
Hung Nguyen
Examiner (ID: 13829, Phone: (571)272-2124 , Office: P/2882 )
| Most Active Art Unit | 2882 |
| Art Unit(s) | 2851, 2882 |
| Total Applications | 3062 |
| Issued Applications | 2654 |
| Pending Applications | 133 |
| Abandoned Applications | 304 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 364357
[patent_doc_number] => 07483122
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-01-27
[patent_title] => 'Projection optical system, exposure apparatus, and exposure method'
[patent_app_type] => utility
[patent_app_number] => 11/984192
[patent_app_country] => US
[patent_app_date] => 2007-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 13
[patent_no_of_words] => 8766
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/483/07483122.pdf
[firstpage_image] =>[orig_patent_app_number] => 11984192
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/984192 | Projection optical system, exposure apparatus, and exposure method | Nov 13, 2007 | Issued |
Array
(
[id] => 6192
[patent_doc_number] => 07817245
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-10-19
[patent_title] => 'Lithographic apparatus and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 11/984060
[patent_app_country] => US
[patent_app_date] => 2007-11-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/817/07817245.pdf
[firstpage_image] =>[orig_patent_app_number] => 11984060
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/984060 | Lithographic apparatus and device manufacturing method | Nov 12, 2007 | Issued |
Array
(
[id] => 4479297
[patent_doc_number] => RE042118
[patent_country] => US
[patent_kind] => E1
[patent_issue_date] => 2011-02-08
[patent_title] => 'Projection system for EUV lithography'
[patent_app_type] => reissue
[patent_app_number] => 11/981511
[patent_app_country] => US
[patent_app_date] => 2007-10-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 13
[patent_no_of_words] => 14298
[patent_no_of_claims] => 35
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/RE/042/RE042118.pdf
[firstpage_image] =>[orig_patent_app_number] => 11981511
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/981511 | Projection system for EUV lithography | Oct 30, 2007 | Issued |
| 11/981510 | Illumination system particularly for microlithography | Oct 30, 2007 | Abandoned |
Array
(
[id] => 7969597
[patent_doc_number] => 07940373
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-05-10
[patent_title] => 'Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same'
[patent_app_type] => utility
[patent_app_number] => 11/925014
[patent_app_country] => US
[patent_app_date] => 2007-10-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 17
[patent_no_of_words] => 6451
[patent_no_of_claims] => 5
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/940/07940373.pdf
[firstpage_image] =>[orig_patent_app_number] => 11925014
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/925014 | Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same | Oct 25, 2007 | Issued |
Array
(
[id] => 586342
[patent_doc_number] => 07456934
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-11-25
[patent_title] => 'Exposure apparatus and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 11/877482
[patent_app_country] => US
[patent_app_date] => 2007-10-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_no_of_words] => 5281
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/456/07456934.pdf
[firstpage_image] =>[orig_patent_app_number] => 11877482
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/877482 | Exposure apparatus and device manufacturing method | Oct 22, 2007 | Issued |
Array
(
[id] => 4579760
[patent_doc_number] => 07859643
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-12-28
[patent_title] => 'Apparatus for moving curved-surface mirror, exposure apparatus and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 11/877147
[patent_app_country] => US
[patent_app_date] => 2007-10-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 5216
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/859/07859643.pdf
[firstpage_image] =>[orig_patent_app_number] => 11877147
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/877147 | Apparatus for moving curved-surface mirror, exposure apparatus and device manufacturing method | Oct 22, 2007 | Issued |
Array
(
[id] => 4914001
[patent_doc_number] => 20080094600
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-24
[patent_title] => 'ILLUMINATION DEVICE AND MASK FOR MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEM, AND RELATED METHODS'
[patent_app_type] => utility
[patent_app_number] => 11/875352
[patent_app_country] => US
[patent_app_date] => 2007-10-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 6715
[patent_no_of_claims] => 25
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0094/20080094600.pdf
[firstpage_image] =>[orig_patent_app_number] => 11875352
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/875352 | ILLUMINATION DEVICE AND MASK FOR MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEM, AND RELATED METHODS | Oct 18, 2007 | Abandoned |
Array
(
[id] => 35715
[patent_doc_number] => 07787103
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-08-31
[patent_title] => 'Projection exposure apparatus, optical member, and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 11/873724
[patent_app_country] => US
[patent_app_date] => 2007-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_no_of_words] => 6915
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/787/07787103.pdf
[firstpage_image] =>[orig_patent_app_number] => 11873724
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/873724 | Projection exposure apparatus, optical member, and device manufacturing method | Oct 16, 2007 | Issued |
Array
(
[id] => 5283330
[patent_doc_number] => 20090097004
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-04-16
[patent_title] => 'Lithography Apparatus, Masks for Non-Telecentric Exposure and Methods of Manufacturing Integrated Circuits'
[patent_app_type] => utility
[patent_app_number] => 11/873128
[patent_app_country] => US
[patent_app_date] => 2007-10-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
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[pdf_file] => publications/A1/0097/20090097004.pdf
[firstpage_image] =>[orig_patent_app_number] => 11873128
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/873128 | Lithography Apparatus, Masks for Non-Telecentric Exposure and Methods of Manufacturing Integrated Circuits | Oct 15, 2007 | Abandoned |
Array
(
[id] => 4769920
[patent_doc_number] => 20080055578
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-06
[patent_title] => 'Roll printer with decomposed raster scan and X-Y distortion correction'
[patent_app_type] => utility
[patent_app_number] => 11/974108
[patent_app_country] => US
[patent_app_date] => 2007-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 18
[patent_no_of_words] => 9321
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[pdf_file] => publications/A1/0055/20080055578.pdf
[firstpage_image] =>[orig_patent_app_number] => 11974108
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/974108 | Roll printer with decomposed raster scan and X-Y distortion correction | Oct 10, 2007 | Abandoned |
Array
(
[id] => 5349220
[patent_doc_number] => 20090004581
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-01-01
[patent_title] => 'Exposure apparatus, exposure method and optical proximity correction method'
[patent_app_type] => utility
[patent_app_number] => 11/907191
[patent_app_country] => US
[patent_app_date] => 2007-10-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
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[patent_no_of_words] => 8941
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[pdf_file] => publications/A1/0004/20090004581.pdf
[firstpage_image] =>[orig_patent_app_number] => 11907191
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/907191 | Exposure apparatus, exposure method and optical proximity correction method | Oct 9, 2007 | Abandoned |
Array
(
[id] => 4691779
[patent_doc_number] => 20080084549
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-10
[patent_title] => 'HIGH REFRACTIVE INDEX MEDIA FOR IMMERSION LITHOGRAPHY AND METHOD OF IMMERSION LITHOGRAPHY USING SAME'
[patent_app_type] => utility
[patent_app_number] => 11/869059
[patent_app_country] => US
[patent_app_date] => 2007-10-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => publications/A1/0084/20080084549.pdf
[firstpage_image] =>[orig_patent_app_number] => 11869059
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/869059 | HIGH REFRACTIVE INDEX MEDIA FOR IMMERSION LITHOGRAPHY AND METHOD OF IMMERSION LITHOGRAPHY USING SAME | Oct 8, 2007 | Abandoned |
Array
(
[id] => 7989977
[patent_doc_number] => 08077291
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-12-13
[patent_title] => 'Substrate placement in immersion lithography'
[patent_app_type] => utility
[patent_app_number] => 11/907045
[patent_app_country] => US
[patent_app_date] => 2007-10-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[pdf_file] => patents/08/077/08077291.pdf
[firstpage_image] =>[orig_patent_app_number] => 11907045
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/907045 | Substrate placement in immersion lithography | Oct 8, 2007 | Issued |
Array
(
[id] => 7979655
[patent_doc_number] => 08072580
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-12-06
[patent_title] => 'Maskless exposure apparatus and method of manufacturing substrate for display using the same'
[patent_app_type] => utility
[patent_app_number] => 11/867725
[patent_app_country] => US
[patent_app_date] => 2007-10-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/08/072/08072580.pdf
[firstpage_image] =>[orig_patent_app_number] => 11867725
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/867725 | Maskless exposure apparatus and method of manufacturing substrate for display using the same | Oct 4, 2007 | Issued |
Array
(
[id] => 4491480
[patent_doc_number] => 07884922
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-02-08
[patent_title] => 'Illumination system for microlithography'
[patent_app_type] => utility
[patent_app_number] => 11/860193
[patent_app_country] => US
[patent_app_date] => 2007-09-24
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/884/07884922.pdf
[firstpage_image] =>[orig_patent_app_number] => 11860193
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/860193 | Illumination system for microlithography | Sep 23, 2007 | Issued |
Array
(
[id] => 4831425
[patent_doc_number] => 20080129971
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-06-05
[patent_title] => 'EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE'
[patent_app_type] => utility
[patent_app_number] => 11/859541
[patent_app_country] => US
[patent_app_date] => 2007-09-21
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0129/20080129971.pdf
[firstpage_image] =>[orig_patent_app_number] => 11859541
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/859541 | Exposure apparatus and method for manufacturing device | Sep 20, 2007 | Issued |
Array
(
[id] => 66091
[patent_doc_number] => 07760329
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-07-20
[patent_title] => 'Optimized optical lithography illumination source for use during the manufacture of a semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/858419
[patent_app_country] => US
[patent_app_date] => 2007-09-20
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/858419 | Optimized optical lithography illumination source for use during the manufacture of a semiconductor device | Sep 19, 2007 | Issued |
Array
(
[id] => 4931397
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[patent_issue_date] => 2008-01-03
[patent_title] => 'MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS'
[patent_app_type] => utility
[patent_app_number] => 11/855526
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[firstpage_image] =>[orig_patent_app_number] => 11855526
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/855526 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS | Sep 13, 2007 | Abandoned |
Array
(
[id] => 5269627
[patent_doc_number] => 20090073402
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[patent_kind] => A1
[patent_issue_date] => 2009-03-19
[patent_title] => 'LITHOGRAPHIC APPARATUS AND EXPOSURE METHOD'
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[patent_app_number] => 11/898802
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[firstpage_image] =>[orig_patent_app_number] => 11898802
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/898802 | Lithographic apparatus and exposure method | Sep 13, 2007 | Issued |