
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 777087
[patent_doc_number] => 06998217
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-02-14
[patent_title] => 'Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels'
[patent_app_type] => utility
[patent_app_number] => 10/326953
[patent_app_country] => US
[patent_app_date] => 2003-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 18
[patent_no_of_words] => 7132
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 89
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/998/06998217.pdf
[firstpage_image] =>[orig_patent_app_number] => 10326953
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/326953 | Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels | Jan 5, 2003 | Issued |
Array
(
[id] => 7675447
[patent_doc_number] => 20040126671
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-07-01
[patent_title] => 'Structure and process for a pellicle membrane for 157 nanometer lithography'
[patent_app_type] => new
[patent_app_number] => 10/334297
[patent_app_country] => US
[patent_app_date] => 2002-12-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3495
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0126/20040126671.pdf
[firstpage_image] =>[orig_patent_app_number] => 10334297
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/334297 | Structure and process for a pellicle membrane for 157 nanometer lithography | Dec 30, 2002 | Issued |
Array
(
[id] => 1040437
[patent_doc_number] => 06869734
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-03-22
[patent_title] => 'EUV reflective mask having a carbon film and a method of making such a mask'
[patent_app_type] => utility
[patent_app_number] => 10/331681
[patent_app_country] => US
[patent_app_date] => 2002-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 2360
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/869/06869734.pdf
[firstpage_image] =>[orig_patent_app_number] => 10331681
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/331681 | EUV reflective mask having a carbon film and a method of making such a mask | Dec 29, 2002 | Issued |
Array
(
[id] => 1005209
[patent_doc_number] => 06905801
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-06-14
[patent_title] => 'High performance EUV mask'
[patent_app_type] => utility
[patent_app_number] => 10/334175
[patent_app_country] => US
[patent_app_date] => 2002-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 3321
[patent_no_of_claims] => 27
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/905/06905801.pdf
[firstpage_image] =>[orig_patent_app_number] => 10334175
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/334175 | High performance EUV mask | Dec 27, 2002 | Issued |
Array
(
[id] => 707167
[patent_doc_number] => 07060398
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-06-13
[patent_title] => 'Photomask, method for producing the same, and method for forming pattern using the photomask'
[patent_app_type] => utility
[patent_app_number] => 10/474336
[patent_app_country] => US
[patent_app_date] => 2002-12-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 30
[patent_figures_cnt] => 113
[patent_no_of_words] => 26724
[patent_no_of_claims] => 40
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 133
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/060/07060398.pdf
[firstpage_image] =>[orig_patent_app_number] => 10474336
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/474336 | Photomask, method for producing the same, and method for forming pattern using the photomask | Dec 23, 2002 | Issued |
Array
(
[id] => 1046626
[patent_doc_number] => 06864020
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-03-08
[patent_title] => 'Chromeless phase shift mask using non-linear optical materials'
[patent_app_type] => utility
[patent_app_number] => 10/328346
[patent_app_country] => US
[patent_app_date] => 2002-12-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 3980
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/864/06864020.pdf
[firstpage_image] =>[orig_patent_app_number] => 10328346
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/328346 | Chromeless phase shift mask using non-linear optical materials | Dec 23, 2002 | Issued |
Array
(
[id] => 6791824
[patent_doc_number] => 20030087168
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-08
[patent_title] => 'Reticle cleaning without damaging pellicle'
[patent_app_type] => new
[patent_app_number] => 10/328771
[patent_app_country] => US
[patent_app_date] => 2002-12-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3961
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0087/20030087168.pdf
[firstpage_image] =>[orig_patent_app_number] => 10328771
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/328771 | Reticle cleaning without damaging pellicle | Dec 22, 2002 | Issued |
Array
(
[id] => 6769782
[patent_doc_number] => 20030215722
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-20
[patent_title] => 'Photomask repair method and apparatus'
[patent_app_type] => new
[patent_app_number] => 10/326112
[patent_app_country] => US
[patent_app_date] => 2002-12-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4303
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0215/20030215722.pdf
[firstpage_image] =>[orig_patent_app_number] => 10326112
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/326112 | Photomask repair method and apparatus | Dec 22, 2002 | Issued |
Array
(
[id] => 7469437
[patent_doc_number] => 20040121243
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-24
[patent_title] => 'Damage-resistant coatings for EUV lithography components'
[patent_app_type] => new
[patent_app_number] => 10/327599
[patent_app_country] => US
[patent_app_date] => 2002-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 1663
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[pdf_file] => publications/A1/0121/20040121243.pdf
[firstpage_image] =>[orig_patent_app_number] => 10327599
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/327599 | Damage-resistant coatings for EUV lithography components | Dec 20, 2002 | Issued |
Array
(
[id] => 7469435
[patent_doc_number] => 20040121242
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-24
[patent_title] => 'Sidelobe correction for attenuated phase shift masks'
[patent_app_type] => new
[patent_app_number] => 10/327451
[patent_app_country] => US
[patent_app_date] => 2002-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 1350
[patent_no_of_claims] => 15
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0121/20040121242.pdf
[firstpage_image] =>[orig_patent_app_number] => 10327451
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/327451 | Sidelobe correction for attenuated phase shift masks | Dec 19, 2002 | Issued |
Array
(
[id] => 1239181
[patent_doc_number] => 06686103
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-02-03
[patent_title] => 'Fused silica pellicle'
[patent_app_type] => B2
[patent_app_number] => 10/322858
[patent_app_country] => US
[patent_app_date] => 2002-12-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 1819
[patent_no_of_claims] => 4
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/686/06686103.pdf
[firstpage_image] =>[orig_patent_app_number] => 10322858
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/322858 | Fused silica pellicle | Dec 17, 2002 | Issued |
Array
(
[id] => 6658774
[patent_doc_number] => 20030134207
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-07-17
[patent_title] => 'Alternating phase shift mask'
[patent_app_type] => new
[patent_app_number] => 10/320243
[patent_app_country] => US
[patent_app_date] => 2002-12-16
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0134/20030134207.pdf
[firstpage_image] =>[orig_patent_app_number] => 10320243
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/320243 | Alternating phase shift mask | Dec 15, 2002 | Issued |
Array
(
[id] => 1053028
[patent_doc_number] => 06858355
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-02-22
[patent_title] => 'Mask and method for defining a guard ring pattern'
[patent_app_type] => utility
[patent_app_number] => 10/319076
[patent_app_country] => US
[patent_app_date] => 2002-12-13
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/858/06858355.pdf
[firstpage_image] =>[orig_patent_app_number] => 10319076
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/319076 | Mask and method for defining a guard ring pattern | Dec 12, 2002 | Issued |
Array
(
[id] => 7160760
[patent_doc_number] => 20050084767
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-04-21
[patent_title] => 'Method and system for reparing defected photomasks'
[patent_app_type] => utility
[patent_app_number] => 10/504866
[patent_app_country] => US
[patent_app_date] => 2002-12-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0084/20050084767.pdf
[firstpage_image] =>[orig_patent_app_number] => 10504866
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/504866 | Method and system for repairing defected photomasks | Dec 11, 2002 | Issued |
Array
(
[id] => 951209
[patent_doc_number] => 06960411
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-11-01
[patent_title] => 'Mask with extended mask clear-out window and method of dummy exposure using the same'
[patent_app_type] => utility
[patent_app_number] => 10/314959
[patent_app_country] => US
[patent_app_date] => 2002-12-10
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[pdf_file] => patents/06/960/06960411.pdf
[firstpage_image] =>[orig_patent_app_number] => 10314959
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/314959 | Mask with extended mask clear-out window and method of dummy exposure using the same | Dec 9, 2002 | Issued |
Array
(
[id] => 6825143
[patent_doc_number] => 20030235765
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-12-25
[patent_title] => 'Photo mask and method of manufacturing the same, and method of forming photosensitive film pattern of using the photo mask'
[patent_app_type] => new
[patent_app_number] => 10/310868
[patent_app_country] => US
[patent_app_date] => 2002-12-06
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[pdf_file] => publications/A1/0235/20030235765.pdf
[firstpage_image] =>[orig_patent_app_number] => 10310868
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/310868 | Photo mask and method of manufacturing the same, and method of forming photosensitive film pattern of using the photo mask | Dec 5, 2002 | Issued |
Array
(
[id] => 7134142
[patent_doc_number] => 20040043306
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-04
[patent_title] => 'Phase shift mask'
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[patent_app_number] => 10/302826
[patent_app_country] => US
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[pdf_file] => publications/A1/0043/20040043306.pdf
[firstpage_image] =>[orig_patent_app_number] => 10302826
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/302826 | Phase shift mask | Nov 24, 2002 | Abandoned |
Array
(
[id] => 1192638
[patent_doc_number] => 06730445
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[patent_issue_date] => 2004-05-04
[patent_title] => 'Attenuated embedded phase shift photomask blanks'
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[patent_app_number] => 10/303341
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[pdf_file] => patents/06/730/06730445.pdf
[firstpage_image] =>[orig_patent_app_number] => 10303341
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/303341 | Attenuated embedded phase shift photomask blanks | Nov 21, 2002 | Issued |
Array
(
[id] => 1009220
[patent_doc_number] => 06899981
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-05-31
[patent_title] => 'Photomask and method for detecting violations in a mask pattern file using a manufacturing rule'
[patent_app_type] => utility
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[pdf_file] => patents/06/899/06899981.pdf
[firstpage_image] =>[orig_patent_app_number] => 10301195
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/301195 | Photomask and method for detecting violations in a mask pattern file using a manufacturing rule | Nov 20, 2002 | Issued |
Array
(
[id] => 6724869
[patent_doc_number] => 20030207181
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[patent_issue_date] => 2003-11-06
[patent_title] => 'Mask for estimating aberration in projection lens system of exposure apparatus'
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[patent_app_number] => 10/295843
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[pdf_file] => publications/A1/0207/20030207181.pdf
[firstpage_image] =>[orig_patent_app_number] => 10295843
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/295843 | Mask for estimating aberration in projection lens system of exposure apparatus | Nov 17, 2002 | Issued |