Search

Dung H. Bui

Examiner (ID: 7927, Phone: (571)270-7077 , Office: P/1773 )

Most Active Art Unit
1773
Art Unit(s)
4153, 1773, 1797, 1775, 1776, 1772
Total Applications
1707
Issued Applications
1289
Pending Applications
185
Abandoned Applications
275

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1341912 [patent_doc_number] => 06582618 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-06-24 [patent_title] => 'Method of determining etch endpoint using principal components analysis of optical emission spectra' [patent_app_type] => B1 [patent_app_number] => 09/491845 [patent_app_country] => US [patent_app_date] => 2000-01-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 31 [patent_figures_cnt] => 32 [patent_no_of_words] => 22461 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/582/06582618.pdf [firstpage_image] =>[orig_patent_app_number] => 09491845 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/491845
Method of determining etch endpoint using principal components analysis of optical emission spectra Jan 25, 2000 Issued
Array ( [id] => 1132023 [patent_doc_number] => 06783627 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-08-31 [patent_title] => 'Reactor with remote plasma system and method of processing a semiconductor substrate' [patent_app_type] => B1 [patent_app_number] => 09/488309 [patent_app_country] => US [patent_app_date] => 2000-01-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 8 [patent_no_of_words] => 5445 [patent_no_of_claims] => 42 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 96 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/783/06783627.pdf [firstpage_image] =>[orig_patent_app_number] => 09488309 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/488309
Reactor with remote plasma system and method of processing a semiconductor substrate Jan 19, 2000 Issued
Array ( [id] => 1390629 [patent_doc_number] => 06544882 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-04-08 [patent_title] => 'Method to improve reliability of multilayer structures of FSG (F-doped SiO2) dielectric layers and aluminum-copper-TiN layers in integrated circuits' [patent_app_type] => B1 [patent_app_number] => 09/482049 [patent_app_country] => US [patent_app_date] => 2000-01-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 12 [patent_no_of_words] => 3051 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 148 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/544/06544882.pdf [firstpage_image] =>[orig_patent_app_number] => 09482049 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/482049
Method to improve reliability of multilayer structures of FSG (F-doped SiO2) dielectric layers and aluminum-copper-TiN layers in integrated circuits Jan 12, 2000 Issued
Array ( [id] => 4400760 [patent_doc_number] => 06192899 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-27 [patent_title] => 'Etch residue clean with aqueous HF/organic solution' [patent_app_type] => 1 [patent_app_number] => 9/480450 [patent_app_country] => US [patent_app_date] => 2000-01-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 3757 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 34 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/192/06192899.pdf [firstpage_image] =>[orig_patent_app_number] => 480450 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/480450
Etch residue clean with aqueous HF/organic solution Jan 9, 2000 Issued
Array ( [id] => 1594599 [patent_doc_number] => 06492068 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-10 [patent_title] => 'Etching method for production of semiconductor devices' [patent_app_type] => B1 [patent_app_number] => 09/478789 [patent_app_country] => US [patent_app_date] => 2000-01-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 11135 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/492/06492068.pdf [firstpage_image] =>[orig_patent_app_number] => 09478789 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/478789
Etching method for production of semiconductor devices Jan 6, 2000 Issued
Array ( [id] => 1390864 [patent_doc_number] => 06531071 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-03-11 [patent_title] => 'Passivation for cleaning a material' [patent_app_type] => B1 [patent_app_number] => 09/477299 [patent_app_country] => US [patent_app_date] => 2000-01-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 4695 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 34 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/531/06531071.pdf [firstpage_image] =>[orig_patent_app_number] => 09477299 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/477299
Passivation for cleaning a material Jan 3, 2000 Issued
Array ( [id] => 4336007 [patent_doc_number] => 06189546 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-20 [patent_title] => 'Polishing process for manufacturing dopant-striation-free polished silicon wafers' [patent_app_type] => 1 [patent_app_number] => 9/473669 [patent_app_country] => US [patent_app_date] => 1999-12-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 5229 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/189/06189546.pdf [firstpage_image] =>[orig_patent_app_number] => 473669 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/473669
Polishing process for manufacturing dopant-striation-free polished silicon wafers Dec 28, 1999 Issued
Array ( [id] => 1281215 [patent_doc_number] => 06642150 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-11-04 [patent_title] => 'Method for testing for blind hole formed in wafer layer' [patent_app_type] => B1 [patent_app_number] => 09/473029 [patent_app_country] => US [patent_app_date] => 1999-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1934 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 209 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/642/06642150.pdf [firstpage_image] =>[orig_patent_app_number] => 09473029 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/473029
Method for testing for blind hole formed in wafer layer Dec 27, 1999 Issued
Array ( [id] => 1393378 [patent_doc_number] => 06533952 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-03-18 [patent_title] => 'Mitigation of radiation induced surface contamination' [patent_app_type] => B2 [patent_app_number] => 09/470860 [patent_app_country] => US [patent_app_date] => 1999-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 2942 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/533/06533952.pdf [firstpage_image] =>[orig_patent_app_number] => 09470860 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/470860
Mitigation of radiation induced surface contamination Dec 22, 1999 Issued
Array ( [id] => 4408803 [patent_doc_number] => 06265320 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-24 [patent_title] => 'Method of minimizing reactive ion etch damage of organic insulating layers in semiconductor fabrication' [patent_app_type] => 1 [patent_app_number] => 9/467389 [patent_app_country] => US [patent_app_date] => 1999-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 2528 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/265/06265320.pdf [firstpage_image] =>[orig_patent_app_number] => 467389 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/467389
Method of minimizing reactive ion etch damage of organic insulating layers in semiconductor fabrication Dec 20, 1999 Issued
Array ( [id] => 728467 [patent_doc_number] => 07041599 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2006-05-09 [patent_title] => 'High through-put Cu CMP with significantly reduced erosion and dishing' [patent_app_type] => utility [patent_app_number] => 09/469709 [patent_app_country] => US [patent_app_date] => 1999-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 5718 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 159 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/041/07041599.pdf [firstpage_image] =>[orig_patent_app_number] => 09469709 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/469709
High through-put Cu CMP with significantly reduced erosion and dishing Dec 20, 1999 Issued
Array ( [id] => 1581164 [patent_doc_number] => 06423618 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-23 [patent_title] => 'Method of manufacturing trench gate structure' [patent_app_type] => B1 [patent_app_number] => 09/461869 [patent_app_country] => US [patent_app_date] => 1999-12-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 17 [patent_no_of_words] => 3312 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 180 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/423/06423618.pdf [firstpage_image] =>[orig_patent_app_number] => 09461869 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/461869
Method of manufacturing trench gate structure Dec 14, 1999 Issued
Array ( [id] => 1196951 [patent_doc_number] => 06722376 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-04-20 [patent_title] => 'Polysilicon etch useful during the manufacture of a semiconductor device' [patent_app_type] => B2 [patent_app_number] => 09/458875 [patent_app_country] => US [patent_app_date] => 1999-12-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 0 [patent_no_of_words] => 3095 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 196 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/722/06722376.pdf [firstpage_image] =>[orig_patent_app_number] => 09458875 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/458875
Polysilicon etch useful during the manufacture of a semiconductor device Dec 9, 1999 Issued
Array ( [id] => 1574813 [patent_doc_number] => 06468910 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-10-22 [patent_title] => 'Slurry for chemical mechanical polishing silicon dioxide' [patent_app_type] => B1 [patent_app_number] => 09/456612 [patent_app_country] => US [patent_app_date] => 1999-12-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2310 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/468/06468910.pdf [firstpage_image] =>[orig_patent_app_number] => 09456612 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/456612
Slurry for chemical mechanical polishing silicon dioxide Dec 7, 1999 Issued
Array ( [id] => 4407790 [patent_doc_number] => 06239036 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-29 [patent_title] => 'Apparatus and method for plasma etching' [patent_app_type] => 1 [patent_app_number] => 9/452869 [patent_app_country] => US [patent_app_date] => 1999-12-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 15 [patent_no_of_words] => 4484 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/239/06239036.pdf [firstpage_image] =>[orig_patent_app_number] => 452869 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/452869
Apparatus and method for plasma etching Dec 1, 1999 Issued
Array ( [id] => 1602647 [patent_doc_number] => 06432826 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-13 [patent_title] => 'Planarized Cu cleaning for reduced defects' [patent_app_type] => B1 [patent_app_number] => 09/450479 [patent_app_country] => US [patent_app_date] => 1999-11-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 3180 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/432/06432826.pdf [firstpage_image] =>[orig_patent_app_number] => 09450479 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/450479
Planarized Cu cleaning for reduced defects Nov 28, 1999 Issued
Array ( [id] => 714253 [patent_doc_number] => 07052627 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2006-05-30 [patent_title] => 'Etching solution, etched article and method for etched article' [patent_app_type] => utility [patent_app_number] => 09/856361 [patent_app_country] => US [patent_app_date] => 1999-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3542 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/052/07052627.pdf [firstpage_image] =>[orig_patent_app_number] => 09856361 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/856361
Etching solution, etched article and method for etched article Nov 21, 1999 Issued
Array ( [id] => 1550518 [patent_doc_number] => 06399500 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-04 [patent_title] => 'Mechano-chemical polishing of crystals and epitaxial layers of GaN and Ga1-x-yA1xInyN' [patent_app_type] => B1 [patent_app_number] => 09/402692 [patent_app_country] => US [patent_app_date] => 1999-11-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 1193 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/399/06399500.pdf [firstpage_image] =>[orig_patent_app_number] => 09402692 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/402692
Mechano-chemical polishing of crystals and epitaxial layers of GaN and Ga1-x-yA1xInyN Nov 18, 1999 Issued
Array ( [id] => 1379187 [patent_doc_number] => 06530380 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-03-11 [patent_title] => 'Method for selective oxide etching in pre-metal deposition' [patent_app_type] => B1 [patent_app_number] => 09/443428 [patent_app_country] => US [patent_app_date] => 1999-11-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 6 [patent_no_of_words] => 4492 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 154 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/530/06530380.pdf [firstpage_image] =>[orig_patent_app_number] => 09443428 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/443428
Method for selective oxide etching in pre-metal deposition Nov 18, 1999 Issued
Array ( [id] => 1125347 [patent_doc_number] => 06790374 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-09-14 [patent_title] => 'Plasma etch method for forming plasma etched silicon layer' [patent_app_type] => B1 [patent_app_number] => 09/442499 [patent_app_country] => US [patent_app_date] => 1999-11-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 6028 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 234 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/790/06790374.pdf [firstpage_image] =>[orig_patent_app_number] => 09442499 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/442499
Plasma etch method for forming plasma etched silicon layer Nov 17, 1999 Issued
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