
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6874319
[patent_doc_number] => 20030194616
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-16
[patent_title] => 'Ion-beam deposition process for manufacture of binary photomask blanks'
[patent_app_type] => new
[patent_app_number] => 10/123749
[patent_app_country] => US
[patent_app_date] => 2002-04-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3511
[patent_no_of_claims] => 5
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[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0194/20030194616.pdf
[firstpage_image] =>[orig_patent_app_number] => 10123749
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/123749 | Ion-beam deposition process for manufacture of binary photomask blanks | Apr 15, 2002 | Issued |
Array
(
[id] => 1241007
[patent_doc_number] => 06682860
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-01-27
[patent_title] => 'Attenuated embedded phase shift photomask blanks'
[patent_app_type] => B2
[patent_app_number] => 10/122876
[patent_app_country] => US
[patent_app_date] => 2002-04-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 3202
[patent_no_of_claims] => 23
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/682/06682860.pdf
[firstpage_image] =>[orig_patent_app_number] => 10122876
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/122876 | Attenuated embedded phase shift photomask blanks | Apr 11, 2002 | Issued |
Array
(
[id] => 648831
[patent_doc_number] => 07115342
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-10-03
[patent_title] => 'Preparation of photomasks'
[patent_app_type] => utility
[patent_app_number] => 10/474604
[patent_app_country] => US
[patent_app_date] => 2002-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/07/115/07115342.pdf
[firstpage_image] =>[orig_patent_app_number] => 10474604
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/474604 | Preparation of photomasks | Apr 10, 2002 | Issued |
Array
(
[id] => 6465086
[patent_doc_number] => 20020150824
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-17
[patent_title] => 'Mask for adjusting transmittance of a light and method for manufacturing the same'
[patent_app_type] => new
[patent_app_number] => 10/118916
[patent_app_country] => US
[patent_app_date] => 2002-04-10
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0150/20020150824.pdf
[firstpage_image] =>[orig_patent_app_number] => 10118916
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/118916 | Mask for adjusting transmittance of a light and method for manufacturing the same | Apr 9, 2002 | Issued |
Array
(
[id] => 6874317
[patent_doc_number] => 20030194614
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-16
[patent_title] => ' Method of forming a phase shift mask'
[patent_app_type] => new
[patent_app_number] => 10/118971
[patent_app_country] => US
[patent_app_date] => 2002-04-10
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0194/20030194614.pdf
[firstpage_image] =>[orig_patent_app_number] => 10118971
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/118971 | Method of forming a phase shift mask | Apr 9, 2002 | Abandoned |
Array
(
[id] => 1119211
[patent_doc_number] => 06797439
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-09-28
[patent_title] => 'Photomask with back-side anti-reflective layer and method of manufacture'
[patent_app_type] => B1
[patent_app_number] => 10/113007
[patent_app_country] => US
[patent_app_date] => 2002-03-29
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/797/06797439.pdf
[firstpage_image] =>[orig_patent_app_number] => 10113007
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/113007 | Photomask with back-side anti-reflective layer and method of manufacture | Mar 28, 2002 | Issued |
Array
(
[id] => 5985569
[patent_doc_number] => 20020098424
[patent_country] => US
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[patent_issue_date] => 2002-07-25
[patent_title] => 'Electrically programmable photolithography mask'
[patent_app_type] => new
[patent_app_number] => 10/109757
[patent_app_country] => US
[patent_app_date] => 2002-03-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0098/20020098424.pdf
[firstpage_image] =>[orig_patent_app_number] => 10109757
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/109757 | Electrically programmable photolithography mask | Mar 27, 2002 | Issued |
Array
(
[id] => 6729940
[patent_doc_number] => 20030186130
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[patent_kind] => A1
[patent_issue_date] => 2003-10-02
[patent_title] => 'Method of defect repairing in graytone part in graytone mask'
[patent_app_type] => new
[patent_app_number] => 10/107817
[patent_app_country] => US
[patent_app_date] => 2002-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0186/20030186130.pdf
[firstpage_image] =>[orig_patent_app_number] => 10107817
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/107817 | Method of defect repairing in graytone part in graytone mask | Mar 27, 2002 | Issued |
Array
(
[id] => 707158
[patent_doc_number] => 07060394
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-06-13
[patent_title] => 'Halftone phase-shift mask blank and halftone phase-shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/107825
[patent_app_country] => US
[patent_app_date] => 2002-03-28
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[pdf_file] => patents/07/060/07060394.pdf
[firstpage_image] =>[orig_patent_app_number] => 10107825
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/107825 | Halftone phase-shift mask blank and halftone phase-shift mask | Mar 27, 2002 | Issued |
Array
(
[id] => 6015467
[patent_doc_number] => 20020102479
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[patent_title] => 'Electrically programmable photolithography mask'
[patent_app_type] => new
[patent_app_number] => 10/112559
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[patent_app_date] => 2002-03-28
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[pdf_file] => publications/A1/0102/20020102479.pdf
[firstpage_image] =>[orig_patent_app_number] => 10112559
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/112559 | Electrically programmable photolithography mask | Mar 27, 2002 | Issued |
Array
(
[id] => 6015465
[patent_doc_number] => 20020102478
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Photomask and pattern forming method employing the same'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/096599 | Photomask and pattern forming method employing the same | Mar 13, 2002 | Issued |
Array
(
[id] => 5858814
[patent_doc_number] => 20020122994
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[patent_title] => 'Design and layout of phase shifting photolithographic masks'
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Array
(
[id] => 6834556
[patent_doc_number] => 20030162101
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[patent_issue_date] => 2003-08-28
[patent_title] => 'Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby'
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[patent_app_number] => 10/084656
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Array
(
[id] => 1171473
[patent_doc_number] => 06749973
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[patent_issue_date] => 2004-06-15
[patent_title] => 'Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the mask'
[patent_app_type] => B2
[patent_app_number] => 10/073874
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Array
(
[id] => 6533523
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Array
(
[id] => 1220081
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[patent_title] => 'Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method'
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Array
(
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Array
(
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Array
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Array
(
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