
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1150819
[patent_doc_number] => 06767673
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-07-27
[patent_title] => 'Method of repairing PSM to keep normal transmission rate and phase angle'
[patent_app_type] => B1
[patent_app_number] => 09/993069
[patent_app_country] => US
[patent_app_date] => 2001-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 10
[patent_no_of_words] => 4093
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 165
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/767/06767673.pdf
[firstpage_image] =>[orig_patent_app_number] => 09993069
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/993069 | Method of repairing PSM to keep normal transmission rate and phase angle | Nov 13, 2001 | Issued |
Array
(
[id] => 6357653
[patent_doc_number] => 20020058188
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-05-16
[patent_title] => 'Method for rescuing levenson phase shift mask from abnormal difference in transmittance and phase difference between phase shifter and non-phase shifter'
[patent_app_type] => new
[patent_app_number] => 09/987401
[patent_app_country] => US
[patent_app_date] => 2001-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 29
[patent_figures_cnt] => 29
[patent_no_of_words] => 11533
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 135
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0058/20020058188.pdf
[firstpage_image] =>[orig_patent_app_number] => 09987401
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/987401 | Method for rescuing levenson phase shift mask from abnormal difference in transmittance and phase difference between phase shifter and non-phase shifter | Nov 13, 2001 | Abandoned |
Array
(
[id] => 1296497
[patent_doc_number] => 06627362
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-09-30
[patent_title] => 'Photolithographic mask fabrication'
[patent_app_type] => B2
[patent_app_number] => 09/984631
[patent_app_country] => US
[patent_app_date] => 2001-10-30
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 4665
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/627/06627362.pdf
[firstpage_image] =>[orig_patent_app_number] => 09984631
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/984631 | Photolithographic mask fabrication | Oct 29, 2001 | Issued |
Array
(
[id] => 1227685
[patent_doc_number] => 06696206
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-02-24
[patent_title] => 'Lithography mask configuration'
[patent_app_type] => B2
[patent_app_number] => 09/982200
[patent_app_country] => US
[patent_app_date] => 2001-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 1650
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/696/06696206.pdf
[firstpage_image] =>[orig_patent_app_number] => 09982200
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/982200 | Lithography mask configuration | Oct 16, 2001 | Issued |
Array
(
[id] => 6015461
[patent_doc_number] => 20020102474
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Optical proximity correction method'
[patent_app_type] => new
[patent_app_number] => 09/976940
[patent_app_country] => US
[patent_app_date] => 2001-10-12
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0102/20020102474.pdf
[firstpage_image] =>[orig_patent_app_number] => 09976940
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/976940 | Optical proximity correction method | Oct 11, 2001 | Issued |
Array
(
[id] => 6241868
[patent_doc_number] => 20020045108
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-04-18
[patent_title] => 'Reflection photomasks including buffer layer comprising group VIII metal, and methods of fabricating and using the same'
[patent_app_type] => new
[patent_app_number] => 09/976566
[patent_app_country] => US
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[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0045/20020045108.pdf
[firstpage_image] =>[orig_patent_app_number] => 09976566
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/976566 | Reflection photomasks including buffer layer comprising group VIII metal, and methods of fabricating and using the same | Oct 11, 2001 | Issued |
Array
(
[id] => 6817606
[patent_doc_number] => 20030068564
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-04-10
[patent_title] => 'System and method for correcting 3D effects in an alternating phase-shifting mask'
[patent_app_type] => new
[patent_app_number] => 09/974507
[patent_app_country] => US
[patent_app_date] => 2001-10-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 4449
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[pdf_file] => publications/A1/0068/20030068564.pdf
[firstpage_image] =>[orig_patent_app_number] => 09974507
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/974507 | System and method for correcting 3D effects in an alternating phase-shifting mask | Oct 8, 2001 | Issued |
Array
(
[id] => 1098863
[patent_doc_number] => 06818357
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-11-16
[patent_title] => 'Photolithographic mask fabrication'
[patent_app_type] => B2
[patent_app_number] => 09/969156
[patent_app_country] => US
[patent_app_date] => 2001-10-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
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[patent_no_of_words] => 6539
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[pdf_file] => patents/06/818/06818357.pdf
[firstpage_image] =>[orig_patent_app_number] => 09969156
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/969156 | Photolithographic mask fabrication | Oct 2, 2001 | Issued |
Array
(
[id] => 6544245
[patent_doc_number] => 20020110742
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-15
[patent_title] => 'Method for correcting design pattern of semiconductor circuit, a photomask fabricated using the corrected design pattern data, a method for inspecting the photomask and a method for generating pattern data for inspection of photomask'
[patent_app_type] => new
[patent_app_number] => 09/961798
[patent_app_country] => US
[patent_app_date] => 2001-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[pdf_file] => publications/A1/0110/20020110742.pdf
[firstpage_image] =>[orig_patent_app_number] => 09961798
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/961798 | METHOD FOR CORRECTING DESIGN PATTERN OF SEMICONDUCTOR CIRCUIT, A PHOTOMASK FABRICATED USING THE CORRECTED DESIGN PATTERN DATA, A METHOD FOR INSPECTING THE PHOTOMASK AND A METHOD FOR GENERATING PATTERN DATA FOR INSPECTION OF PHOTOMASK | Sep 23, 2001 | Issued |
Array
(
[id] => 6674084
[patent_doc_number] => 20030059687
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-27
[patent_title] => 'Anti-resonance mask for off-axis photolithography'
[patent_app_type] => new
[patent_app_number] => 09/960896
[patent_app_country] => US
[patent_app_date] => 2001-09-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0059/20030059687.pdf
[firstpage_image] =>[orig_patent_app_number] => 09960896
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/960896 | Anti-resonance mask for off-axis photolithography | Sep 20, 2001 | Abandoned |
Array
(
[id] => 6472508
[patent_doc_number] => 20020022185
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-02-21
[patent_title] => 'Method of manufacturing a photomask'
[patent_app_type] => new
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Array
(
[id] => 1239174
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[patent_title] => 'Method of manufacturing a photomask'
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Array
(
[id] => 1263906
[patent_doc_number] => 06660436
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[patent_issue_date] => 2003-12-09
[patent_title] => 'OPC-like repair method for attenuated phase shift masks'
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Array
(
[id] => 6357648
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[patent_title] => 'Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask'
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Array
(
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[patent_title] => 'Phase shift mask blank, phase shift mask, and method for manufacturing the same'
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Array
(
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Array
(
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Array
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Array
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Array
(
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[patent_title] => 'OPC method for generating corrected patterns for a phase-shifting mask and its trimming mask and associated device and integrated circuit configuration'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/942931 | OPC method for generating corrected patterns for a phase-shifting mask and its trimming mask and associated device and integrated circuit configuration | Aug 29, 2001 | Issued |