
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7165807
[patent_doc_number] => 20040076892
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-22
[patent_title] => 'Method and apparatus for using a complementary mask to clear phase conflicts on a phase shifting mask'
[patent_app_type] => new
[patent_app_number] => 10/294253
[patent_app_country] => US
[patent_app_date] => 2002-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 2595
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 58
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0076/20040076892.pdf
[firstpage_image] =>[orig_patent_app_number] => 10294253
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/294253 | Method and apparatus for using a complementary mask to clear phase conflicts on a phase shifting mask | Nov 13, 2002 | Issued |
Array
(
[id] => 619794
[patent_doc_number] => 07141338
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-11-28
[patent_title] => 'Sub-resolution sized assist features'
[patent_app_type] => utility
[patent_app_number] => 10/292169
[patent_app_country] => US
[patent_app_date] => 2002-11-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 3020
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 4
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/141/07141338.pdf
[firstpage_image] =>[orig_patent_app_number] => 10292169
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/292169 | Sub-resolution sized assist features | Nov 11, 2002 | Issued |
Array
(
[id] => 1062622
[patent_doc_number] => 06849365
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-02-01
[patent_title] => 'Reflection mask for EUV-lithography and method for fabricating the reflection mask'
[patent_app_type] => utility
[patent_app_number] => 10/292866
[patent_app_country] => US
[patent_app_date] => 2002-11-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 21
[patent_no_of_words] => 5618
[patent_no_of_claims] => 13
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/849/06849365.pdf
[firstpage_image] =>[orig_patent_app_number] => 10292866
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/292866 | Reflection mask for EUV-lithography and method for fabricating the reflection mask | Nov 11, 2002 | Issued |
Array
(
[id] => 788039
[patent_doc_number] => 06986971
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-01-17
[patent_title] => 'Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same'
[patent_app_type] => utility
[patent_app_number] => 10/290693
[patent_app_country] => US
[patent_app_date] => 2002-11-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 9939
[patent_no_of_claims] => 29
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 57
[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/986/06986971.pdf
[firstpage_image] =>[orig_patent_app_number] => 10290693
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/290693 | Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same | Nov 7, 2002 | Issued |
Array
(
[id] => 1014438
[patent_doc_number] => 06893780
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-05-17
[patent_title] => 'Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern'
[patent_app_type] => utility
[patent_app_number] => 10/290574
[patent_app_country] => US
[patent_app_date] => 2002-11-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 4240
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/893/06893780.pdf
[firstpage_image] =>[orig_patent_app_number] => 10290574
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/290574 | Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern | Nov 7, 2002 | Issued |
Array
(
[id] => 1205068
[patent_doc_number] => 06716558
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-04-06
[patent_title] => 'Transparent phase shift mask for fabrication of small feature sizes'
[patent_app_type] => B1
[patent_app_number] => 10/291116
[patent_app_country] => US
[patent_app_date] => 2002-11-08
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 7514
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/716/06716558.pdf
[firstpage_image] =>[orig_patent_app_number] => 10291116
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/291116 | Transparent phase shift mask for fabrication of small feature sizes | Nov 7, 2002 | Issued |
Array
(
[id] => 6801013
[patent_doc_number] => 20030096177
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-22
[patent_title] => 'Levenson phase shift mask and method for forming fine pattern by using the same'
[patent_app_type] => new
[patent_app_number] => 10/277512
[patent_app_country] => US
[patent_app_date] => 2002-10-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_no_of_words] => 3187
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0096/20030096177.pdf
[firstpage_image] =>[orig_patent_app_number] => 10277512
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/277512 | Levenson phase shift mask and method for forming fine pattern by using the same | Oct 21, 2002 | Issued |
Array
(
[id] => 1107157
[patent_doc_number] => 06808850
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-10-26
[patent_title] => 'Performing optical proximity correction on trim-level segments not abutting features to be printed'
[patent_app_type] => B2
[patent_app_number] => 10/277250
[patent_app_country] => US
[patent_app_date] => 2002-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 4022
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/808/06808850.pdf
[firstpage_image] =>[orig_patent_app_number] => 10277250
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/277250 | Performing optical proximity correction on trim-level segments not abutting features to be printed | Oct 20, 2002 | Issued |
Array
(
[id] => 6655065
[patent_doc_number] => 20030077525
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-04-24
[patent_title] => 'Photomask and method for manufacturing the photomask'
[patent_app_type] => new
[patent_app_number] => 10/273759
[patent_app_country] => US
[patent_app_date] => 2002-10-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 1939
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[pdf_file] => publications/A1/0077/20030077525.pdf
[firstpage_image] =>[orig_patent_app_number] => 10273759
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/273759 | Photomask and method for manufacturing the photomask | Oct 17, 2002 | Issued |
Array
(
[id] => 7235343
[patent_doc_number] => 20040073884
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-15
[patent_title] => 'Phase shifting mask topography effect correction based on near-field image properties'
[patent_app_type] => new
[patent_app_number] => 10/268874
[patent_app_country] => US
[patent_app_date] => 2002-10-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[patent_no_of_words] => 5641
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[pdf_file] => publications/A1/0073/20040073884.pdf
[firstpage_image] =>[orig_patent_app_number] => 10268874
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/268874 | Phase shifting mask topography effect correction based on near-field image properties | Oct 8, 2002 | Issued |
Array
(
[id] => 7448000
[patent_doc_number] => 20040067420
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-08
[patent_title] => 'Reduced-stress, electrostatically chuckable reticles for use in extreme ultraviolet and soft X-ray microlithography apparatus and methods'
[patent_app_type] => new
[patent_app_number] => 10/264795
[patent_app_country] => US
[patent_app_date] => 2002-10-03
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0067/20040067420.pdf
[firstpage_image] =>[orig_patent_app_number] => 10264795
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/264795 | Reduced-stress, electrostatically chuckable reticles for use in extreme ultraviolet and soft X-ray microlithography apparatus and methods | Oct 2, 2002 | Abandoned |
Array
(
[id] => 7612981
[patent_doc_number] => 06902852
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-06-07
[patent_title] => 'Pattern transfer method using a mask and half tone mask'
[patent_app_type] => utility
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[firstpage_image] =>[orig_patent_app_number] => 10260532
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/260532 | Pattern transfer method using a mask and half tone mask | Sep 30, 2002 | Issued |
Array
(
[id] => 6801012
[patent_doc_number] => 20030096176
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[patent_issue_date] => 2003-05-22
[patent_title] => 'Photomask, microstructure, manufacturing method of photomask, and aligner'
[patent_app_type] => new
[patent_app_number] => 10/261170
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/261170 | Photomask, microstructure, manufacturing method of photomask, and aligner | Sep 29, 2002 | Issued |
Array
(
[id] => 749084
[patent_doc_number] => 07022435
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[patent_kind] => B2
[patent_issue_date] => 2006-04-04
[patent_title] => 'Method for the manufacture of phase shifting masks for EUV lithography'
[patent_app_type] => utility
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[patent_app_date] => 2002-09-27
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/256454 | Method for the manufacture of phase shifting masks for EUV lithography | Sep 26, 2002 | Issued |
Array
(
[id] => 1034334
[patent_doc_number] => 06875543
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[patent_kind] => B2
[patent_issue_date] => 2005-04-05
[patent_title] => 'Etched-multilayer phase shifting masks for EUV lithography'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/256377 | Etched-multilayer phase shifting masks for EUV lithography | Sep 26, 2002 | Issued |
Array
(
[id] => 532953
[patent_doc_number] => 07172838
[patent_country] => US
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[patent_issue_date] => 2007-02-06
[patent_title] => 'Chromeless phase mask layout generation'
[patent_app_type] => utility
[patent_app_number] => 10/259373
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 10259373
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/259373 | Chromeless phase mask layout generation | Sep 26, 2002 | Issued |
Array
(
[id] => 6808933
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[patent_issue_date] => 2003-10-23
[patent_title] => 'Method for setting mask pattern and illumination condition'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/251581 | Method for setting mask pattern and illumination condition | Sep 19, 2002 | Issued |
Array
(
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Array
(
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[patent_title] => 'Using second exposure to assist a PSM exposure in printing a tight space adjacent to large feature'
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Array
(
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[patent_title] => 'Extreme ultraviolet soft x-ray projection lithographic method and mask devices'
[patent_app_type] => new
[patent_app_number] => 10/242911
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[firstpage_image] =>[orig_patent_app_number] => 10242911
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/242911 | Extreme ultraviolet soft x-ray projection lithographic method and mask devices | Sep 12, 2002 | Issued |