
Daniel St Cyr
Examiner (ID: 18316, Phone: (571)272-2407 , Office: P/2876 )
| Most Active Art Unit | 2876 |
| Art Unit(s) | 2876 |
| Total Applications | 2425 |
| Issued Applications | 1855 |
| Pending Applications | 188 |
| Abandoned Applications | 407 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 369847
[patent_doc_number] => 07476620
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-01-13
[patent_title] => 'Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers'
[patent_app_type] => utility
[patent_app_number] => 11/387934
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/387934 | Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers | Mar 23, 2006 | Issued |
Array
(
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[patent_doc_number] => 07524768
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[patent_issue_date] => 2009-04-28
[patent_title] => 'Method using monolayer etch masks in combination with printed masks'
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Array
(
[id] => 4977464
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[patent_kind] => A1
[patent_issue_date] => 2007-09-20
[patent_title] => 'Method for removing polymer from wafer and method for removing polymer in interconnect process'
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Array
(
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[patent_issue_date] => 2009-01-27
[patent_title] => 'Plasma treatment method and method of manufacturing semiconductor device'
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Array
(
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[patent_title] => 'Selective surface exposure, cleans and conditioning of the germanium film in a Ge photodetector'
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Array
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[patent_title] => 'Method of forming pattern using fine pitch hard mask'
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Array
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[patent_title] => 'Method of manufacturing semiconductor device having planarized interlayer insulating film'
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Array
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[patent_title] => 'Semiconductor device fabrication method'
[patent_app_type] => utility
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Array
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Array
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[patent_title] => 'Process for producing sublithographic structures'
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Array
(
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[patent_title] => 'Method of forming micro pattern in semiconductor device'
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Array
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Array
(
[id] => 5616874
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Array
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Array
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Array
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Array
(
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Array
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