
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1283958
[patent_doc_number] => 06638666
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-10-28
[patent_title] => 'Substrate for a transfer mask, transfer mask, and method of manufacturing the transfer mask'
[patent_app_type] => B2
[patent_app_number] => 10/052509
[patent_app_country] => US
[patent_app_date] => 2002-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 26
[patent_no_of_words] => 5592
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 51
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/638/06638666.pdf
[firstpage_image] =>[orig_patent_app_number] => 10052509
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/052509 | Substrate for a transfer mask, transfer mask, and method of manufacturing the transfer mask | Jan 22, 2002 | Issued |
Array
(
[id] => 7612982
[patent_doc_number] => 06902851
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-06-07
[patent_title] => 'Method for using phase-shifting mask'
[patent_app_type] => utility
[patent_app_number] => 10/047610
[patent_app_country] => US
[patent_app_date] => 2002-01-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 3084
[patent_no_of_claims] => 23
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[patent_maintenance] => 1
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[pdf_file] => patents/06/902/06902851.pdf
[firstpage_image] =>[orig_patent_app_number] => 10047610
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/047610 | Method for using phase-shifting mask | Jan 15, 2002 | Issued |
Array
(
[id] => 1171468
[patent_doc_number] => 06749972
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-06-15
[patent_title] => 'Optical proximity correction common process window maximization over varying feature pitch'
[patent_app_type] => B2
[patent_app_number] => 10/050267
[patent_app_country] => US
[patent_app_date] => 2002-01-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 2963
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[pdf_file] => patents/06/749/06749972.pdf
[firstpage_image] =>[orig_patent_app_number] => 10050267
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/050267 | Optical proximity correction common process window maximization over varying feature pitch | Jan 14, 2002 | Issued |
Array
(
[id] => 1161740
[patent_doc_number] => 06759171
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-07-06
[patent_title] => 'Alternating aperture phase shifting photomask with improved intensity balancing'
[patent_app_type] => B1
[patent_app_number] => 10/044732
[patent_app_country] => US
[patent_app_date] => 2002-01-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 3389
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/759/06759171.pdf
[firstpage_image] =>[orig_patent_app_number] => 10044732
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/044732 | Alternating aperture phase shifting photomask with improved intensity balancing | Jan 10, 2002 | Issued |
Array
(
[id] => 1137258
[patent_doc_number] => 06780548
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-08-24
[patent_title] => 'Alternating aperture phase shifting photomask with improved transmission balancing'
[patent_app_type] => B1
[patent_app_number] => 10/044562
[patent_app_country] => US
[patent_app_date] => 2002-01-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 3272
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/780/06780548.pdf
[firstpage_image] =>[orig_patent_app_number] => 10044562
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/044562 | Alternating aperture phase shifting photomask with improved transmission balancing | Jan 10, 2002 | Issued |
Array
(
[id] => 6444195
[patent_doc_number] => 20020177047
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-11-28
[patent_title] => 'Photomask and method for manufacturing the same'
[patent_app_type] => new
[patent_app_number] => 10/035308
[patent_app_country] => US
[patent_app_date] => 2002-01-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[pdf_file] => publications/A1/0177/20020177047.pdf
[firstpage_image] =>[orig_patent_app_number] => 10035308
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/035308 | Photomask and method for manufacturing the same | Jan 3, 2002 | Abandoned |
Array
(
[id] => 757088
[patent_doc_number] => 07014956
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-21
[patent_title] => 'Active secondary exposure mask to manufacture integrated circuits'
[patent_app_type] => utility
[patent_app_number] => 10/040772
[patent_app_country] => US
[patent_app_date] => 2002-01-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 15
[patent_no_of_words] => 8025
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/014/07014956.pdf
[firstpage_image] =>[orig_patent_app_number] => 10040772
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/040772 | Active secondary exposure mask to manufacture integrated circuits | Jan 3, 2002 | Issued |
Array
(
[id] => 6623715
[patent_doc_number] => 20020086223
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-04
[patent_title] => 'Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method'
[patent_app_type] => new
[patent_app_number] => 10/026973
[patent_app_country] => US
[patent_app_date] => 2001-12-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 20943
[patent_no_of_claims] => 14
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0086/20020086223.pdf
[firstpage_image] =>[orig_patent_app_number] => 10026973
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/026973 | Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method | Dec 26, 2001 | Issued |
Array
(
[id] => 1179223
[patent_doc_number] => 06740455
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-05-25
[patent_title] => 'Photomask'
[patent_app_type] => B2
[patent_app_number] => 10/023841
[patent_app_country] => US
[patent_app_date] => 2001-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => patents/06/740/06740455.pdf
[firstpage_image] =>[orig_patent_app_number] => 10023841
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/023841 | Photomask | Dec 20, 2001 | Issued |
Array
(
[id] => 6683053
[patent_doc_number] => 20030118917
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-06-26
[patent_title] => 'Facilitating minimum spacing and/or width control during optical proximity correction'
[patent_app_type] => new
[patent_app_number] => 10/029041
[patent_app_country] => US
[patent_app_date] => 2001-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
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[patent_no_of_words] => 5768
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0118/20030118917.pdf
[firstpage_image] =>[orig_patent_app_number] => 10029041
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/029041 | Facilitating minimum spacing and/or width control optical proximity correction | Dec 19, 2001 | Issued |
Array
(
[id] => 5921468
[patent_doc_number] => 20020115003
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-22
[patent_title] => 'Photomask blank and photomask'
[patent_app_type] => new
[patent_app_number] => 10/020987
[patent_app_country] => US
[patent_app_date] => 2001-12-19
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0115/20020115003.pdf
[firstpage_image] =>[orig_patent_app_number] => 10020987
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/020987 | Photomask blank and photomask | Dec 18, 2001 | Issued |
Array
(
[id] => 6080185
[patent_doc_number] => 20020081500
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-27
[patent_title] => 'Method and apparatus for determining phase shifts and trim masks for an integrated circuit'
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[patent_app_number] => 10/017357
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[firstpage_image] =>[orig_patent_app_number] => 10017357
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/017357 | Method and apparatus for determining phase shifts and trim masks for an integrated circuit | Dec 12, 2001 | Issued |
Array
(
[id] => 1171463
[patent_doc_number] => 06749971
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-06-15
[patent_title] => 'Method of enhancing clear field phase shift masks with chrome border around phase 180 regions'
[patent_app_type] => B2
[patent_app_number] => 10/016710
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[firstpage_image] =>[orig_patent_app_number] => 10016710
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/016710 | Method of enhancing clear field phase shift masks with chrome border around phase 180 regions | Dec 10, 2001 | Issued |
Array
(
[id] => 1171457
[patent_doc_number] => 06749970
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-06-15
[patent_title] => 'Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions'
[patent_app_type] => B2
[patent_app_number] => 10/016273
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Array
(
[id] => 1119209
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[patent_title] => 'Method and enhancing clear field phase shift masks with border around edges of phase regions'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/016441 | Method and enhancing clear field phase shift masks with border around edges of phase regions | Dec 10, 2001 | Issued |
Array
(
[id] => 6750175
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[patent_title] => 'Attenuating phase shift mask for photolithography'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/020047 | Attenuating phase shift mask for photolithography | Dec 6, 2001 | Abandoned |
Array
(
[id] => 5985567
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[patent_title] => 'Lithography mask blank and method of manufacturing the same'
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[firstpage_image] =>[orig_patent_app_number] => 09998422
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/998422 | Lithography mask blank and method of manufacturing the same | Dec 2, 2001 | Issued |
Array
(
[id] => 5828141
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Array
(
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[patent_title] => 'Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/997785 | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass | Nov 27, 2001 | Issued |
Array
(
[id] => 1180087
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[patent_title] => 'Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device'
[patent_app_type] => B2
[patent_app_number] => 09/987990
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[firstpage_image] =>[orig_patent_app_number] => 09987990
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/987990 | Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device | Nov 15, 2001 | Issued |