Search

Hung Nguyen

Examiner (ID: 13829, Phone: (571)272-2124 , Office: P/2882 )

Most Active Art Unit
2882
Art Unit(s)
2851, 2882
Total Applications
3062
Issued Applications
2654
Pending Applications
133
Abandoned Applications
304

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 11549548 [patent_doc_number] => 09618387 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-04-11 [patent_title] => 'Method for determining the phase angle and/or the thickness of a contamination layer at an optical element and EUV lithography apparatus' [patent_app_type] => utility [patent_app_number] => 14/808637 [patent_app_country] => US [patent_app_date] => 2015-07-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 7638 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 166 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14808637 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/808637
Method for determining the phase angle and/or the thickness of a contamination layer at an optical element and EUV lithography apparatus Jul 23, 2015 Issued
Array ( [id] => 11299273 [patent_doc_number] => 09507278 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-11-29 [patent_title] => 'Lithographic apparatus and device manufacturing method' [patent_app_type] => utility [patent_app_number] => 14/806395 [patent_app_country] => US [patent_app_date] => 2015-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 24 [patent_no_of_words] => 8582 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 148 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14806395 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/806395
Lithographic apparatus and device manufacturing method Jul 21, 2015 Issued
Array ( [id] => 11889466 [patent_doc_number] => 09760024 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-09-12 [patent_title] => 'Mask device, exposure apparatus and exposure method' [patent_app_type] => utility [patent_app_number] => 14/912801 [patent_app_country] => US [patent_app_date] => 2015-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 14 [patent_no_of_words] => 10068 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 195 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14912801 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/912801
Mask device, exposure apparatus and exposure method Jul 21, 2015 Issued
Array ( [id] => 10438307 [patent_doc_number] => 20150323319 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-11-12 [patent_title] => 'LITHOGRAPHIC PRINTING SYSTEM WITH PLACEMENT CORRECTIONS' [patent_app_type] => utility [patent_app_number] => 14/805283 [patent_app_country] => US [patent_app_date] => 2015-07-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5845 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14805283 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/805283
LITHOGRAPHIC PRINTING SYSTEM WITH PLACEMENT CORRECTIONS Jul 20, 2015 Abandoned
Array ( [id] => 11823492 [patent_doc_number] => 20170212429 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2017-07-27 [patent_title] => 'A LITHOGRAPHIC APPARATUS AND AN OBJECT POSITIONING SYSTEM' [patent_app_type] => utility [patent_app_number] => 15/329536 [patent_app_country] => US [patent_app_date] => 2015-07-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 15489 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15329536 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/329536
Lithographic apparatus and an object positioning system Jul 15, 2015 Issued
Array ( [id] => 11410352 [patent_doc_number] => 09557653 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-01-31 [patent_title] => 'Optical projection system' [patent_app_type] => utility [patent_app_number] => 14/792837 [patent_app_country] => US [patent_app_date] => 2015-07-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 12 [patent_no_of_words] => 16691 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 162 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14792837 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/792837
Optical projection system Jul 6, 2015 Issued
Array ( [id] => 13638819 [patent_doc_number] => 09846367 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-12-19 [patent_title] => Projection exposure apparatus with at least one manipulator [patent_app_type] => utility [patent_app_number] => 14/792758 [patent_app_country] => US [patent_app_date] => 2015-07-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 7360 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 117 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14792758 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/792758
Projection exposure apparatus with at least one manipulator Jul 6, 2015 Issued
Array ( [id] => 11251526 [patent_doc_number] => 09477025 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-10-25 [patent_title] => 'EUV light source for generating a used output beam for a projection exposure apparatus' [patent_app_type] => utility [patent_app_number] => 14/788075 [patent_app_country] => US [patent_app_date] => 2015-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 11 [patent_no_of_words] => 10723 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 159 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14788075 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/788075
EUV light source for generating a used output beam for a projection exposure apparatus Jun 29, 2015 Issued
Array ( [id] => 12432507 [patent_doc_number] => 09977348 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2018-05-22 [patent_title] => Lithographic apparatus and method [patent_app_type] => utility [patent_app_number] => 15/502466 [patent_app_country] => US [patent_app_date] => 2015-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 7 [patent_no_of_words] => 9265 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15502466 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/502466
Lithographic apparatus and method Jun 24, 2015 Issued
Array ( [id] => 10408453 [patent_doc_number] => 20150293462 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-10-15 [patent_title] => 'LITHOGRAPHY APPARATUS HAVING DUAL RETICLE EDGE MASKING ASSEMBLIES AND METHOD OF USE' [patent_app_type] => utility [patent_app_number] => 14/748543 [patent_app_country] => US [patent_app_date] => 2015-06-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5326 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14748543 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/748543
Lithography apparatus having dual reticle edge masking assemblies and method of use Jun 23, 2015 Issued
Array ( [id] => 10416445 [patent_doc_number] => 20150301455 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-10-22 [patent_title] => 'METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSITIVE SURFACE AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS' [patent_app_type] => utility [patent_app_number] => 14/747441 [patent_app_country] => US [patent_app_date] => 2015-06-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 24 [patent_no_of_words] => 26435 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14747441 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/747441
Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus Jun 22, 2015 Issued
Array ( [id] => 10401143 [patent_doc_number] => 20150286152 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-10-08 [patent_title] => 'METHOD FOR PREVENTING OR REDUCING CONTAMINATION OF AN IMMERSION TYPE PROJECTION APPARATUS AND AN IMMERSION TYPE LITHOGRAPHIC APPARATUS' [patent_app_type] => utility [patent_app_number] => 14/746605 [patent_app_country] => US [patent_app_date] => 2015-06-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 10870 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14746605 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/746605
Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus Jun 21, 2015 Issued
Array ( [id] => 11508035 [patent_doc_number] => 09599185 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-03-21 [patent_title] => 'Vibration control apparatus, lithography apparatus, and article manufacturing method' [patent_app_type] => utility [patent_app_number] => 14/745790 [patent_app_country] => US [patent_app_date] => 2015-06-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 5201 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 216 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14745790 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/745790
Vibration control apparatus, lithography apparatus, and article manufacturing method Jun 21, 2015 Issued
Array ( [id] => 11790820 [patent_doc_number] => 09400433 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-07-26 [patent_title] => 'Lithography illumination system' [patent_app_type] => utility [patent_app_number] => 14/745361 [patent_app_country] => US [patent_app_date] => 2015-06-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 8 [patent_no_of_words] => 2813 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 323 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14745361 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/745361
Lithography illumination system Jun 18, 2015 Issued
Array ( [id] => 10770691 [patent_doc_number] => 20160116847 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-04-28 [patent_title] => 'MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD' [patent_app_type] => utility [patent_app_number] => 14/745366 [patent_app_country] => US [patent_app_date] => 2015-06-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 13 [patent_no_of_words] => 9411 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14745366 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/745366
Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method Jun 18, 2015 Issued
Array ( [id] => 11226365 [patent_doc_number] => 09454085 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-09-27 [patent_title] => 'Illumination system of a microlithographic projection exposure apparatus' [patent_app_type] => utility [patent_app_number] => 14/743017 [patent_app_country] => US [patent_app_date] => 2015-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 7558 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14743017 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/743017
Illumination system of a microlithographic projection exposure apparatus Jun 17, 2015 Issued
Array ( [id] => 10716098 [patent_doc_number] => 20160062245 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-03-03 [patent_title] => 'METHOD FOR STRESS-ADJUSTED OPERATION OF A PROJECTION EXPOSURE SYSTEM AND CORRESPONDING PROJECTION EXPOSURE SYSTEM' [patent_app_type] => utility [patent_app_number] => 14/742176 [patent_app_country] => US [patent_app_date] => 2015-06-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 8794 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14742176 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/742176
Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system Jun 16, 2015 Issued
Array ( [id] => 11597939 [patent_doc_number] => 09645097 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-05-09 [patent_title] => 'In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning' [patent_app_type] => utility [patent_app_number] => 14/741866 [patent_app_country] => US [patent_app_date] => 2015-06-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 22 [patent_no_of_words] => 10075 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 214 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14741866 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/741866
In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning Jun 16, 2015 Issued
Array ( [id] => 10392228 [patent_doc_number] => 20150277235 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-10-01 [patent_title] => 'OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS' [patent_app_type] => utility [patent_app_number] => 14/737965 [patent_app_country] => US [patent_app_date] => 2015-06-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 4555 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14737965 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/737965
Optical system of a microlithographic projection exposure apparatus Jun 11, 2015 Issued
Array ( [id] => 10391378 [patent_doc_number] => 20150276385 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-10-01 [patent_title] => 'MINIMIZATION OF ABBE ERROR CAUSED BY TIP OR TILT BETWEEN AN ENCODER HEAD AND A WAFER STAGE FOR ARBITRARY LOCATION OF A CENTER OF ROTATION' [patent_app_type] => utility [patent_app_number] => 14/736118 [patent_app_country] => US [patent_app_date] => 2015-06-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 12945 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14736118 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/736118
Minimization of Abbe error caused by tip or tilt between an encoder head and a wafer stage for arbitrary location of a center of rotation Jun 9, 2015 Issued
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