
Dmitry Suhol
Supervisory Patent Examiner (ID: 5760, Phone: (571)272-4430 , Office: P/3716 )
| Most Active Art Unit | 3725 |
| Art Unit(s) | 4137, 3712, 3715, 3725, 3714, 3716 |
| Total Applications | 805 |
| Issued Applications | 342 |
| Pending Applications | 147 |
| Abandoned Applications | 318 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 3946625
[patent_doc_number] => 05935335
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-10
[patent_title] => 'Film-forming apparatus and film-forming method'
[patent_app_type] => 1
[patent_app_number] => 8/815053
[patent_app_country] => US
[patent_app_date] => 1997-03-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 9354
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 202
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/935/05935335.pdf
[firstpage_image] =>[orig_patent_app_number] => 815053
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/815053 | Film-forming apparatus and film-forming method | Mar 10, 1997 | Issued |
Array
(
[id] => 3742507
[patent_doc_number] => 05801066
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-01
[patent_title] => 'Method and apparatus for measuring a change in the thickness of polishing pads used in chemical-mechanical planarization of semiconductor wafers'
[patent_app_type] => 1
[patent_app_number] => 8/812177
[patent_app_country] => US
[patent_app_date] => 1997-03-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 3569
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 133
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/801/05801066.pdf
[firstpage_image] =>[orig_patent_app_number] => 812177
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/812177 | Method and apparatus for measuring a change in the thickness of polishing pads used in chemical-mechanical planarization of semiconductor wafers | Mar 5, 1997 | Issued |
Array
(
[id] => 4212778
[patent_doc_number] => 06039834
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-21
[patent_title] => 'Apparatus and methods for upgraded substrate processing system with microwave plasma source'
[patent_app_type] => 1
[patent_app_number] => 8/811627
[patent_app_country] => US
[patent_app_date] => 1997-03-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 17
[patent_no_of_words] => 16417
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 229
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/039/06039834.pdf
[firstpage_image] =>[orig_patent_app_number] => 811627
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/811627 | Apparatus and methods for upgraded substrate processing system with microwave plasma source | Mar 4, 1997 | Issued |
Array
(
[id] => 4186278
[patent_doc_number] => 06129806
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-10
[patent_title] => 'Plasma processing apparatus and plasma processing method'
[patent_app_type] => 1
[patent_app_number] => 8/808805
[patent_app_country] => US
[patent_app_date] => 1997-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 31
[patent_figures_cnt] => 45
[patent_no_of_words] => 21734
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 192
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/129/06129806.pdf
[firstpage_image] =>[orig_patent_app_number] => 808805
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/808805 | Plasma processing apparatus and plasma processing method | Feb 27, 1997 | Issued |
Array
(
[id] => 4020300
[patent_doc_number] => 05993596
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-30
[patent_title] => 'Plasma-etching electrode plate'
[patent_app_type] => 1
[patent_app_number] => 8/799957
[patent_app_country] => US
[patent_app_date] => 1997-02-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 4679
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 38
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/993/05993596.pdf
[firstpage_image] =>[orig_patent_app_number] => 799957
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/799957 | Plasma-etching electrode plate | Feb 13, 1997 | Issued |
Array
(
[id] => 3933903
[patent_doc_number] => 05976310
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-02
[patent_title] => 'Plasma etch system'
[patent_app_type] => 1
[patent_app_number] => 8/798672
[patent_app_country] => US
[patent_app_date] => 1997-02-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 3373
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 184
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/976/05976310.pdf
[firstpage_image] =>[orig_patent_app_number] => 798672
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/798672 | Plasma etch system | Feb 10, 1997 | Issued |
Array
(
[id] => 3870368
[patent_doc_number] => 05804027
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-08
[patent_title] => 'Apparatus for generating and utilizing magnetically neutral line discharge type plasma'
[patent_app_type] => 1
[patent_app_number] => 8/796568
[patent_app_country] => US
[patent_app_date] => 1997-02-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 5583
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/804/05804027.pdf
[firstpage_image] =>[orig_patent_app_number] => 796568
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/796568 | Apparatus for generating and utilizing magnetically neutral line discharge type plasma | Feb 5, 1997 | Issued |
Array
(
[id] => 3973139
[patent_doc_number] => 05904800
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-05-18
[patent_title] => 'Semiconductor wafer processing chamber for reducing particles deposited onto the semiconductor wafer'
[patent_app_type] => 1
[patent_app_number] => 8/794706
[patent_app_country] => US
[patent_app_date] => 1997-02-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 4278
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 108
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/904/05904800.pdf
[firstpage_image] =>[orig_patent_app_number] => 794706
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/794706 | Semiconductor wafer processing chamber for reducing particles deposited onto the semiconductor wafer | Feb 2, 1997 | Issued |
Array
(
[id] => 3784344
[patent_doc_number] => 05779849
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-14
[patent_title] => 'Plasma reactors and method of cleaning a plasma reactor'
[patent_app_type] => 1
[patent_app_number] => 8/791412
[patent_app_country] => US
[patent_app_date] => 1997-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 2376
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/779/05779849.pdf
[firstpage_image] =>[orig_patent_app_number] => 791412
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/791412 | Plasma reactors and method of cleaning a plasma reactor | Jan 29, 1997 | Issued |
Array
(
[id] => 3925768
[patent_doc_number] => 05938883
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-17
[patent_title] => 'Plasma processing apparatus'
[patent_app_type] => 1
[patent_app_number] => 8/788636
[patent_app_country] => US
[patent_app_date] => 1997-01-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 30
[patent_no_of_words] => 11516
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 127
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/938/05938883.pdf
[firstpage_image] =>[orig_patent_app_number] => 788636
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/788636 | Plasma processing apparatus | Jan 26, 1997 | Issued |
Array
(
[id] => 4026190
[patent_doc_number] => 05855682
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-05
[patent_title] => 'Plasma thin-film forming apparatus'
[patent_app_type] => 1
[patent_app_number] => 8/789552
[patent_app_country] => US
[patent_app_date] => 1997-01-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2777
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 230
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/855/05855682.pdf
[firstpage_image] =>[orig_patent_app_number] => 789552
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/789552 | Plasma thin-film forming apparatus | Jan 26, 1997 | Issued |
| 08/727484 | MULTI-FREQUENCY INDUCTIVE METHOD AND APPARATUS FOR THE PROCESSING OF MATERIAL | Jan 15, 1997 | Abandoned |
Array
(
[id] => 3913764
[patent_doc_number] => 05988103
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-23
[patent_title] => 'Apparatus for plasma source ion implantation and deposition for cylindrical surfaces'
[patent_app_type] => 1
[patent_app_number] => 8/778955
[patent_app_country] => US
[patent_app_date] => 1997-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 7117
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 172
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/988/05988103.pdf
[firstpage_image] =>[orig_patent_app_number] => 778955
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/778955 | Apparatus for plasma source ion implantation and deposition for cylindrical surfaces | Jan 5, 1997 | Issued |
Array
(
[id] => 4001648
[patent_doc_number] => 05992346
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-30
[patent_title] => 'Apparatus for the surface treatment of workpieces'
[patent_app_type] => 1
[patent_app_number] => 8/778569
[patent_app_country] => US
[patent_app_date] => 1997-01-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 2965
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 145
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/992/05992346.pdf
[firstpage_image] =>[orig_patent_app_number] => 778569
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/778569 | Apparatus for the surface treatment of workpieces | Jan 2, 1997 | Issued |
Array
(
[id] => 4397934
[patent_doc_number] => 06270617
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-07
[patent_title] => 'RF plasma reactor with hybrid conductor and multi-radius dome ceiling'
[patent_app_type] => 1
[patent_app_number] => 8/778051
[patent_app_country] => US
[patent_app_date] => 1997-01-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
[patent_figures_cnt] => 38
[patent_no_of_words] => 15089
[patent_no_of_claims] => 49
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 199
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/270/06270617.pdf
[firstpage_image] =>[orig_patent_app_number] => 778051
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/778051 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Jan 1, 1997 | Issued |
Array
(
[id] => 3965304
[patent_doc_number] => 05885901
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-23
[patent_title] => 'Rinsing solution after resist stripping process and method for manufacturing semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 8/773828
[patent_app_country] => US
[patent_app_date] => 1996-12-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 4
[patent_no_of_words] => 1980
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 175
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/885/05885901.pdf
[firstpage_image] =>[orig_patent_app_number] => 773828
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/773828 | Rinsing solution after resist stripping process and method for manufacturing semiconductor device | Dec 26, 1996 | Issued |
Array
(
[id] => 3855088
[patent_doc_number] => 05795429
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-18
[patent_title] => 'Plasma processing apparatus'
[patent_app_type] => 1
[patent_app_number] => 8/774685
[patent_app_country] => US
[patent_app_date] => 1996-12-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 30
[patent_no_of_words] => 11515
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 147
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/795/05795429.pdf
[firstpage_image] =>[orig_patent_app_number] => 774685
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/774685 | Plasma processing apparatus | Dec 25, 1996 | Issued |
Array
(
[id] => 3984015
[patent_doc_number] => 05891312
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-04-06
[patent_title] => 'Enhanced vacuum arc vapor deposition electrode'
[patent_app_type] => 1
[patent_app_number] => 8/772541
[patent_app_country] => US
[patent_app_date] => 1996-12-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 1575
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 212
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/891/05891312.pdf
[firstpage_image] =>[orig_patent_app_number] => 772541
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/772541 | Enhanced vacuum arc vapor deposition electrode | Dec 23, 1996 | Issued |
Array
(
[id] => 4124303
[patent_doc_number] => 06033585
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-07
[patent_title] => 'Method and apparatus for preventing lightup of gas distribution holes'
[patent_app_type] => 1
[patent_app_number] => 8/777736
[patent_app_country] => US
[patent_app_date] => 1996-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 4996
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 202
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/033/06033585.pdf
[firstpage_image] =>[orig_patent_app_number] => 777736
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/777736 | Method and apparatus for preventing lightup of gas distribution holes | Dec 19, 1996 | Issued |
Array
(
[id] => 3933891
[patent_doc_number] => 05976309
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-02
[patent_title] => 'Electrode assembly for plasma reactor'
[patent_app_type] => 1
[patent_app_number] => 8/767698
[patent_app_country] => US
[patent_app_date] => 1996-12-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 2215
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/976/05976309.pdf
[firstpage_image] =>[orig_patent_app_number] => 767698
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/767698 | Electrode assembly for plasma reactor | Dec 16, 1996 | Issued |