
Daniel D. Chang
Examiner (ID: 9281, Phone: (571)272-1801 , Office: P/2844 )
| Most Active Art Unit | 2844 |
| Art Unit(s) | 2844, 0, 2819 |
| Total Applications | 2537 |
| Issued Applications | 2319 |
| Pending Applications | 103 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6928421
[patent_doc_number] => 20050279453
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-12-22
[patent_title] => 'System and methods for surface cleaning'
[patent_app_type] => utility
[patent_app_number] => 10/870646
[patent_app_country] => US
[patent_app_date] => 2004-06-17
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[pdf_file] => publications/A1/0279/20050279453.pdf
[firstpage_image] =>[orig_patent_app_number] => 10870646
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/870646 | System and methods for surface cleaning | Jun 16, 2004 | Abandoned |
Array
(
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[patent_doc_number] => 20050016568
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[patent_kind] => A1
[patent_issue_date] => 2005-01-27
[patent_title] => 'Apparatus and method for cleaning of semiconductor device manufacturing equipment'
[patent_app_type] => utility
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[patent_app_date] => 2004-06-16
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/870309 | Apparatus and method for cleaning of semiconductor device manufacturing equipment | Jun 15, 2004 | Abandoned |
Array
(
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[patent_kind] => B2
[patent_issue_date] => 2012-10-16
[patent_title] => 'High frequency power source and its control method, and plasma processing apparatus'
[patent_app_type] => utility
[patent_app_number] => 10/864538
[patent_app_country] => US
[patent_app_date] => 2004-06-10
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/864538 | High frequency power source and its control method, and plasma processing apparatus | Jun 9, 2004 | Issued |
Array
(
[id] => 7359824
[patent_doc_number] => 20040216678
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-04
[patent_title] => 'Wafer Holder for Semiconductor Manufacturing Equipment and Semiconductor Manufacturing Equipment in Which It Is Installed'
[patent_app_type] => new
[patent_app_number] => 10/709957
[patent_app_country] => US
[patent_app_date] => 2004-06-09
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/709957 | Wafer Holder for Semiconductor Manufacturing Equipment and Semiconductor Manufacturing Equipment in Which It Is Installed | Jun 8, 2004 | Abandoned |
Array
(
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[patent_issue_date] => 2005-10-27
[patent_title] => 'Method and arrangement for the regulation of the layer thickness of a coating material on a web moved in its longitudinal direction'
[patent_app_type] => utility
[patent_app_number] => 10/855984
[patent_app_country] => US
[patent_app_date] => 2004-05-26
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/855984 | Method and arrangement for the regulation of the layer thickness of a coating material on a web moved in its longitudinal direction | May 25, 2004 | Abandoned |
Array
(
[id] => 386280
[patent_doc_number] => 07303648
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[patent_kind] => B2
[patent_issue_date] => 2007-12-04
[patent_title] => 'Via etch process'
[patent_app_type] => utility
[patent_app_number] => 10/854541
[patent_app_country] => US
[patent_app_date] => 2004-05-25
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[firstpage_image] =>[orig_patent_app_number] => 10854541
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/854541 | Via etch process | May 24, 2004 | Issued |
Array
(
[id] => 7058069
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[patent_country] => US
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[patent_issue_date] => 2005-01-06
[patent_title] => 'Method and apparatus for vaporizing and delivering reactant'
[patent_app_type] => utility
[patent_app_number] => 10/846206
[patent_app_country] => US
[patent_app_date] => 2004-05-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[firstpage_image] =>[orig_patent_app_number] => 10846206
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/846206 | Method and apparatus for vaporizing and delivering reactant | May 13, 2004 | Abandoned |
Array
(
[id] => 5222186
[patent_doc_number] => 20070251452
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-01
[patent_title] => 'Processing Apparatus Using Source Gas and Reactive Gas'
[patent_app_type] => utility
[patent_app_number] => 10/555813
[patent_app_country] => US
[patent_app_date] => 2004-05-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 11381
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[pdf_file] => publications/A1/0251/20070251452.pdf
[firstpage_image] =>[orig_patent_app_number] => 10555813
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/555813 | Processing Apparatus Using Source Gas and Reactive Gas | May 12, 2004 | Abandoned |
Array
(
[id] => 7058181
[patent_doc_number] => 20050000540
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-06
[patent_title] => ' In Situ module for particle removal from solid-state surfaces'
[patent_app_type] => utility
[patent_app_number] => 10/845377
[patent_app_country] => US
[patent_app_date] => 2004-05-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/845377 | In situ module for particle removal from solid-state surfaces | May 12, 2004 | Issued |
Array
(
[id] => 7093315
[patent_doc_number] => 20050126482
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-06-16
[patent_title] => 'Forming thin film on semiconductor wafer'
[patent_app_type] => utility
[patent_app_number] => 10/839710
[patent_app_country] => US
[patent_app_date] => 2004-05-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[pdf_file] => publications/A1/0126/20050126482.pdf
[firstpage_image] =>[orig_patent_app_number] => 10839710
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/839710 | Forming thin film on semiconductor wafer | May 5, 2004 | Abandoned |
Array
(
[id] => 7398948
[patent_doc_number] => 20040261713
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-30
[patent_title] => 'Monitoring system for plasma deposition facility'
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[patent_app_date] => 2004-05-03
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[firstpage_image] =>[orig_patent_app_number] => 10836345
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/836345 | Monitoring system for plasma deposition facility | May 2, 2004 | Abandoned |
Array
(
[id] => 7066083
[patent_doc_number] => 20050241766
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[patent_issue_date] => 2005-11-03
[patent_title] => 'Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/835456 | Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing | Apr 29, 2004 | Issued |
Array
(
[id] => 7058082
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[patent_title] => 'Process and device for depositing in particular crystalline layers on in particular crystalline substrates'
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Array
(
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[patent_title] => 'Arrangement and method for detecting sidewall flaking in a plasma chamber'
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/832329 | High-pressure process | Apr 26, 2004 | Abandoned |
Array
(
[id] => 5750029
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[patent_issue_date] => 2006-10-05
[patent_title] => 'Device for applying semiconductor treatment to treatment subject substrate'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/553843 | Apparatus for performing semiconductor processing on target substrate | Apr 19, 2004 | Issued |
Array
(
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Array
(
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Array
(
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Array
(
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[patent_title] => 'Inductively coupled plasma chamber attachable to a processing chamber for analysis of process gases'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/814985 | Inductively coupled plasma chamber attachable to a processing chamber for analysis of process gases | Mar 30, 2004 | Abandoned |