' [patent_app_type] => utility [patent_app_number] => 10/951548 [patent_app_country] => US [patent_app_date] => 2004-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 4910 [patent_no_of_claims] => 44 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0065/20060065631.pdf [firstpage_image] =>[orig_patent_app_number] => 10951548 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/951548
Methods and apparatus for monitoring a process in a plasma processing system by measuring impedance Sep 26, 2004 Abandoned
Array ( [id] => 6914874 [patent_doc_number] => 20050092435 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-05-05 [patent_title] => 'Processing device, electrode, electrode plate, and processing method' [patent_app_type] => utility [patent_app_number] => 10/948338 [patent_app_country] => US [patent_app_date] => 2004-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 5418 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0092/20050092435.pdf [firstpage_image] =>[orig_patent_app_number] => 10948338 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/948338
Processing device, electrode, electrode plate, and processing method Sep 23, 2004 Abandoned
Array ( [id] => 7195960 [patent_doc_number] => 20050051270 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-10 [patent_title] => 'Method for monitoring plasma processing apparatus' [patent_app_type] => utility [patent_app_number] => 10/944796 [patent_app_country] => US [patent_app_date] => 2004-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4487 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0051/20050051270.pdf [firstpage_image] =>[orig_patent_app_number] => 10944796 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/944796
Method for monitoring plasma processing apparatus Sep 20, 2004 Abandoned
Array ( [id] => 363065 [patent_doc_number] => 07481902 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-01-27 [patent_title] => 'Substrate processing apparatus and method, high speed rotary valve and cleaning method' [patent_app_type] => utility [patent_app_number] => 10/946511 [patent_app_country] => US [patent_app_date] => 2004-09-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 50 [patent_figures_cnt] => 80 [patent_no_of_words] => 24778 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 266 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/481/07481902.pdf [firstpage_image] =>[orig_patent_app_number] => 10946511 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/946511
Substrate processing apparatus and method, high speed rotary valve and cleaning method Sep 19, 2004 Issued
Array ( [id] => 6971914 [patent_doc_number] => 20050037624 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-02-17 [patent_title] => 'Method for plasma etching performance enhancement' [patent_app_type] => utility [patent_app_number] => 10/946181 [patent_app_country] => US [patent_app_date] => 2004-09-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 7948 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0037/20050037624.pdf [firstpage_image] =>[orig_patent_app_number] => 10946181 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/946181
Method for plasma etching performance enhancement Sep 19, 2004 Abandoned
Array ( [id] => 6968964 [patent_doc_number] => 20050034674 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-02-17 [patent_title] => 'Processing apparatus for object to be processed and processing method using same' [patent_app_type] => utility [patent_app_number] => 10/940779 [patent_app_country] => US [patent_app_date] => 2004-09-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 6821 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0034/20050034674.pdf [firstpage_image] =>[orig_patent_app_number] => 10940779 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/940779
Processing apparatus for object to be processed and processing method using same Sep 14, 2004 Abandoned
Array ( [id] => 306996 [patent_doc_number] => 07531061 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-05-12 [patent_title] => 'Gas temperature control for a plasma process' [patent_app_type] => utility [patent_app_number] => 10/940019 [patent_app_country] => US [patent_app_date] => 2004-09-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5857 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 292 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/531/07531061.pdf [firstpage_image] =>[orig_patent_app_number] => 10940019 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/940019
Gas temperature control for a plasma process Sep 13, 2004 Issued
Array ( [id] => 5729407 [patent_doc_number] => 20060254521 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-11-16 [patent_title] => 'Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening' [patent_app_type] => utility [patent_app_number] => 10/571161 [patent_app_country] => US [patent_app_date] => 2004-09-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3250 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0254/20060254521.pdf [firstpage_image] =>[orig_patent_app_number] => 10571161 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/571161
Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening Sep 7, 2004 Abandoned
Array ( [id] => 5795907 [patent_doc_number] => 20060032584 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-02-16 [patent_title] => 'Plasma processing apparatus capable of suppressing variation of processing characteristics' [patent_app_type] => utility [patent_app_number] => 10/934510 [patent_app_country] => US [patent_app_date] => 2004-09-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 6615 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0032/20060032584.pdf [firstpage_image] =>[orig_patent_app_number] => 10934510 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/934510
Plasma processing apparatus capable of suppressing variation of processing characteristics Sep 6, 2004 Abandoned
Array ( [id] => 6918171 [patent_doc_number] => 20050095732 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-05-05 [patent_title] => 'Plasma processing apparatus and method and apparatus for measuring DC potential' [patent_app_type] => utility [patent_app_number] => 10/933422 [patent_app_country] => US [patent_app_date] => 2004-09-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 9278 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0095/20050095732.pdf [firstpage_image] =>[orig_patent_app_number] => 10933422 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/933422
Plasma processing apparatus and method and apparatus for measuring DC potential Sep 2, 2004 Abandoned
Array ( [id] => 5897830 [patent_doc_number] => 20060043063 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-02 [patent_title] => 'Electrically floating diagnostic plasma probe with ion property sensors' [patent_app_type] => utility [patent_app_number] => 10/933167 [patent_app_country] => US [patent_app_date] => 2004-09-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 4033 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0043/20060043063.pdf [firstpage_image] =>[orig_patent_app_number] => 10933167 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/933167
Electrically floating diagnostic plasma probe with ion property sensors Sep 1, 2004 Abandoned
Array ( [id] => 5897519 [patent_doc_number] => 20060042752 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-02 [patent_title] => 'Plasma processing apparatuses and methods' [patent_app_type] => utility [patent_app_number] => 10/930993 [patent_app_country] => US [patent_app_date] => 2004-08-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 6852 [patent_no_of_claims] => 87 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0042/20060042752.pdf [firstpage_image] =>[orig_patent_app_number] => 10930993 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/930993
Plasma processing apparatuses and methods Aug 29, 2004 Abandoned
Array ( [id] => 5897524 [patent_doc_number] => 20060042757 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-02 [patent_title] => 'Wafer processing apparatus capable of controlling wafer temperature' [patent_app_type] => utility [patent_app_number] => 10/927095 [patent_app_country] => US [patent_app_date] => 2004-08-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 7871 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0042/20060042757.pdf [firstpage_image] =>[orig_patent_app_number] => 10927095 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/927095
Wafer processing apparatus capable of controlling wafer temperature Aug 26, 2004 Abandoned
Array ( [id] => 5897834 [patent_doc_number] => 20060043067 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-02 [patent_title] => 'Yttria insulator ring for use inside a plasma chamber' [patent_app_type] => utility [patent_app_number] => 10/925923 [patent_app_country] => US [patent_app_date] => 2004-08-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5110 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0043/20060043067.pdf [firstpage_image] =>[orig_patent_app_number] => 10925923 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/925923
Yttria insulator ring for use inside a plasma chamber Aug 25, 2004 Abandoned
Array ( [id] => 6914685 [patent_doc_number] => 20050092246 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-05-05 [patent_title] => 'Device for depositing thin layers with a wireless detection of process parameters' [patent_app_type] => utility [patent_app_number] => 10/922660 [patent_app_country] => US [patent_app_date] => 2004-08-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1714 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0092/20050092246.pdf [firstpage_image] =>[orig_patent_app_number] => 10922660 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/922660
Device for depositing thin layers with a wireless detection of process parameters Aug 19, 2004 Abandoned
Array ( [id] => 214977 [patent_doc_number] => 07618494 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-11-17 [patent_title] => 'Substrate holding structure and substrate processing device' [patent_app_type] => utility [patent_app_number] => 10/568683 [patent_app_country] => US [patent_app_date] => 2004-08-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 9 [patent_no_of_words] => 4749 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 223 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/618/07618494.pdf [firstpage_image] =>[orig_patent_app_number] => 10568683 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/568683
Substrate holding structure and substrate processing device Aug 17, 2004 Issued
Array ( [id] => 12414 [patent_doc_number] => 07806983 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-10-05 [patent_title] => 'Substrate temperature control in an ALD reactor' [patent_app_type] => utility [patent_app_number] => 10/921604 [patent_app_country] => US [patent_app_date] => 2004-08-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 40 [patent_figures_cnt] => 60 [patent_no_of_words] => 20036 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 275 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/806/07806983.pdf [firstpage_image] =>[orig_patent_app_number] => 10921604 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/921604
Substrate temperature control in an ALD reactor Aug 17, 2004 Issued
Array ( [id] => 7119782 [patent_doc_number] => 20050011611 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-20 [patent_title] => 'Wafer probe for measuring plasma and surface characteristics in plasma processing environments' [patent_app_type] => utility [patent_app_number] => 10/920138 [patent_app_country] => US [patent_app_date] => 2004-08-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 10391 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0011/20050011611.pdf [firstpage_image] =>[orig_patent_app_number] => 10920138 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/920138
Wafer probe for measuring plasma and surface characteristics in plasma processing environments Aug 16, 2004 Abandoned
Array ( [id] => 7119522 [patent_doc_number] => 20050011351 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-20 [patent_title] => 'Pressure control apparatus and method of establishing a desired level or pressure within at least one processing chamber' [patent_app_type] => utility [patent_app_number] => 10/919252 [patent_app_country] => US [patent_app_date] => 2004-08-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 8561 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0011/20050011351.pdf [firstpage_image] =>[orig_patent_app_number] => 10919252 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/919252
Pressure control apparatus and method of establishing a desired level or pressure within at least one processing chamber Aug 16, 2004 Abandoned
Menu