
Hung Nguyen
Examiner (ID: 13829, Phone: (571)272-2124 , Office: P/2882 )
| Most Active Art Unit | 2882 |
| Art Unit(s) | 2851, 2882 |
| Total Applications | 3062 |
| Issued Applications | 2654 |
| Pending Applications | 133 |
| Abandoned Applications | 304 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 878579
[patent_doc_number] => 07359036
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-04-15
[patent_title] => 'Imaging system, in particular for a microlithographic projection exposure apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/441482
[patent_app_country] => US
[patent_app_date] => 2006-05-26
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[pdf_file] => patents/07/359/07359036.pdf
[firstpage_image] =>[orig_patent_app_number] => 11441482
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/441482 | Imaging system, in particular for a microlithographic projection exposure apparatus | May 25, 2006 | Issued |
Array
(
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[patent_doc_number] => 07295286
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[patent_issue_date] => 2007-11-13
[patent_title] => 'Exposure device and method of exposure'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/439113 | Exposure device and method of exposure | May 23, 2006 | Issued |
Array
(
[id] => 425889
[patent_doc_number] => 07271873
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[patent_kind] => B2
[patent_issue_date] => 2007-09-18
[patent_title] => 'Lithographic apparatus and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 11/437745
[patent_app_country] => US
[patent_app_date] => 2006-05-22
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/437745 | Lithographic apparatus and device manufacturing method | May 21, 2006 | Issued |
Array
(
[id] => 5027023
[patent_doc_number] => 20070268469
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[patent_kind] => A1
[patent_issue_date] => 2007-11-22
[patent_title] => 'Apparatus and Method for Particle Monitoring in Immersion Lithography'
[patent_app_type] => utility
[patent_app_number] => 11/383912
[patent_app_country] => US
[patent_app_date] => 2006-05-17
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[firstpage_image] =>[orig_patent_app_number] => 11383912
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/383912 | Apparatus and method for particle monitoring in immersion lithography | May 16, 2006 | Issued |
Array
(
[id] => 5700159
[patent_doc_number] => 20060216844
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[patent_issue_date] => 2006-09-28
[patent_title] => 'Optimized optical lithography illumination source for use during the manufacture of a semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/435796
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/435796 | Optimized optical lithography illumination source for use during the manufacture of a semiconductor device | May 15, 2006 | Abandoned |
Array
(
[id] => 5288976
[patent_doc_number] => 20090021706
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[patent_kind] => A1
[patent_issue_date] => 2009-01-22
[patent_title] => 'Immersion fluid containment system and method for immersion lithogtraphy'
[patent_app_type] => utility
[patent_app_number] => 11/921228
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/921228 | Immersion fluid containment system and method for immersion lithogtraphy | May 15, 2006 | Abandoned |
Array
(
[id] => 613731
[patent_doc_number] => 07148956
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[patent_issue_date] => 2006-12-12
[patent_title] => 'Exposure method'
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[patent_app_number] => 11/433402
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 11433402
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Array
(
[id] => 4806639
[patent_doc_number] => 20080170217
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[patent_kind] => A1
[patent_issue_date] => 2008-07-17
[patent_title] => 'Optical System of a Microlithographic Projection Exposure Apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/911899
[patent_app_country] => US
[patent_app_date] => 2006-05-13
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/911899 | Optical System of a Microlithographic Projection Exposure Apparatus | May 12, 2006 | Abandoned |
Array
(
[id] => 5702588
[patent_doc_number] => 20060191634
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-08-31
[patent_title] => 'APPARATUS FOR WAFER PATTERNING TO REDUCE EDGE EXCLUSION ZONE'
[patent_app_type] => utility
[patent_app_number] => 11/383171
[patent_app_country] => US
[patent_app_date] => 2006-05-12
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[firstpage_image] =>[orig_patent_app_number] => 11383171
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/383171 | Apparatus for wafer patterning to reduce edge exclusion zone | May 11, 2006 | Issued |
Array
(
[id] => 5698460
[patent_doc_number] => 20060215144
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[patent_kind] => A1
[patent_issue_date] => 2006-09-28
[patent_title] => 'Stage drive method, stage apparatus, and exposure apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/432508
[patent_app_country] => US
[patent_app_date] => 2006-05-12
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/432508 | Stage drive method, stage apparatus, and exposure apparatus | May 11, 2006 | Abandoned |
Array
(
[id] => 8084111
[patent_doc_number] => 08149381
[patent_country] => US
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[patent_issue_date] => 2012-04-03
[patent_title] => 'Optical element and exposure apparatus'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/415160 | Optical element and exposure apparatus | May 1, 2006 | Issued |
Array
(
[id] => 5335425
[patent_doc_number] => 20090051889
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[patent_title] => 'Optical element driving apparatus, projection optical system, exposure apparatus and device manufacturing method'
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Array
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Array
(
[id] => 6218465
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[patent_title] => 'Liquid Immersion Lithography System Comprising a Tilted Showerhead Relative to a Substrate'
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Array
(
[id] => 412813
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[patent_title] => 'Roll printer with decomposed raster scan and X-Y distortion correction'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/406955 | Roll printer with decomposed raster scan and X-Y distortion correction | Apr 17, 2006 | Issued |
Array
(
[id] => 5918854
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Array
(
[id] => 4811594
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[patent_title] => 'Projection Exposure System, Method For Manufacturing a Micro-Structured Structural Member by the Aid of Such a Projection Exposure System and Polarization-Optical Element Adapted for Use in Such a System'
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Array
(
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Array
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/395307 | Print production system | Apr 2, 2006 | Issued |