| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 19602805
[patent_doc_number] => 20240393685
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2024-11-28
[patent_title] => SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE
[patent_app_type] => utility
[patent_app_number] => 18/790692
[patent_app_country] => US
[patent_app_date] => 2024-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13626
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 46
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18790692
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/790692 | SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE | Jul 30, 2024 | Pending |
Array
(
[id] => 18568696
[patent_doc_number] => 20230259032
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-08-17
[patent_title] => COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS
[patent_app_type] => utility
[patent_app_number] => 18/138873
[patent_app_country] => US
[patent_app_date] => 2023-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9299
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 160
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18138873
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/138873 | COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS | Apr 24, 2023 | Pending |
Array
(
[id] => 18659387
[patent_doc_number] => 20230305392
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-09-28
[patent_title] => SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
[patent_app_type] => utility
[patent_app_number] => 18/124203
[patent_app_country] => US
[patent_app_date] => 2023-03-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 51334
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -21
[patent_words_short_claim] => 707
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18124203
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/124203 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Mar 20, 2023 | Pending |
Array
(
[id] => 18453708
[patent_doc_number] => 20230194988
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-06-22
[patent_title] => TRANSFER FILM, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR CIRCUIT WIRE, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE
[patent_app_type] => utility
[patent_app_number] => 18/170591
[patent_app_country] => US
[patent_app_date] => 2023-02-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 38216
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -15
[patent_words_short_claim] => 163
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18170591
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/170591 | TRANSFER FILM, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR CIRCUIT WIRE, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE | Feb 16, 2023 | Pending |
Array
(
[id] => 18553558
[patent_doc_number] => 20230251570
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-08-10
[patent_title] => Selective Deprotection via Dye Diffusion
[patent_app_type] => utility
[patent_app_number] => 18/166598
[patent_app_country] => US
[patent_app_date] => 2023-02-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3528
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 212
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18166598
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/166598 | Selective Deprotection via Dye Diffusion | Feb 8, 2023 | Pending |
Array
(
[id] => 18651147
[patent_doc_number] => 20230296983
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-09-21
[patent_title] => PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
[patent_app_type] => utility
[patent_app_number] => 18/154184
[patent_app_country] => US
[patent_app_date] => 2023-01-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8294
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18154184
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/154184 | Photosensitive polymer, photoresist composition including the same, and method of fabricating semiconductor device | Jan 12, 2023 | Issued |
Array
(
[id] => 18361196
[patent_doc_number] => 20230142787
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-05-11
[patent_title] => NEGATIVE TONE PHOTORESIST FOR EUV LITHOGRAPHY
[patent_app_type] => utility
[patent_app_number] => 18/151413
[patent_app_country] => US
[patent_app_date] => 2023-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5913
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18151413
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/151413 | NEGATIVE TONE PHOTORESIST FOR EUV LITHOGRAPHY | Jan 5, 2023 | Pending |
Array
(
[id] => 18377605
[patent_doc_number] => 20230152692
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-05-18
[patent_title] => CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
[patent_app_type] => utility
[patent_app_number] => 17/969059
[patent_app_country] => US
[patent_app_date] => 2022-10-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12293
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -12
[patent_words_short_claim] => 47
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17969059
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/969059 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | Oct 18, 2022 | Pending |
Array
(
[id] => 18339049
[patent_doc_number] => 20230130998
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-04-27
[patent_title] => PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME
[patent_app_type] => utility
[patent_app_number] => 17/966970
[patent_app_country] => US
[patent_app_date] => 2022-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5167
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 161
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17966970
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/966970 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | Oct 16, 2022 | Pending |
Array
(
[id] => 18184711
[patent_doc_number] => 20230045441
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-02-09
[patent_title] => PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM
[patent_app_type] => utility
[patent_app_number] => 17/901433
[patent_app_country] => US
[patent_app_date] => 2022-09-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 27376
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17901433
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/901433 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | Aug 31, 2022 | Abandoned |
Array
(
[id] => 18244777
[patent_doc_number] => 20230077088
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-03-09
[patent_title] => METHOD OF FORMING AN UNDERLAYER FOR EXTREME ULTRAVIOLET (EUV) DOSE REDUCTION AND STRUCTURE INCLUDING SAME
[patent_app_type] => utility
[patent_app_number] => 17/900065
[patent_app_country] => US
[patent_app_date] => 2022-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10107
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 46
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17900065
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/900065 | METHOD OF FORMING AN UNDERLAYER FOR EXTREME ULTRAVIOLET (EUV) DOSE REDUCTION AND STRUCTURE INCLUDING SAME | Aug 30, 2022 | Pending |
Array
(
[id] => 18553562
[patent_doc_number] => 20230251574
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-08-10
[patent_title] => METHOD TO ENHANCE LITHOGRAPHY PATTERN CREATION USING SEMICONDUCTOR STRESS FILM TUNING
[patent_app_type] => utility
[patent_app_number] => 17/890766
[patent_app_country] => US
[patent_app_date] => 2022-08-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6552
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17890766
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/890766 | METHOD TO ENHANCE LITHOGRAPHY PATTERN CREATION USING SEMICONDUCTOR STRESS FILM TUNING | Aug 17, 2022 | Pending |
Array
(
[id] => 18956991
[patent_doc_number] => 20240045318
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2024-02-08
[patent_title] => EXTREME ULTRAVIOLET MASK WITH DIFFUSION BARRIER LAYER
[patent_app_type] => utility
[patent_app_number] => 17/880019
[patent_app_country] => US
[patent_app_date] => 2022-08-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10195
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17880019
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/880019 | EXTREME ULTRAVIOLET MASK WITH DIFFUSION BARRIER LAYER | Aug 2, 2022 | Pending |
Array
(
[id] => 18531434
[patent_doc_number] => 20230236506
[patent_country] => US
[patent_kind] => A2
[patent_issue_date] => 2023-07-27
[patent_title] => RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
[patent_app_type] => utility
[patent_app_number] => 17/867739
[patent_app_country] => US
[patent_app_date] => 2022-07-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12853
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17867739
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/867739 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | Jul 18, 2022 | Abandoned |
Array
(
[id] => 18531434
[patent_doc_number] => 20230236506
[patent_country] => US
[patent_kind] => A2
[patent_issue_date] => 2023-07-27
[patent_title] => RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
[patent_app_type] => utility
[patent_app_number] => 17/867739
[patent_app_country] => US
[patent_app_date] => 2022-07-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12853
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17867739
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/867739 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | Jul 18, 2022 | Abandoned |
Array
(
[id] => 18296300
[patent_doc_number] => 20230105986
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-04-06
[patent_title] => NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
[patent_app_type] => utility
[patent_app_number] => 17/865523
[patent_app_country] => US
[patent_app_date] => 2022-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8570
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 58
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17865523
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/865523 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | Jul 14, 2022 | Pending |
Array
(
[id] => 18148145
[patent_doc_number] => 20230022002
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-01-26
[patent_title] => IONIC SALT, RADIATION-SENSITIVE RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME
[patent_app_type] => utility
[patent_app_number] => 17/865936
[patent_app_country] => US
[patent_app_date] => 2022-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 14661
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -19
[patent_words_short_claim] => 136
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17865936
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/865936 | IONIC SALT, RADIATION-SENSITIVE RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME | Jul 14, 2022 | Pending |
Array
(
[id] => 20438761
[patent_doc_number] => 12509588
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2025-12-30
[patent_title] => Core-shell compound, photosensitive resin composition including the same, photosensitive resin layer, color filter, and CMOS image sensor
[patent_app_type] => utility
[patent_app_number] => 17/845043
[patent_app_country] => US
[patent_app_date] => 2022-06-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 6542
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 268
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17845043
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/845043 | Core-shell compound, photosensitive resin composition including the same, photosensitive resin layer, color filter, and CMOS image sensor | Jun 20, 2022 | Issued |
Array
(
[id] => 18149736
[patent_doc_number] => 20230023593
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-01-26
[patent_title] => POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
[patent_app_type] => utility
[patent_app_number] => 17/837310
[patent_app_country] => US
[patent_app_date] => 2022-06-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11515
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 254
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17837310
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/837310 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | Jun 9, 2022 | Pending |
Array
(
[id] => 18111206
[patent_doc_number] => 20230004086
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-01-05
[patent_title] => ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
[patent_app_type] => utility
[patent_app_number] => 17/836536
[patent_app_country] => US
[patent_app_date] => 2022-06-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 35343
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -16
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17836536
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/836536 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Jun 8, 2022 | Abandoned |