
Daniel St Cyr
Examiner (ID: 18316, Phone: (571)272-2407 , Office: P/2876 )
| Most Active Art Unit | 2876 |
| Art Unit(s) | 2876 |
| Total Applications | 2425 |
| Issued Applications | 1855 |
| Pending Applications | 188 |
| Abandoned Applications | 407 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4690930
[patent_doc_number] => 20080083700
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-10
[patent_title] => 'Method and Apparatus for Maximizing Cooling for Wafer Processing'
[patent_app_type] => utility
[patent_app_number] => 11/562081
[patent_app_country] => US
[patent_app_date] => 2006-11-21
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[pdf_file] => publications/A1/0083/20080083700.pdf
[firstpage_image] =>[orig_patent_app_number] => 11562081
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/562081 | Method and Apparatus for Maximizing Cooling for Wafer Processing | Nov 20, 2006 | Abandoned |
Array
(
[id] => 565754
[patent_doc_number] => 07465672
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[patent_kind] => B2
[patent_issue_date] => 2008-12-16
[patent_title] => 'Method of forming etching mask'
[patent_app_type] => utility
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[firstpage_image] =>[orig_patent_app_number] => 11556127
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/556127 | Method of forming etching mask | Nov 1, 2006 | Issued |
Array
(
[id] => 5210592
[patent_doc_number] => 20070249176
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[patent_kind] => A1
[patent_issue_date] => 2007-10-25
[patent_title] => 'ACTIVE DEVICE ARRAY SUBSTRATE AND FABRICATING METHOD THEREOF'
[patent_app_type] => utility
[patent_app_number] => 11/552988
[patent_app_country] => US
[patent_app_date] => 2006-10-26
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[firstpage_image] =>[orig_patent_app_number] => 11552988
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/552988 | Fabricating method of active device array substrate | Oct 25, 2006 | Issued |
Array
(
[id] => 4893548
[patent_doc_number] => 20080102646
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-05-01
[patent_title] => 'INTEGRATED METHOD AND APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES'
[patent_app_type] => utility
[patent_app_number] => 11/553132
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/553132 | Integrated method and apparatus for efficient removal of halogen residues from etched substrates | Oct 25, 2006 | Issued |
Array
(
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[patent_issue_date] => 2007-12-06
[patent_title] => 'Method for fabricating semiconductor device having capacitor'
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Array
(
[id] => 5253473
[patent_doc_number] => 20070134929
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[patent_issue_date] => 2007-06-14
[patent_title] => 'Etching method and etching apparatus'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/580945 | Etching method and etching apparatus | Oct 15, 2006 | Abandoned |
Array
(
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[patent_title] => 'Dry etching method, fabrication method for semiconductor device, and dry etching apparatus'
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Array
(
[id] => 386628
[patent_doc_number] => 07303997
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[patent_issue_date] => 2007-12-04
[patent_title] => 'Regionally thinned microstructures for microbolometers'
[patent_app_type] => utility
[patent_app_number] => 11/544591
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Array
(
[id] => 334257
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[patent_issue_date] => 2009-03-24
[patent_title] => 'Polishing slurry, method of treating surface of GaxIn1-xAsyP1-y crystal and GaxIn1-xAsyP1-y crystal substrate'
[patent_app_type] => utility
[patent_app_number] => 11/527682
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/527682 | Polishing slurry, method of treating surface of GaxIn1-xAsyP1-y crystal and GaxIn1-xAsyP1-y crystal substrate | Sep 26, 2006 | Issued |
Array
(
[id] => 334260
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[patent_issue_date] => 2009-03-24
[patent_title] => 'Plasma etching system and method'
[patent_app_type] => utility
[patent_app_number] => 11/535324
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 11535324
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/535324 | Plasma etching system and method | Sep 25, 2006 | Issued |
Array
(
[id] => 348815
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[patent_title] => 'Method for fabricating semiconductor device and polishing method'
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Array
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[patent_title] => 'Selective etch chemistries for forming high aspect ratio features and associated structures'
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Array
(
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[patent_title] => 'Method of operating a plasma reactor chamber with respect to two plasma parameters selected from a group comprising ion density, wafer voltage, etch rate and wafer current, by controlling chamber parameters of source power and bias power'
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Array
(
[id] => 4727457
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[patent_issue_date] => 2008-08-28
[patent_title] => 'Pulsed Etching Cooling'
[patent_app_type] => utility
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Array
(
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Array
(
[id] => 5213319
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[patent_title] => 'Method and apparatus for manufacturing a semiconductor device, control program and computer-readable storage medium'
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Array
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Array
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Array
(
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[patent_title] => 'Method and device for feeding a chemical-mechanical polishing machine with a polishing product'
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