
Hung Nguyen
Examiner (ID: 13829, Phone: (571)272-2124 , Office: P/2882 )
| Most Active Art Unit | 2882 |
| Art Unit(s) | 2851, 2882 |
| Total Applications | 3062 |
| Issued Applications | 2654 |
| Pending Applications | 133 |
| Abandoned Applications | 304 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1015784
[patent_doc_number] => 06894765
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[patent_kind] => B2
[patent_issue_date] => 2005-05-17
[patent_title] => 'Methods and systems for controlling radiation beam characteristics for microlithographic processing'
[patent_app_type] => utility
[patent_app_number] => 10/684794
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/684794 | Methods and systems for controlling radiation beam characteristics for microlithographic processing | Oct 13, 2003 | Issued |
Array
(
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[patent_title] => 'Image forming apparatus'
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Array
(
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[patent_title] => 'Alignment system and projection exposure apparatus'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/677235 | Alignment system and projection exposure apparatus | Oct 2, 2003 | Issued |
Array
(
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[patent_doc_number] => 20050068514
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[patent_issue_date] => 2005-03-31
[patent_title] => 'METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION'
[patent_app_type] => utility
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Array
(
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[patent_issue_date] => 2005-08-23
[patent_title] => 'Radiation source, lithographic apparatus, and device manufacturing method'
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Array
(
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[patent_title] => 'Temperature adjusting system and exposure apparatus incorporating the same'
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Array
(
[id] => 1069892
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[patent_issue_date] => 2005-01-18
[patent_title] => 'Alignment system and methods for lithographic systems using at least two wavelengths'
[patent_app_type] => utility
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Array
(
[id] => 1048160
[patent_doc_number] => 06864952
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[patent_issue_date] => 2005-03-08
[patent_title] => 'Method of automatically evaluating images being processed in a photographic laboratory system'
[patent_app_type] => utility
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Array
(
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[patent_title] => 'Apparatus and method for retaining mirror, and mirror exchange method'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/661870 | Apparatus and method for retaining mirror, and mirror exchange method | Sep 10, 2003 | Issued |
Array
(
[id] => 1026235
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[patent_issue_date] => 2005-04-26
[patent_title] => 'Exposure apparatus and method of manufacturing a semiconductor device using the same'
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Array
(
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[patent_title] => 'Method and system for optimizing parameter value in exposure apparatus and exposure apparatus and method'
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Array
(
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Array
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Array
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Array
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Array
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Array
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Array
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