
Gregory E. Webb
Examiner (ID: 11271)
| Most Active Art Unit | 1761 |
| Art Unit(s) | 1796, 1767, 1751, 1761 |
| Total Applications | 1891 |
| Issued Applications | 1472 |
| Pending Applications | 98 |
| Abandoned Applications | 324 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6931683
[patent_doc_number] => 20050282718
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-12-22
[patent_title] => 'Rinsing composition, and method for rinsing and manufacturing silicon wafer'
[patent_app_type] => utility
[patent_app_number] => 11/155389
[patent_app_country] => US
[patent_app_date] => 2005-06-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4608
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 4
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0282/20050282718.pdf
[firstpage_image] =>[orig_patent_app_number] => 11155389
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/155389 | Rinsing composition, and method for rinsing and manufacturing silicon wafer | Jun 15, 2005 | Issued |
Array
(
[id] => 5643194
[patent_doc_number] => 20060281649
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-12-14
[patent_title] => 'Cleaning material manufacturing method, cleaning material manufacturing apparatus and cleaning system'
[patent_app_type] => utility
[patent_app_number] => 11/154164
[patent_app_country] => US
[patent_app_date] => 2005-06-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[firstpage_image] =>[orig_patent_app_number] => 11154164
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/154164 | Cleaning material manufacturing method, cleaning material manufacturing apparatus and cleaning system | Jun 15, 2005 | Abandoned |
Array
(
[id] => 843596
[patent_doc_number] => 07387989
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-06-17
[patent_title] => 'AlxGayInl−x−yN substrate, cleaning method of AlxGayInl−x−yN substrate, AlN substrate, and cleaning method of AlN substrate'
[patent_app_type] => utility
[patent_app_number] => 11/148239
[patent_app_country] => US
[patent_app_date] => 2005-06-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 6257
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[patent_maintenance] => 1
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[pdf_file] => patents/07/387/07387989.pdf
[firstpage_image] =>[orig_patent_app_number] => 11148239
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/148239 | AlxGayInl−x−yN substrate, cleaning method of AlxGayInl−x−yN substrate, AlN substrate, and cleaning method of AlN substrate | Jun 8, 2005 | Issued |
Array
(
[id] => 5895371
[patent_doc_number] => 20060003910
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-05
[patent_title] => 'Composition and method comprising same for removing residue from a substrate'
[patent_app_type] => utility
[patent_app_number] => 11/142450
[patent_app_country] => US
[patent_app_date] => 2005-06-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 5293
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Array
(
[id] => 4698820
[patent_doc_number] => 20080221004
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-09-11
[patent_title] => 'Cleaning Solution for a Semiconductor Wafer'
[patent_app_type] => utility
[patent_app_number] => 11/914870
[patent_app_country] => US
[patent_app_date] => 2005-05-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 1673
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[pdf_file] => publications/A1/0221/20080221004.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/914870 | Cleaning solution for a semiconductor wafer | May 24, 2005 | Issued |
Array
(
[id] => 224930
[patent_doc_number] => 07605113
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-10-20
[patent_title] => 'Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate'
[patent_app_type] => utility
[patent_app_number] => 11/135892
[patent_app_country] => US
[patent_app_date] => 2005-05-24
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[patent_no_of_words] => 3811
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[pdf_file] => patents/07/605/07605113.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/135892 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | May 23, 2005 | Issued |
Array
(
[id] => 7108552
[patent_doc_number] => 20050206005
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[patent_kind] => A1
[patent_issue_date] => 2005-09-22
[patent_title] => 'Composition and a method for defect reduction'
[patent_app_type] => utility
[patent_app_number] => 11/133828
[patent_app_country] => US
[patent_app_date] => 2005-05-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
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[patent_no_of_words] => 3583
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[pdf_file] => publications/A1/0206/20050206005.pdf
[firstpage_image] =>[orig_patent_app_number] => 11133828
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/133828 | Composition and a method for defect reduction | May 18, 2005 | Abandoned |
Array
(
[id] => 101290
[patent_doc_number] => 07727420
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-06-01
[patent_title] => 'Corrosion inhibiting compositions'
[patent_app_type] => utility
[patent_app_number] => 11/130768
[patent_app_country] => US
[patent_app_date] => 2005-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 2252
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[pdf_file] => patents/07/727/07727420.pdf
[firstpage_image] =>[orig_patent_app_number] => 11130768
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/130768 | Corrosion inhibiting compositions | May 16, 2005 | Issued |
Array
(
[id] => 7171865
[patent_doc_number] => 20050202989
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[patent_issue_date] => 2005-09-15
[patent_title] => 'Cleaning compositions and methods of treating equipment'
[patent_app_type] => utility
[patent_app_number] => 11/123787
[patent_app_country] => US
[patent_app_date] => 2005-05-06
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/123787 | Cleaning compositions and methods of treating equipment | May 5, 2005 | Issued |
Array
(
[id] => 5771150
[patent_doc_number] => 20050266683
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[patent_kind] => A1
[patent_issue_date] => 2005-12-01
[patent_title] => 'Remover compositions for dual damascene system'
[patent_app_type] => utility
[patent_app_number] => 11/119844
[patent_app_country] => US
[patent_app_date] => 2005-05-02
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[firstpage_image] =>[orig_patent_app_number] => 11119844
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/119844 | Remover compositions for dual damascene system | May 1, 2005 | Issued |
Array
(
[id] => 252675
[patent_doc_number] => 07579308
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[patent_kind] => B2
[patent_issue_date] => 2009-08-25
[patent_title] => 'Compositions and processes for photoresist stripping and residue removal in wafer level packaging'
[patent_app_type] => utility
[patent_app_number] => 11/120054
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Array
(
[id] => 54011
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[patent_issue_date] => 2010-08-03
[patent_title] => 'Azeotrope-like compositions of tetrafluoropropene and hydrofluorocarbons'
[patent_app_type] => utility
[patent_app_number] => 11/119053
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Array
(
[id] => 204697
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[patent_title] => 'Compositions comprising tetrafluoropropene and carbon dioxide'
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Array
(
[id] => 7070037
[patent_doc_number] => 20050245422
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-03
[patent_title] => 'Alkali cleaner'
[patent_app_type] => utility
[patent_app_number] => 11/114995
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Array
(
[id] => 577458
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Array
(
[id] => 5821009
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Array
(
[id] => 5796395
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Array
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Array
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Array
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