
George A. Goudreau
Examiner (ID: 16285)
| Most Active Art Unit | 1763 |
| Art Unit(s) | 1765, 1792, 1104, 1763, 1109, 1304 |
| Total Applications | 1121 |
| Issued Applications | 962 |
| Pending Applications | 34 |
| Abandoned Applications | 125 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4930100
[patent_doc_number] => 20080000875
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-01-03
[patent_title] => 'Aluminum incorporation in porous dielectric for improved mechanical properties of patterned dielectric'
[patent_app_type] => utility
[patent_app_number] => 11/479519
[patent_app_country] => US
[patent_app_date] => 2006-06-30
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[pdf_file] => publications/A1/0000/20080000875.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/479519 | Aluminum incorporation in porous dielectric for improved mechanical properties of patterned dielectric | Jun 29, 2006 | Issued |
Array
(
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[patent_doc_number] => 07351665
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[patent_kind] => B2
[patent_issue_date] => 2008-04-01
[patent_title] => 'Plasma etching method, plasma etching apparatus, control program, computer recording medium and recording medium having processing recipe recorded thereon'
[patent_app_type] => utility
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[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 11390449
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/390449 | Plasma etching method, plasma etching apparatus, control program, computer recording medium and recording medium having processing recipe recorded thereon | Mar 27, 2006 | Issued |
Array
(
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[patent_title] => 'Semiconductor device fabrication method'
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[patent_app_number] => 11/357139
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Array
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[patent_issue_date] => 2008-10-28
[patent_title] => 'Plasma etching method'
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Array
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[patent_title] => 'Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool'
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Array
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[patent_title] => 'Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask'
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Array
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[patent_title] => 'Etching liquid for controlling silicon wafer surface shape and method for manufacturing silicon wafer using the same'
[patent_app_type] => utility
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Array
(
[id] => 840423
[patent_doc_number] => 07390751
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[patent_issue_date] => 2008-06-24
[patent_title] => 'Dry etching method and apparatus for performing dry etching'
[patent_app_type] => utility
[patent_app_number] => 11/313851
[patent_app_country] => US
[patent_app_date] => 2005-12-22
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/313851 | Dry etching method and apparatus for performing dry etching | Dec 21, 2005 | Issued |
Array
(
[id] => 366615
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[patent_title] => 'Methods and apparatus for the optimization of highly selective process gases'
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Array
(
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[patent_title] => 'Method to form etch and/or CMP stop layers'
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Array
(
[id] => 840425
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[patent_title] => 'In-situ plasma treatment of advanced resists in fine pattern definition'
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Array
(
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Array
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Array
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Array
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Array
(
[id] => 5817391
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/222749 | Method for manufacturing electronic device | Sep 11, 2005 | Issued |