
Hung Nguyen
Examiner (ID: 13829, Phone: (571)272-2124 , Office: P/2882 )
| Most Active Art Unit | 2882 |
| Art Unit(s) | 2851, 2882 |
| Total Applications | 3062 |
| Issued Applications | 2654 |
| Pending Applications | 133 |
| Abandoned Applications | 304 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6981884
[patent_doc_number] => 20050151953
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-14
[patent_title] => 'Maskless optical writer'
[patent_app_type] => utility
[patent_app_number] => 10/755470
[patent_app_country] => US
[patent_app_date] => 2004-01-13
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[pdf_file] => publications/A1/0151/20050151953.pdf
[firstpage_image] =>[orig_patent_app_number] => 10755470
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/755470 | Maskless optical writer | Jan 12, 2004 | Issued |
Array
(
[id] => 964516
[patent_doc_number] => 06950176
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-09-27
[patent_title] => 'Method and system for monitoring EUV lithography mask flatness'
[patent_app_type] => utility
[patent_app_number] => 10/755658
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[patent_app_date] => 2004-01-12
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/755658 | Method and system for monitoring EUV lithography mask flatness | Jan 11, 2004 | Issued |
Array
(
[id] => 1045044
[patent_doc_number] => 06867846
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[patent_kind] => B2
[patent_issue_date] => 2005-03-15
[patent_title] => 'Tailored reflecting diffractor for EUV lithographic system aberration measurement'
[patent_app_type] => utility
[patent_app_number] => 10/753557
[patent_app_country] => US
[patent_app_date] => 2004-01-09
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/753557 | Tailored reflecting diffractor for EUV lithographic system aberration measurement | Jan 8, 2004 | Issued |
Array
(
[id] => 969507
[patent_doc_number] => 06940586
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-09-06
[patent_title] => 'Exposure apparatus and method'
[patent_app_type] => utility
[patent_app_number] => 10/752120
[patent_app_country] => US
[patent_app_date] => 2004-01-05
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/752120 | Exposure apparatus and method | Jan 4, 2004 | Issued |
Array
(
[id] => 7255128
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[patent_title] => 'Self-cleaning method for semiconductor exposure apparatus'
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[firstpage_image] =>[orig_patent_app_number] => 10748240
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/748240 | Self-cleaning method for semiconductor exposure apparatus | Dec 30, 2003 | Issued |
Array
(
[id] => 7337135
[patent_doc_number] => 20040189972
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[patent_kind] => A1
[patent_issue_date] => 2004-09-30
[patent_title] => 'Lithographic apparatus, method of manufacturing a device, and device manufactured thereby'
[patent_app_type] => new
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Array
(
[id] => 7156272
[patent_doc_number] => 20050083498
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-04-21
[patent_title] => '[DYNAMIC MASK MODULE]'
[patent_app_type] => utility
[patent_app_number] => 10/707628
[patent_app_country] => US
[patent_app_date] => 2003-12-25
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 10707628
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/707628 | [DYNAMIC MASK MODULE] | Dec 24, 2003 | Abandoned |
Array
(
[id] => 7243492
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[patent_title] => 'Lithographic apparatus and device manufacturing method'
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[pdf_file] => publications/A1/0140/20050140962.pdf
[firstpage_image] =>[orig_patent_app_number] => 10744088
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/744088 | Lithographic apparatus and device manufacturing method | Dec 23, 2003 | Issued |
Array
(
[id] => 6995037
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[patent_title] => 'Lithographic apparatus and device manufacturing method'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/743271 | Lithographic apparatus and device manufacturing method | Dec 22, 2003 | Issued |
Array
(
[id] => 7378857
[patent_doc_number] => 20040179182
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-16
[patent_title] => 'Lithographic apparatus with debris suppression, and device manufacturing method'
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[patent_app_number] => 10/743270
[patent_app_country] => US
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Array
(
[id] => 775683
[patent_doc_number] => 07002663
[patent_country] => US
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[patent_title] => 'Both side projection exposure apparatus'
[patent_app_type] => utility
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[pdf_file] => patents/07/002/07002663.pdf
[firstpage_image] =>[orig_patent_app_number] => 10742806
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/742806 | Both side projection exposure apparatus | Dec 22, 2003 | Issued |
Array
(
[id] => 6995042
[patent_doc_number] => 20050134820
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[patent_title] => 'Method for exposing a substrate, patterning device, and lithographic apparatus'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/740830 | Method for exposing a substrate, patterning device, and lithographic apparatus | Dec 21, 2003 | Abandoned |
Array
(
[id] => 6995036
[patent_doc_number] => 20050134814
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Array
(
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Array
(
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Array
(
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Array
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Array
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Array
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