
Dung H. Bui
Examiner (ID: 7927, Phone: (571)270-7077 , Office: P/1773 )
| Most Active Art Unit | 1773 |
| Art Unit(s) | 4153, 1773, 1797, 1775, 1776, 1772 |
| Total Applications | 1707 |
| Issued Applications | 1289 |
| Pending Applications | 185 |
| Abandoned Applications | 275 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1141658
[patent_doc_number] => 06777341
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-17
[patent_title] => 'Method of forming a self-aligned contact, and method of fabricating a semiconductor device having a self-aligned contact'
[patent_app_type] => B2
[patent_app_number] => 09/847289
[patent_app_country] => US
[patent_app_date] => 2001-05-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 21
[patent_figures_cnt] => 21
[patent_no_of_words] => 4092
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 239
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/777/06777341.pdf
[firstpage_image] =>[orig_patent_app_number] => 09847289
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/847289 | Method of forming a self-aligned contact, and method of fabricating a semiconductor device having a self-aligned contact | May 2, 2001 | Issued |
Array
(
[id] => 6532568
[patent_doc_number] => 20020162822
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-11-07
[patent_title] => 'Method for detecting end point in plasma etching by impedance change'
[patent_app_type] => new
[patent_app_number] => 09/847459
[patent_app_country] => US
[patent_app_date] => 2001-05-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3408
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 77
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0162/20020162822.pdf
[firstpage_image] =>[orig_patent_app_number] => 09847459
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/847459 | Method for detecting end point in plasma etching by impedance change | May 1, 2001 | Issued |
Array
(
[id] => 6316000
[patent_doc_number] => 20020195416
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-26
[patent_title] => 'METHOD OF ETCHING A TANTALUM NITRIDE LAYER IN A HIGH DENSITY PLASMA'
[patent_app_type] => new
[patent_app_number] => 09/846580
[patent_app_country] => US
[patent_app_date] => 2001-05-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 5617
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 29
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0195/20020195416.pdf
[firstpage_image] =>[orig_patent_app_number] => 09846580
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/846580 | Method of etching a tantalum nitride layer in a high density plasma | Apr 30, 2001 | Issued |
Array
(
[id] => 941293
[patent_doc_number] => 06969684
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-11-29
[patent_title] => 'Method of making a planarized semiconductor structure'
[patent_app_type] => utility
[patent_app_number] => 09/846119
[patent_app_country] => US
[patent_app_date] => 2001-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 12
[patent_no_of_words] => 8580
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 102
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/969/06969684.pdf
[firstpage_image] =>[orig_patent_app_number] => 09846119
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/846119 | Method of making a planarized semiconductor structure | Apr 29, 2001 | Issued |
Array
(
[id] => 7090473
[patent_doc_number] => 20010032707
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-25
[patent_title] => 'Dry etching system for patterning target layer at high reproducibility and method of dry etching used therein'
[patent_app_type] => new
[patent_app_number] => 09/836649
[patent_app_country] => US
[patent_app_date] => 2001-04-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 5354
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0032/20010032707.pdf
[firstpage_image] =>[orig_patent_app_number] => 09836649
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/836649 | Dry etching system for patterning target layer at high reproducibility and method of dry etching used therein | Apr 16, 2001 | Issued |
Array
(
[id] => 1177552
[patent_doc_number] => 06743724
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-06-01
[patent_title] => 'Planarization process for semiconductor substrates'
[patent_app_type] => B2
[patent_app_number] => 09/832560
[patent_app_country] => US
[patent_app_date] => 2001-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 12
[patent_no_of_words] => 7180
[patent_no_of_claims] => 45
[patent_no_of_ind_claims] => 25
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/743/06743724.pdf
[firstpage_image] =>[orig_patent_app_number] => 09832560
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/832560 | Planarization process for semiconductor substrates | Apr 10, 2001 | Issued |
Array
(
[id] => 1386298
[patent_doc_number] => 06540935
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-01
[patent_title] => 'Chemical/mechanical polishing slurry, and chemical mechanical polishing process and shallow trench isolation process employing the same'
[patent_app_type] => B2
[patent_app_number] => 09/826169
[patent_app_country] => US
[patent_app_date] => 2001-04-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 12
[patent_no_of_words] => 4830
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 26
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/540/06540935.pdf
[firstpage_image] =>[orig_patent_app_number] => 09826169
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/826169 | Chemical/mechanical polishing slurry, and chemical mechanical polishing process and shallow trench isolation process employing the same | Apr 4, 2001 | Issued |
| 09/787925 | Method and device for decomposing circuit member by water in supercritical fluid state | Apr 1, 2001 | Abandoned |
Array
(
[id] => 6889423
[patent_doc_number] => 20010024878
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-09-27
[patent_title] => 'Polishing pad, polishing apparatus and polishing method'
[patent_app_type] => new
[patent_app_number] => 09/816169
[patent_app_country] => US
[patent_app_date] => 2001-03-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4931
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0024/20010024878.pdf
[firstpage_image] =>[orig_patent_app_number] => 09816169
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/816169 | Polishing pad, polishing apparatus and polishing method | Mar 25, 2001 | Issued |
Array
(
[id] => 1416900
[patent_doc_number] => 06509272
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-01-21
[patent_title] => 'Planarization method using fluid composition including chelating agents'
[patent_app_type] => B2
[patent_app_number] => 09/805343
[patent_app_country] => US
[patent_app_date] => 2001-03-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 20
[patent_no_of_words] => 6075
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/509/06509272.pdf
[firstpage_image] =>[orig_patent_app_number] => 09805343
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/805343 | Planarization method using fluid composition including chelating agents | Mar 12, 2001 | Issued |
Array
(
[id] => 5859368
[patent_doc_number] => 20020123228
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-05
[patent_title] => 'Method to improve the reliability of gold to aluminum wire bonds with small pad openings'
[patent_app_type] => new
[patent_app_number] => 09/798509
[patent_app_country] => US
[patent_app_date] => 2001-03-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2124
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 74
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0123/20020123228.pdf
[firstpage_image] =>[orig_patent_app_number] => 09798509
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/798509 | Method to improve the reliability of gold to aluminum wire bonds with small pad openings | Mar 1, 2001 | Abandoned |
Array
(
[id] => 5798027
[patent_doc_number] => 20020008019
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-01-24
[patent_title] => 'Method of manufacturing semiconductor device'
[patent_app_type] => new
[patent_app_number] => 09/795309
[patent_app_country] => US
[patent_app_date] => 2001-03-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 40
[patent_figures_cnt] => 40
[patent_no_of_words] => 8174
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 27
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0008/20020008019.pdf
[firstpage_image] =>[orig_patent_app_number] => 09795309
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/795309 | Method of manufacturing semiconductor device | Feb 28, 2001 | Issued |
Array
(
[id] => 1358543
[patent_doc_number] => 06554002
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-29
[patent_title] => 'Method for removing etching residues'
[patent_app_type] => B2
[patent_app_number] => 09/789349
[patent_app_country] => US
[patent_app_date] => 2001-02-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 1768
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 106
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/554/06554002.pdf
[firstpage_image] =>[orig_patent_app_number] => 09789349
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/789349 | Method for removing etching residues | Feb 20, 2001 | Issued |
Array
(
[id] => 6900135
[patent_doc_number] => 20010009811
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-07-26
[patent_title] => 'Methods, apparatuses, and substrate assembly structures for fabricating microelectronic components using mechanical and chemical-mechanical planarization processes'
[patent_app_type] => new
[patent_app_number] => 09/789359
[patent_app_country] => US
[patent_app_date] => 2001-02-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 5256
[patent_no_of_claims] => 58
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 71
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0009/20010009811.pdf
[firstpage_image] =>[orig_patent_app_number] => 09789359
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/789359 | Methods, apparatuses, and substrate assembly structures for fabricating microelectronic components using mechanical and chemical-mechanical planarization processes | Feb 19, 2001 | Issued |
Array
(
[id] => 1162754
[patent_doc_number] => 06759253
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-07-06
[patent_title] => 'Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units'
[patent_app_type] => B2
[patent_app_number] => 09/788629
[patent_app_country] => US
[patent_app_date] => 2001-02-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 32
[patent_no_of_words] => 11315
[patent_no_of_claims] => 33
[patent_no_of_ind_claims] => 11
[patent_words_short_claim] => 94
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/759/06759253.pdf
[firstpage_image] =>[orig_patent_app_number] => 09788629
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/788629 | Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units | Feb 15, 2001 | Issued |
Array
(
[id] => 1169006
[patent_doc_number] => 06753263
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-06-22
[patent_title] => 'Etching method'
[patent_app_type] => B1
[patent_app_number] => 09/700785
[patent_app_country] => US
[patent_app_date] => 2001-02-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 15
[patent_no_of_words] => 9854
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 122
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/753/06753263.pdf
[firstpage_image] =>[orig_patent_app_number] => 09700785
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/700785 | Etching method | Feb 4, 2001 | Issued |
Array
(
[id] => 1068711
[patent_doc_number] => 06844237
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-01-18
[patent_title] => 'Method for improving dielectric polishing'
[patent_app_type] => utility
[patent_app_number] => 09/774323
[patent_app_country] => US
[patent_app_date] => 2001-01-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 24
[patent_no_of_words] => 2902
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 66
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/844/06844237.pdf
[firstpage_image] =>[orig_patent_app_number] => 09774323
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/774323 | Method for improving dielectric polishing | Jan 30, 2001 | Issued |
Array
(
[id] => 7090296
[patent_doc_number] => 20010032591
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-25
[patent_title] => 'Magnetic barrier for plasma in chamber exhaust'
[patent_app_type] => new
[patent_app_number] => 09/775295
[patent_app_country] => US
[patent_app_date] => 2001-01-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4575
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0032/20010032591.pdf
[firstpage_image] =>[orig_patent_app_number] => 09775295
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/775295 | Magnetic barrier for plasma in chamber exhaust | Jan 30, 2001 | Abandoned |
Array
(
[id] => 1143162
[patent_doc_number] => 06773544
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-10
[patent_title] => 'Magnetic barrier for plasma in chamber exhaust'
[patent_app_type] => B2
[patent_app_number] => 09/775173
[patent_app_country] => US
[patent_app_date] => 2001-01-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 4622
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 118
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/773/06773544.pdf
[firstpage_image] =>[orig_patent_app_number] => 09775173
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/775173 | Magnetic barrier for plasma in chamber exhaust | Jan 30, 2001 | Issued |
Array
(
[id] => 6907539
[patent_doc_number] => 20010010306
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-08-02
[patent_title] => 'Etching method and apparatus'
[patent_app_type] => new
[patent_app_number] => 09/771549
[patent_app_country] => US
[patent_app_date] => 2001-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 17
[patent_no_of_words] => 8244
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 34
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0010/20010010306.pdf
[firstpage_image] =>[orig_patent_app_number] => 09771549
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/771549 | Etching method and apparatus | Jan 29, 2001 | Issued |