
Hung Nguyen
Examiner (ID: 13829, Phone: (571)272-2124 , Office: P/2882 )
| Most Active Art Unit | 2882 |
| Art Unit(s) | 2851, 2882 |
| Total Applications | 3062 |
| Issued Applications | 2654 |
| Pending Applications | 133 |
| Abandoned Applications | 304 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5543955
[patent_doc_number] => 20090153832
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-06-18
[patent_title] => 'APPARATUS AND METHOD FOR ISOLATING VIBRATIONS IN A LITHOGRAPHY MACHINE USING TWO ACTIVE CONTROL UNITS'
[patent_app_type] => utility
[patent_app_number] => 11/959005
[patent_app_country] => US
[patent_app_date] => 2007-12-18
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0153/20090153832.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/959005 | APPARATUS AND METHOD FOR ISOLATING VIBRATIONS IN A LITHOGRAPHY MACHINE USING TWO ACTIVE CONTROL UNITS | Dec 17, 2007 | Abandoned |
Array
(
[id] => 4547021
[patent_doc_number] => 07876419
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[patent_issue_date] => 2011-01-25
[patent_title] => 'Exposure apparatus and device manufacturing method'
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Array
(
[id] => 594977
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[patent_title] => 'Printing a mask with maximum possible process window through adjustment of the source distribution'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/957602 | Printing a mask with maximum possible process window through adjustment of the source distribution | Dec 16, 2007 | Issued |
Array
(
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[patent_title] => 'Printing a Mask with Maximum Possible Process Window Through Adjustment of the Source Distribution'
[patent_app_type] => utility
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Array
(
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[patent_title] => 'Lithographic apparatus, immersion projection apparatus and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 12/000774
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Array
(
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[patent_issue_date] => 2008-05-15
[patent_title] => 'EXPOSURE APPARATUS EQUIPPED WITH INTERFEROMETER AND EXPOSURE APPARATUS USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 11/956747
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/956747 | Exposure apparatus equipped with interferometer and exposure apparatus using the same | Dec 13, 2007 | Issued |
Array
(
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[patent_title] => 'Methods and systems to compensate for a stitching disturbance of a printed pattern'
[patent_app_type] => utility
[patent_app_number] => 12/000522
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/000522 | Methods and systems to compensate for a stitching disturbance of a printed pattern | Dec 12, 2007 | Issued |
Array
(
[id] => 370582
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[patent_issue_date] => 2009-01-13
[patent_title] => 'Exposure apparatus and device manufacturing method'
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Array
(
[id] => 55115
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[patent_title] => 'Methods and systems to compensate for a stitching disturbance of a printed pattern'
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Array
(
[id] => 5347311
[patent_doc_number] => 20090002672
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[patent_kind] => A1
[patent_issue_date] => 2009-01-01
[patent_title] => 'EXPOSURE APPARATUS HAVING THE SAME ID BIAS'
[patent_app_type] => utility
[patent_app_number] => 11/952448
[patent_app_country] => US
[patent_app_date] => 2007-12-07
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/952448 | Exposure apparatus having the same ID bias | Dec 6, 2007 | Issued |
Array
(
[id] => 4864924
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[patent_title] => 'METHODS AND APPARATUS FOR MULTI-EXPOSURE PATTERNING'
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Array
(
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Array
(
[id] => 257153
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Array
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Array
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Array
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Array
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