Search

Hung Nhat Ngo

Examiner (ID: 2310)

Most Active Art Unit
2501
Art Unit(s)
2874, 3621, 2501, 2633
Total Applications
1627
Issued Applications
1441
Pending Applications
92
Abandoned Applications
94

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1283958 [patent_doc_number] => 06638666 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-10-28 [patent_title] => 'Substrate for a transfer mask, transfer mask, and method of manufacturing the transfer mask' [patent_app_type] => B2 [patent_app_number] => 10/052509 [patent_app_country] => US [patent_app_date] => 2002-01-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 26 [patent_no_of_words] => 5592 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/638/06638666.pdf [firstpage_image] =>[orig_patent_app_number] => 10052509 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/052509
Substrate for a transfer mask, transfer mask, and method of manufacturing the transfer mask Jan 22, 2002 Issued
Array ( [id] => 7612982 [patent_doc_number] => 06902851 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-06-07 [patent_title] => 'Method for using phase-shifting mask' [patent_app_type] => utility [patent_app_number] => 10/047610 [patent_app_country] => US [patent_app_date] => 2002-01-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 3084 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 130 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/902/06902851.pdf [firstpage_image] =>[orig_patent_app_number] => 10047610 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/047610
Method for using phase-shifting mask Jan 15, 2002 Issued
Array ( [id] => 1171468 [patent_doc_number] => 06749972 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-06-15 [patent_title] => 'Optical proximity correction common process window maximization over varying feature pitch' [patent_app_type] => B2 [patent_app_number] => 10/050267 [patent_app_country] => US [patent_app_date] => 2002-01-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 11 [patent_no_of_words] => 2963 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/749/06749972.pdf [firstpage_image] =>[orig_patent_app_number] => 10050267 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/050267
Optical proximity correction common process window maximization over varying feature pitch Jan 14, 2002 Issued
Array ( [id] => 1161740 [patent_doc_number] => 06759171 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-07-06 [patent_title] => 'Alternating aperture phase shifting photomask with improved intensity balancing' [patent_app_type] => B1 [patent_app_number] => 10/044732 [patent_app_country] => US [patent_app_date] => 2002-01-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 15 [patent_no_of_words] => 3389 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/759/06759171.pdf [firstpage_image] =>[orig_patent_app_number] => 10044732 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/044732
Alternating aperture phase shifting photomask with improved intensity balancing Jan 10, 2002 Issued
Array ( [id] => 1137258 [patent_doc_number] => 06780548 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-08-24 [patent_title] => 'Alternating aperture phase shifting photomask with improved transmission balancing' [patent_app_type] => B1 [patent_app_number] => 10/044562 [patent_app_country] => US [patent_app_date] => 2002-01-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 15 [patent_no_of_words] => 3272 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/780/06780548.pdf [firstpage_image] =>[orig_patent_app_number] => 10044562 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/044562
Alternating aperture phase shifting photomask with improved transmission balancing Jan 10, 2002 Issued
Array ( [id] => 6444195 [patent_doc_number] => 20020177047 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-11-28 [patent_title] => 'Photomask and method for manufacturing the same' [patent_app_type] => new [patent_app_number] => 10/035308 [patent_app_country] => US [patent_app_date] => 2002-01-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4435 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0177/20020177047.pdf [firstpage_image] =>[orig_patent_app_number] => 10035308 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/035308
Photomask and method for manufacturing the same Jan 3, 2002 Abandoned
Array ( [id] => 757088 [patent_doc_number] => 07014956 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-03-21 [patent_title] => 'Active secondary exposure mask to manufacture integrated circuits' [patent_app_type] => utility [patent_app_number] => 10/040772 [patent_app_country] => US [patent_app_date] => 2002-01-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 15 [patent_no_of_words] => 8025 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/014/07014956.pdf [firstpage_image] =>[orig_patent_app_number] => 10040772 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/040772
Active secondary exposure mask to manufacture integrated circuits Jan 3, 2002 Issued
Array ( [id] => 6623715 [patent_doc_number] => 20020086223 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-07-04 [patent_title] => 'Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method' [patent_app_type] => new [patent_app_number] => 10/026973 [patent_app_country] => US [patent_app_date] => 2001-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 20943 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0086/20020086223.pdf [firstpage_image] =>[orig_patent_app_number] => 10026973 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/026973
Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method Dec 26, 2001 Issued
Array ( [id] => 1179223 [patent_doc_number] => 06740455 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-05-25 [patent_title] => 'Photomask' [patent_app_type] => B2 [patent_app_number] => 10/023841 [patent_app_country] => US [patent_app_date] => 2001-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 15 [patent_no_of_words] => 2306 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 42 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/740/06740455.pdf [firstpage_image] =>[orig_patent_app_number] => 10023841 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/023841
Photomask Dec 20, 2001 Issued
Array ( [id] => 6683053 [patent_doc_number] => 20030118917 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-06-26 [patent_title] => 'Facilitating minimum spacing and/or width control during optical proximity correction' [patent_app_type] => new [patent_app_number] => 10/029041 [patent_app_country] => US [patent_app_date] => 2001-12-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 5768 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 134 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0118/20030118917.pdf [firstpage_image] =>[orig_patent_app_number] => 10029041 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/029041
Facilitating minimum spacing and/or width control optical proximity correction Dec 19, 2001 Issued
Array ( [id] => 5921468 [patent_doc_number] => 20020115003 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-22 [patent_title] => 'Photomask blank and photomask' [patent_app_type] => new [patent_app_number] => 10/020987 [patent_app_country] => US [patent_app_date] => 2001-12-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3717 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0115/20020115003.pdf [firstpage_image] =>[orig_patent_app_number] => 10020987 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/020987
Photomask blank and photomask Dec 18, 2001 Issued
Array ( [id] => 6080185 [patent_doc_number] => 20020081500 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-27 [patent_title] => 'Method and apparatus for determining phase shifts and trim masks for an integrated circuit' [patent_app_type] => new [patent_app_number] => 10/017357 [patent_app_country] => US [patent_app_date] => 2001-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 2945 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0081/20020081500.pdf [firstpage_image] =>[orig_patent_app_number] => 10017357 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/017357
Method and apparatus for determining phase shifts and trim masks for an integrated circuit Dec 12, 2001 Issued
Array ( [id] => 1171463 [patent_doc_number] => 06749971 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-06-15 [patent_title] => 'Method of enhancing clear field phase shift masks with chrome border around phase 180 regions' [patent_app_type] => B2 [patent_app_number] => 10/016710 [patent_app_country] => US [patent_app_date] => 2001-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3224 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/749/06749971.pdf [firstpage_image] =>[orig_patent_app_number] => 10016710 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/016710
Method of enhancing clear field phase shift masks with chrome border around phase 180 regions Dec 10, 2001 Issued
Array ( [id] => 1171457 [patent_doc_number] => 06749970 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-06-15 [patent_title] => 'Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions' [patent_app_type] => B2 [patent_app_number] => 10/016273 [patent_app_country] => US [patent_app_date] => 2001-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3462 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/749/06749970.pdf [firstpage_image] =>[orig_patent_app_number] => 10016273 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/016273
Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions Dec 10, 2001 Issued
Array ( [id] => 1119209 [patent_doc_number] => 06797438 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-09-28 [patent_title] => 'Method and enhancing clear field phase shift masks with border around edges of phase regions' [patent_app_type] => B1 [patent_app_number] => 10/016441 [patent_app_country] => US [patent_app_date] => 2001-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3122 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/797/06797438.pdf [firstpage_image] =>[orig_patent_app_number] => 10016441 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/016441
Method and enhancing clear field phase shift masks with border around edges of phase regions Dec 10, 2001 Issued
Array ( [id] => 6750175 [patent_doc_number] => 20030044695 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-06 [patent_title] => 'Attenuating phase shift mask for photolithography' [patent_app_type] => new [patent_app_number] => 10/020047 [patent_app_country] => US [patent_app_date] => 2001-12-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3983 [patent_no_of_claims] => 37 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20030044695.pdf [firstpage_image] =>[orig_patent_app_number] => 10020047 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/020047
Attenuating phase shift mask for photolithography Dec 6, 2001 Abandoned
Array ( [id] => 5985567 [patent_doc_number] => 20020098422 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-07-25 [patent_title] => 'Lithography mask blank and method of manufacturing the same' [patent_app_type] => new [patent_app_number] => 09/998422 [patent_app_country] => US [patent_app_date] => 2001-12-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 7498 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0098/20020098422.pdf [firstpage_image] =>[orig_patent_app_number] => 09998422 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/998422
Lithography mask blank and method of manufacturing the same Dec 2, 2001 Issued
Array ( [id] => 5828141 [patent_doc_number] => 20020068229 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-06 [patent_title] => 'Embedded attenuated phase shift mask and method of making embedded attenuated phase shift mask' [patent_app_type] => new [patent_app_number] => 09/996748 [patent_app_country] => US [patent_app_date] => 2001-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4544 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 26 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0068/20020068229.pdf [firstpage_image] =>[orig_patent_app_number] => 09996748 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/996748
Embedded attenuated phase shift mask and method of making embedded attenuated phase shift mask Nov 29, 2001 Issued
Array ( [id] => 5786790 [patent_doc_number] => 20020160276 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-10-31 [patent_title] => 'Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass' [patent_app_type] => new [patent_app_number] => 09/997785 [patent_app_country] => US [patent_app_date] => 2001-11-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 20 [patent_figures_cnt] => 20 [patent_no_of_words] => 12266 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 37 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0160/20020160276.pdf [firstpage_image] =>[orig_patent_app_number] => 09997785 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/997785
Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass Nov 27, 2001 Issued
Array ( [id] => 1180087 [patent_doc_number] => 06737201 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-05-18 [patent_title] => 'Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device' [patent_app_type] => B2 [patent_app_number] => 09/987990 [patent_app_country] => US [patent_app_date] => 2001-11-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 7985 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 11 [patent_words_short_claim] => 36 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/737/06737201.pdf [firstpage_image] =>[orig_patent_app_number] => 09987990 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/987990
Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device Nov 15, 2001 Issued
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