
Eric S. Keasel
Examiner (ID: 4042)
| Most Active Art Unit | 3753 |
| Art Unit(s) | 3753, 3992, 3754 |
| Total Applications | 1380 |
| Issued Applications | 1046 |
| Pending Applications | 102 |
| Abandoned Applications | 249 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5159720
[patent_doc_number] => 20070172764
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-07-26
[patent_title] => 'MULTILAYER IMAGEABLE ELEMENT CONTAINING SULFONAMIDO RESIN'
[patent_app_type] => utility
[patent_app_number] => 11/551753
[patent_app_country] => US
[patent_app_date] => 2006-10-23
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/551753 | Multilayer imageable element containing sulfonamido resin | Oct 22, 2006 | Issued |
Array
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[patent_doc_number] => 20080096124
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[patent_kind] => A1
[patent_issue_date] => 2008-04-24
[patent_title] => 'STRUCTURED THERMAL TRANSFER DONORS'
[patent_app_type] => utility
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Array
(
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[patent_issue_date] => 2007-11-27
[patent_title] => 'Multi-layer imageable element with improved properties'
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Array
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[patent_title] => 'Process for preparing a flexographic printing plate'
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Array
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[patent_title] => 'Silver halide color photosensitive material'
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Array
(
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[patent_title] => 'Negative-working radiation-sensitive compositions and imageable materials'
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Array
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[patent_title] => 'Lamination and delamination technique for thin film processing'
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Array
(
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[patent_title] => 'Manufacturing method for donor film with improved surface roughness'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/520467 | Manufacturing method for donor film with improved surface roughness | Sep 11, 2006 | Issued |
Array
(
[id] => 4771777
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[patent_title] => 'Thermal transfer donor element with a carboxylated binder and a hydroxylated organic compound'
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Array
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[patent_title] => 'Method of imaging and developing negative-working elements'
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Array
(
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[patent_title] => 'Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method'
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Array
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Array
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Array
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