
Haissa Philogene
Examiner (ID: 7070, Phone: (571)272-1827 , Office: P/2844 )
| Most Active Art Unit | 2844 |
| Art Unit(s) | 2502, 3621, 2821, 2844, 2828, 2817 |
| Total Applications | 2745 |
| Issued Applications | 2511 |
| Pending Applications | 92 |
| Abandoned Applications | 151 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1065330
[patent_doc_number] => 06846598
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-01-25
[patent_title] => 'Manufacturing method of photomask and photomask'
[patent_app_type] => utility
[patent_app_number] => 10/686723
[patent_app_country] => US
[patent_app_date] => 2003-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 73
[patent_figures_cnt] => 167
[patent_no_of_words] => 33979
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[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/846/06846598.pdf
[firstpage_image] =>[orig_patent_app_number] => 10686723
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/686723 | Manufacturing method of photomask and photomask | Oct 16, 2003 | Issued |
Array
(
[id] => 7134144
[patent_doc_number] => 20040043307
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-04
[patent_title] => 'Electron device manufacturing method, a pattern forming method, and a photomask used for those methods'
[patent_app_type] => new
[patent_app_number] => 10/671666
[patent_app_country] => US
[patent_app_date] => 2003-09-29
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0043/20040043307.pdf
[firstpage_image] =>[orig_patent_app_number] => 10671666
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/671666 | Electron device manufacturing method, a pattern forming method, and a photomask used for those methods | Sep 28, 2003 | Issued |
Array
(
[id] => 1005219
[patent_doc_number] => 06905811
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-06-14
[patent_title] => 'Method to form reduced dimension pattern with good edge roughness'
[patent_app_type] => utility
[patent_app_number] => 10/420593
[patent_app_country] => US
[patent_app_date] => 2003-04-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_claims] => 30
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/905/06905811.pdf
[firstpage_image] =>[orig_patent_app_number] => 10420593
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/420593 | Method to form reduced dimension pattern with good edge roughness | Apr 21, 2003 | Issued |
Array
(
[id] => 1145360
[patent_doc_number] => 06773865
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-10
[patent_title] => 'Anti-charging layer for beam lithography and mask fabrication'
[patent_app_type] => B2
[patent_app_number] => 10/414572
[patent_app_country] => US
[patent_app_date] => 2003-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
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[patent_no_of_words] => 5831
[patent_no_of_claims] => 40
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/773/06773865.pdf
[firstpage_image] =>[orig_patent_app_number] => 10414572
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/414572 | Anti-charging layer for beam lithography and mask fabrication | Apr 14, 2003 | Issued |
Array
(
[id] => 6701204
[patent_doc_number] => 20030224084
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-12-04
[patent_title] => 'Method for manufacturing master substrate used for manufacturing grooved molding substrate, method for manufacturing stamper for manufacturing grooved molding substrate, method for manufacturing grooved molding substrate, grooved molding substrate, memory medium, memory device, and computer'
[patent_app_type] => new
[patent_app_number] => 10/406438
[patent_app_country] => US
[patent_app_date] => 2003-04-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
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[patent_no_of_words] => 14214
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0224/20030224084.pdf
[firstpage_image] =>[orig_patent_app_number] => 10406438
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/406438 | METHOD FOR MANUFACTURING MASTER SUBSTRATE USED FOR MANUFACTURING GROOVED MOLDING SUBSTRATE, METHOD FOR MANUFACTURING STAMPER FOR MANUFACTURING GROOVED MOLDING SUBSTRATE, METHOD FOR MANUFACTURING GROOVED MOLDING SUBSTRATE, GROOVED MOLDING SUBSTRATE, MEMORY MEDIUM, MEMORY DEVICE, AND COMPUTER | Apr 3, 2003 | Issued |
Array
(
[id] => 1037364
[patent_doc_number] => 06872512
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-29
[patent_title] => 'Method of forming resist pattern'
[patent_app_type] => utility
[patent_app_number] => 10/400860
[patent_app_country] => US
[patent_app_date] => 2003-03-27
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/872/06872512.pdf
[firstpage_image] =>[orig_patent_app_number] => 10400860
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/400860 | Method of forming resist pattern | Mar 26, 2003 | Issued |
Array
(
[id] => 1150956
[patent_doc_number] => 06767690
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-07-27
[patent_title] => 'Methods of forming patterns across photoresist and methods of forming radiation-patterning tools'
[patent_app_type] => B2
[patent_app_number] => 10/391310
[patent_app_country] => US
[patent_app_date] => 2003-03-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/06/767/06767690.pdf
[firstpage_image] =>[orig_patent_app_number] => 10391310
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/391310 | Methods of forming patterns across photoresist and methods of forming radiation-patterning tools | Mar 16, 2003 | Issued |
Array
(
[id] => 1115036
[patent_doc_number] => 06800405
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-10-05
[patent_title] => 'Method of producing pattern-formed structure and photomask used in the same'
[patent_app_type] => B2
[patent_app_number] => 10/388288
[patent_app_country] => US
[patent_app_date] => 2003-03-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[firstpage_image] =>[orig_patent_app_number] => 10388288
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/388288 | Method of producing pattern-formed structure and photomask used in the same | Mar 12, 2003 | Issued |
Array
(
[id] => 1104320
[patent_doc_number] => 06811945
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-11-02
[patent_title] => 'Method of producing pattern-formed structure and photomask used in the same'
[patent_app_type] => B2
[patent_app_number] => 10/387753
[patent_app_country] => US
[patent_app_date] => 2003-03-13
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[firstpage_image] =>[orig_patent_app_number] => 10387753
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/387753 | Method of producing pattern-formed structure and photomask used in the same | Mar 12, 2003 | Issued |
Array
(
[id] => 6655067
[patent_doc_number] => 20030077526
[patent_country] => US
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[patent_issue_date] => 2003-04-24
[patent_title] => 'Two-exposure phase shift photolithography with improved inter-feature separation'
[patent_app_type] => new
[patent_app_number] => 10/305002
[patent_app_country] => US
[patent_app_date] => 2002-11-27
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[firstpage_image] =>[orig_patent_app_number] => 10305002
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/305002 | Two-exposure phase shift photolithography with improved inter-feature separation | Nov 26, 2002 | Issued |
Array
(
[id] => 6674120
[patent_doc_number] => 20030059723
[patent_country] => US
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[patent_issue_date] => 2003-03-27
[patent_title] => 'Electronic device manufacture'
[patent_app_type] => new
[patent_app_number] => 10/289932
[patent_app_country] => US
[patent_app_date] => 2002-11-07
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 10289932
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/289932 | Electronic device manufacture | Nov 6, 2002 | Issued |
Array
(
[id] => 7201216
[patent_doc_number] => 20040086787
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[patent_kind] => A1
[patent_issue_date] => 2004-05-06
[patent_title] => 'Alternating aperture phase shift photomask having plasma etched isotropic quartz features'
[patent_app_type] => new
[patent_app_number] => 10/288736
[patent_app_country] => US
[patent_app_date] => 2002-11-05
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/288736 | Alternating aperture phase shift photomask having plasma etched isotropic quartz features | Nov 4, 2002 | Abandoned |
Array
(
[id] => 988075
[patent_doc_number] => 06921630
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-07-26
[patent_title] => 'Photoresist substrate having robust adhesion'
[patent_app_type] => utility
[patent_app_number] => 10/285060
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[firstpage_image] =>[orig_patent_app_number] => 10285060
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/285060 | Photoresist substrate having robust adhesion | Oct 30, 2002 | Issued |
Array
(
[id] => 1085531
[patent_doc_number] => 06830875
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[patent_kind] => B2
[patent_issue_date] => 2004-12-14
[patent_title] => 'Forming a through hole in a photoimageable dielectric structure'
[patent_app_type] => B2
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[patent_app_country] => US
[patent_app_date] => 2002-10-07
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/266020 | Forming a through hole in a photoimageable dielectric structure | Oct 6, 2002 | Issued |
Array
(
[id] => 6655045
[patent_doc_number] => 20030077522
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[patent_issue_date] => 2003-04-24
[patent_title] => 'Graytone mask producing method, graytone mask and pattern transfer method'
[patent_app_type] => new
[patent_app_number] => 10/255069
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[patent_app_date] => 2002-09-26
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/255069 | Graytone mask producing method, graytone mask and pattern transfer method | Sep 25, 2002 | Issued |
Array
(
[id] => 6750207
[patent_doc_number] => 20030044727
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-06
[patent_title] => 'Method for manufacturing transparent soft mold for forming barrier ribs of PDP and method for forming barrier ribs using the same'
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[patent_app_number] => 10/222384
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/222384 | Method for manufacturing transparent soft mold for forming barrier ribs of PDP and method for forming barrier ribs using the same | Aug 15, 2002 | Abandoned |
Array
(
[id] => 1119294
[patent_doc_number] => 06797456
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[patent_issue_date] => 2004-09-28
[patent_title] => 'Dual-layer deep ultraviolet photoresist process and structure'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/211493 | Dual-layer deep ultraviolet photoresist process and structure | Jul 31, 2002 | Issued |
Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/195399 | Fabrication method of semiconductor integrated circuit device | Jul 15, 2002 | Issued |
Array
(
[id] => 1148353
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[patent_title] => 'Negative resist process with simultaneous development and silylation'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/186660 | Negative resist process with simultaneous development and silylation | Jun 30, 2002 | Issued |