
Daniel D. Chang
Examiner (ID: 9281, Phone: (571)272-1801 , Office: P/2844 )
| Most Active Art Unit | 2844 |
| Art Unit(s) | 2844, 0, 2819 |
| Total Applications | 2537 |
| Issued Applications | 2319 |
| Pending Applications | 103 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5839688
[patent_doc_number] => 20020130061
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-19
[patent_title] => 'Apparatus and method of making a slip free wafer boat'
[patent_app_type] => new
[patent_app_number] => 09/884720
[patent_app_country] => US
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[pdf_file] => publications/A1/0130/20020130061.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/884720 | Apparatus and method of making a slip free wafer boat | Jun 18, 2001 | Abandoned |
Array
(
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[patent_doc_number] => 20010054389
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[patent_issue_date] => 2001-12-27
[patent_title] => 'Electro-static chucking mechanism and surface processing apparatus'
[patent_app_type] => new
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[patent_app_date] => 2001-06-14
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Array
(
[id] => 6252709
[patent_doc_number] => 20020185230
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[patent_kind] => A1
[patent_issue_date] => 2002-12-12
[patent_title] => 'Article holders that use gas vortices to hold an article in a desired position'
[patent_app_type] => new
[patent_app_number] => 09/877366
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Array
(
[id] => 7065007
[patent_doc_number] => 20010044217
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[patent_kind] => A1
[patent_issue_date] => 2001-11-22
[patent_title] => 'Plasma deposition of spin chucks to reduce contamination of silicon wafers'
[patent_app_type] => new
[patent_app_number] => 09/874073
[patent_app_country] => US
[patent_app_date] => 2001-06-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/874073 | Plasma deposition of spin chucks to reduce contamination of Silicon wafers | Jun 3, 2001 | Issued |
Array
(
[id] => 1274918
[patent_doc_number] => 06645344
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[patent_issue_date] => 2003-11-11
[patent_title] => 'Universal backplane assembly and methods'
[patent_app_type] => B2
[patent_app_number] => 09/861322
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/861322 | Universal backplane assembly and methods | May 17, 2001 | Issued |
Array
(
[id] => 1294181
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[patent_title] => 'Continuous processing chamber'
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Array
(
[id] => 1259653
[patent_doc_number] => 06663714
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[patent_issue_date] => 2003-12-16
[patent_title] => 'CVD apparatus'
[patent_app_type] => B2
[patent_app_number] => 09/858239
[patent_app_country] => US
[patent_app_date] => 2001-05-17
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/663/06663714.pdf
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Array
(
[id] => 6451620
[patent_doc_number] => 20020020189
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-02-21
[patent_title] => 'Temperature adjustment apparatus'
[patent_app_type] => new
[patent_app_number] => 09/858859
[patent_app_country] => US
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[pdf_file] => publications/A1/0020/20020020189.pdf
[firstpage_image] =>[orig_patent_app_number] => 09858859
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/858859 | Temperature adjustment apparatus | May 15, 2001 | Issued |
Array
(
[id] => 6997842
[patent_doc_number] => 20010052321
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[patent_issue_date] => 2001-12-20
[patent_title] => 'Single-substrate-processing apparatus for semiconductor'
[patent_app_type] => new
[patent_app_number] => 09/855493
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/855493 | Single-substrate-processing apparatus for semiconductor process | May 15, 2001 | Issued |
Array
(
[id] => 6453592
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[patent_title] => 'Processing apparatus'
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[firstpage_image] =>[orig_patent_app_number] => 09851330
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/851330 | Processing apparatus | May 8, 2001 | Abandoned |
Array
(
[id] => 1244730
[patent_doc_number] => 06676759
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[patent_issue_date] => 2004-01-13
[patent_title] => 'Wafer support device in semiconductor manufacturing device'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/830613 | Wafer support device in semiconductor manufacturing device | Apr 29, 2001 | Issued |
Array
(
[id] => 1198901
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[patent_issue_date] => 2004-04-20
[patent_title] => 'Worktable device and plasma processing apparatus for semiconductor process'
[patent_app_type] => B2
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Array
(
[id] => 6886625
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[patent_title] => 'Pre-heat step (or chamber) implemented in pr dry ash machines to effectively eliminate pr extrusion (bubble) after alloy'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/838748 | Pre-heat step (or chamber) implemented in pr dry ash machines to effectively eliminate pr extrusion (bubble) after alloy | Apr 19, 2001 | Abandoned |
Array
(
[id] => 7090280
[patent_doc_number] => 20010032588
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[patent_issue_date] => 2001-10-25
[patent_title] => 'Semiconductor film deposition apparatus'
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| 09/807902 | Wafer support in semiconductor manufacturing system | Apr 18, 2001 | Abandoned |
Array
(
[id] => 6168829
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Array
(
[id] => 1020531
[patent_doc_number] => 06887316
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[patent_kind] => B2
[patent_issue_date] => 2005-05-03
[patent_title] => 'Ceramic heater'
[patent_app_type] => utility
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Array
(
[id] => 6152811
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[patent_title] => 'Apparatus and method for accelerating process stability of high temperature vacuum processes after chamber cleaning'
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Array
(
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Array
(
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